Growth of Bismuth Telluride Thin Films by Hot Wall Epitaxy, Thermoelectric Properties

1998 ◽  
Vol 545 ◽  
Author(s):  
J. C. Tedenac ◽  
S. Dal Corso ◽  
A. Haidoux ◽  
S. Charar ◽  
B. Liautard
Keyword(s):  
Thin Films ◽  
Bismuth Telluride ◽  
Growth Conditions ◽  
Ternary Alloys ◽  
Materials Preparations ◽  
Electrical Measurements ◽  
Closed Chamber ◽  
Quantum Well Structures ◽  
Carrier Charge ◽  
Hot Wall Epitaxy

AbstractIt is well known that bismuth telluride (Bi2Te3), its isomorphs (Bi2Se3 and Sb2Te3) and their alloys have the optimum bandgap (0.13 eV to 0.21 eV) for efficient solid state cooling applications around 300 K. Recently interesting work argued that the use of quantum well structures can enhance the figure of merit ZT as a result of the improvement of carrier charge density of state and the reduction of the thermal conductivity. However, for the production of such structures it is necessary to establish the optimum growth conditions and the doping levels of thin films based on Bi2Te3 and its isomorphs.In this paper we report on the growth characteristics of Bi2Te3 ternary alloys (even quaternary) thin films elaborated by the Hot Wall Epitaxy (HWE) technique. Ternary alloys based on bismuth telluride have been deposited as thin films on silicon and silica substrates. Hot Wall Epitaxy have been demonstrated to be a suitable technique in chalcogenides growth. These films are formed in a closed chamber, that make possible to keep substrates at relatively high temperature Ts without selective loss of individual components from condensate. Experimental procedures, such as substrate and source materials preparations, have been described in our previous publications. Thin films obtained are well oriented (001) and have block single-crystal structure. These films were studied by microstructural investigations and electrical measurements (electrical conductivity σ, Hall coefficient RH and Hall mobility μn) in the temperature range from liquid nitrogen to 570 K.

Diffraction from arrays of antiphase boundaries in ordered III-V alloys

1987 ◽  
Vol 45 ◽  
pp. 312-313
Author(s):  
T. S. Kuan
Keyword(s):  
High Surface ◽  
Growth Conditions ◽  
Ternary Alloys ◽  
Local Growth ◽  
Antiphase Boundaries ◽  
Surface Mobility ◽  
Ordered Phases ◽  
Diffraction Patterns ◽  
Atomically Flat ◽  
Degree Of Order

Recent electron diffraction studies have found ordered phases in AlxGa1-xAs, GaAsxSb1-x, and InxGa1-xAs alloy systems, and these ordered phases are likely to be found in many other III-V ternary alloys as well. The presence of ordered phases in these alloys was detected in the diffraction patterns through the appearance of superstructure reflections between the Bragg peaks (Fig. 1). The ordered phase observed in the AlxGa1-xAs and InxGa1-xAs systems is of the CuAu-I type, whereas in GaAsxSb1-x this phase and a chalcopyrite type ordered phase can be present simultaneously. The degree of order in these alloys is strongly dependent on the growth conditions, and during the growth of these alloys, high surface mobility of the depositing species is essential for the onset of ordering. Thus, the growth on atomically flat (110) surfaces usually produces much stronger ordering than the growth on (100) surfaces. The degree of order is also affected by the presence of antiphase boundaries (APBs) in the ordered phase. As shown in Fig. 2(a), a perfectly ordered In0.5Ga0.5As structure grown along the <110> direction consists of alternating InAs and GaAs monolayers, but due to local growth fluctuations, two types of APBs can occur: one involves two consecutive InAs monolayers and the other involves two consecutive GaAs monolayers.

Promising thermoelectric performance in Sb-Sn co-substituted bismuth telluride thin films

2020 ◽  
Author(s):  
Sukhdeep Singh ◽  
Silky Jindal ◽  
S. K. Tripathi
Keyword(s):  
Thin Films ◽  
Bismuth Telluride ◽  
Thermoelectric Performance

scholarly journals Impact of changes in bond structure on ovonic threshold switching behaviour in GeSe2

2021 ◽  
Vol 9 (1) ◽  
pp. 117-126
Author(s):  
Jonas Keukelier ◽  
Karl Opsomer ◽  
Thomas Nuytten ◽  
Stefanie Sergeant ◽  
Wouter Devulder ◽  
...  
Keyword(s):  
Thin Films ◽  
Raman Spectroscopy ◽  
Electrical Behaviour ◽  
Electrical Measurements ◽  
Threshold Switching ◽  
Switching Behaviour

Raman spectroscopy and electrical measurements are performed on sputtered GexSe1−x thin films to identify and link bond presence to electrical behaviour.

Mn5Ge3 ultra-thin films on GaAs (111)B substrates: Influence of initial growth conditions

2020 ◽  
Vol 148 ◽  
pp. 106745
Author(s):  
S.J. Gutiérrez-Ojeda ◽  
R.C. de Oliveira ◽  
H.N. Fernández-Escamilla ◽  
R. Ponce-Pérez ◽  
J. Guerrero-Sánchez ◽  
...  
Keyword(s):  
Thin Films ◽  
Growth Conditions ◽  
Initial Growth

scholarly journals Direct measurement of the thermoelectric properties of electrochemically deposited Bi2Te3 thin films

2020 ◽  
Vol 10 (1) ◽  
Author(s):  
Jose Recatala-Gomez ◽  
Pawan Kumar ◽  
Ady Suwardi ◽  
Anas Abutaha ◽  
Iris Nandhakumar ◽  
...  
Keyword(s):  
Thin Films ◽  
Thermoelectric Properties ◽  
Bismuth Telluride ◽  
Indium Tin Oxide ◽  
Seed Layer ◽  
Room Temperature ◽  
Low Cost ◽  
Temperature Dependent ◽  
Temperature Heat ◽  
Electrochemically Deposited

Abstract The best known thermoelectric material for near room temperature heat-to-electricity conversion is bismuth telluride. Amongst the possible fabrication techniques, electrodeposition has attracted attention due to its simplicity and low cost. However, the measurement of the thermoelectric properties of electrodeposited films is challenging because of the conducting seed layer underneath the film. Here, we develop a method to directly measure the thermoelectric properties of electrodeposited bismuth telluride thin films, grown on indium tin oxide. Using this technique, the temperature dependent thermoelectric properties (Seebeck coefficient and electrical conductivity) of electrodeposited thin films have been measured down to 100 K. A parallel resistor model is employed to discern the signal of the film from the signal of the seed layer and the data are carefully analysed and contextualized with literature. Our analysis demonstrates that the thermoelectric properties of electrodeposited films can be accurately evaluated without inflicting any damage to the films.

Observations on the Growth of YBa2Cu3O7 Thin Films at Very High Laser Fluences

1995 ◽  
Vol 388 ◽  
Author(s):  
Rand R. Biggers. ◽  
M. Grant Norton ◽  
I. Maartense ◽  
T.L. Peterson ◽  
E. K. Moser ◽  
...  
Keyword(s):  
Thin Films ◽  
Substrate Surface ◽  
Chemical Vapor ◽  
Growth Conditions ◽  
Organic Chemical ◽  
High Fluences ◽  
Laser Fluences ◽  
High Laser ◽  
High Laser Fluences ◽  
Very High

AbstractThe pulsed-laser deposition (PLD) technique utilizes one of the most energetic beams available to form thin films of the superconducting oxide YBa2Cu3O7 (YBCO). IN this study we examine the growth of YBCO at very high laser fluences (25 to 40 J/cm2); a more typical fluence for PLD would be nearer to 3 J/cm2. the use of high fluences leads to unique film microstructures which, in some cases, appear to be related to the correspondingly higher moveabilities of the adatoms. Films grown on vicinal substrates, using high laser fluences, exhibited well-defined elongated granular morphologies (with excellent transition temperature, Tc, and critical current density, Jc). Films grown on vicinal substrates using off-axis magnetron sputtering, plasma-enhanced metal organic chemical vapor deposition (PE-MOCVD), or PLD at more typical laser fluences showed some similar morphologies, but less well-defined. Under certain growth conditions, using high laser fluences with (001) oriented substrates, the YBCO films can exhibit a mixture of a- and c-axis growth where both crystallographic orientations nucleate on the substrate surface at the same time, and grow in concert. the ratio of a-axis oriented to c-axis oriented grains is strongly affected by the pulse repetition rate of the laser.

Characteristics of nanostructured bismuth telluride thin films fabricated by oblique deposition

Vacuum ◽  
2018 ◽  
Vol 148 ◽  
pp. 296-302 ◽  
Author(s):  
Satoshi Morikawa ◽  
Yuji Satake ◽  
Masayuki Takashiri
Keyword(s):  
Thin Films ◽  
Bismuth Telluride ◽  
Oblique Deposition

Crystallization of Zn-rich and P-rich amorphous Zn3P2 thin films

1988 ◽  
Vol 66 (5) ◽  
pp. 373-375 ◽  
Author(s):  
C. J. Arsenault ◽  
D. E. Brodie
Keyword(s):  
Thin Film ◽  
Thin Films ◽  
Activation Energy ◽  
Electrical Properties ◽  
Structural Properties ◽  
Crystallization Process ◽  
X Ray Diffraction ◽  
Electrical Measurements ◽  
Conductivity Activation Energy ◽  
X Ray

Zn-rich and P-rich amorphous Zn3P2 thin films were prepared by co-evaporation of the excess element during the normal Zn3P2 deposition. X-ray diffraction techniques were used to investigate the structural properties and the crystallization process. Agglomeration of the excess element within the as-made amorphous Zn3P2 thin film accounted for the structural properties observed after annealing the sample. Electrical measurements showed that excess Zn reduces the conductivity activation energy and increases the conductivity, while excess P up to 15 at.% does not alter the electrical properties significantly.

Effects of growth conditions on heteroepitaxial thin films: Fast kinetic Monte Carlo simulations

2015 ◽  
Vol 409 ◽  
pp. 27-31 ◽  
Author(s):  
M. Klawtanong ◽  
C. Srinitiwarawong ◽  
P. Chatraphorn
Keyword(s):  
Thin Films ◽  
Monte Carlo ◽  
Monte Carlo Simulations ◽  
Kinetic Monte Carlo ◽  
Growth Conditions ◽  
Kinetic Monte Carlo Simulations ◽  
Fast Kinetic
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