Fabrication of Perforated Film Nanostructures

2002 ◽  
Vol 739 ◽  
Author(s):  
A. L. Elias ◽  
K. D. Harris ◽  
M. J. Brett
Keyword(s):  
Thin Films ◽  
Glancing Angle Deposition ◽  
Thin Coatings ◽  
Glancing Angle ◽  
Perforated Film ◽  
Glad Technique ◽  
Angle Deposition

ABSTRACTWe have demonstrated the fabrication of perforated thin films (PTFs), comprised of thin coatings perforated with unusual pore shapes such as helices or chevrons. PTFs are fabricated using a template of nanohelices or nanochevrons produced using the Glancing Angle Deposition (GLAD) technique. PTFs can be produced by filling GLAD films with a variety of substances, etching back the coating to reveal the tips of the helices or chevrons, and etching out the template film. A process for fabricating nickel PTFs has been developed, and a nickel PTF of helical pores with nominal diameters of 100nm has been produced.

scholarly journals Developing GLAD Parameters to Control the Deposition of Nanostructured Thin Film

Sensors ◽  
2022 ◽  
Vol 22 (2) ◽  
pp. 651
Author(s):  
Jakub Bronicki ◽  
Dominik Grochala ◽  
Artur Rydosz
Keyword(s):  
Thin Films ◽  
Gas Sensing ◽  
Glancing Angle Deposition ◽  
Metal Oxide Thin Films ◽  
Nanostructured Thin Film ◽  
Sensing Applications ◽  
Deposition Parameters ◽  
Glancing Angle ◽  
Glad Technique ◽  
Relative Errors

In this paper, we describe the device developed to control the deposition parameters to manage the glancing angle deposition (GLAD) process of metal-oxide thin films for gas-sensing applications. The GLAD technique is based on a set of parameters such as the tilt, rotation, and substrate temperature. All parameters are crucial to control the deposition of nanostructured thin films. Therefore, the developed GLAD controller enables the control of all parameters by the scientist during the deposition. Additionally, commercially available vacuum components were used, including a three-axis manipulator. High-precision readings were tested, where the relative errors calculated using the parameters provided by the manufacturer were 1.5% and 1.9% for left and right directions, respectively. However, thanks to the formula developed by our team, the values were decreased to 0.8% and 0.69%, respectively.

scholarly journals Microstructure-Induced Anisotropic Optical Properties of YF3 Columnar Thin Films Prepared by Glancing Angle Deposition

Nanomaterials ◽  
2020 ◽  
Vol 10 (12) ◽  
pp. 2413
Author(s):  
Yao Shan ◽  
Pian Liu ◽  
Yao Chen ◽  
Haotian Zhang ◽  
Huatian Tu ◽  
...  
Keyword(s):  
Thin Films ◽  
Optical Properties ◽  
Volume Fraction ◽  
Electron Beam Evaporation ◽  
Glancing Angle Deposition ◽  
Refractive Indices ◽  
Glancing Angle ◽  
Axis Parallel ◽  
Angle Deposition ◽  
Deposition Angle

Yttrium fluoride (YF3) columnar thin films (CTFs) were fabricated by electron beam evaporation with the glancing angle deposition method. The microstructures and optical properties of YF3 CTFs were studied systematically. The YF3 films grown at different deposition angles are all amorphous. As the deposition angle increases, the columns in YF3 CTFs become increasingly separated and inclined, and the volume fraction of YF3 decreases, resulting in lower refractive indices. This phenomenon is attributed to the self-shadowing effect and limited adatom diffusion. The YF3 CTFs are optically biaxial anisotropic with the long axis (c-axis) parallel to the columns, the short axis (b-axis) perpendicular to the columns, and the other axis (a-axis) parallel to the film interface. The principal refractive index along the b-axis for the 82°-deposited sample is approximately 1.233 at 550 nm. For the 78°-deposited sample, the differences of principal refractive indices between the c-axis and the b-axis and between the a-axis and the b-axis reach the maximum 0.056 and 0.029, respectively. The differences of principal refractive indices were affected by both the deposition angle and the volume fraction of YF3.

Anisotropic Co-Hf Thin Films for Micro-Sensors and Micro-Transducers

2015 ◽  
Vol 644 ◽  
pp. 65-69
Author(s):  
V. Madurga ◽  
C. Favieres ◽  
J. Vergara
Keyword(s):  
Magnetic Field ◽  
Thin Films ◽  
Transverse Direction ◽  
Anisotropy Field ◽  
Transverse Magnetic ◽  
Glancing Angle Deposition ◽  
Maximum Value ◽  
Easy Direction ◽  
Glancing Angle ◽  
Angle Deposition

Thin films of Co-Hf (≈ 86-14 % at.) were grown over Si micro-cantilevers using a glancing-angle deposition technique. A controlled easy direction of magnetisation (anisotropy field μoHk ≈ 0.1 T) in the longitudinal or in the transverse direction of the micro-cantilevers was generated. The mechanical properties of the films under the action of a magnetic field were opposite depending on the magnetisation’s easy direction: i) their deflection was either zero or the maximum value depending on the direction of the applied magnetic field with respect to the parallel or transverse easy direction of magnetisation; ii) the shift in the resonance frequency under a longitudinal or transverse magnetic field was also different depending on the longitudinal or transverse easy direction of magnetisation. The use of these coated devices with micromagnet-like films for sensors and transducers is discussed.

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