Microstructure Evolution with Thickness and Hydrogen Dilution Profile in Microcrystalline Silicon Solar Cells

2004 ◽  
Vol 808 ◽  
Author(s):  
Baojie Yan ◽  
Guozhen Yue ◽  
Jeffrey Yang ◽  
Subhendu Guha ◽  
D. L. Williamson ◽  
...  
Keyword(s):  
Solar Cells ◽  
Solar Cell ◽  
Microstructure Evolution ◽  
Volume Fraction ◽  
Microcrystalline Silicon ◽  
Very High Frequency ◽  
Area Efficiency ◽  
Junction Solar Cell ◽  
Hydrogen Dilution ◽  
Back Reflectors

ABSTRACTHydrogenated microcrystalline silicon (m c-Si:H) solar cells with different thicknesses were deposited on specular stainless steel substrates and on textured Ag/ZnO back reflectors using RF and modified very high frequency glow discharge at various deposition rates. Raman spectra and X-ray diffraction patterns exhibit a significant increase of microcrystalline volume fraction and in grain size with film thickness. Atomic force microscopy reveals an increase in the size of microstructural features and the surface roughness with increasing thickness. Based on these results, we believe that the increase of the microcrystalline phase with thickness is the main reason for the deterioration of cell performance with the thickness of the intrinsic layer. To overcome this problem, we have developed a procedure of varying the hydrogen dilution ratio during deposition. Using this method, we have been successful in controlling the microstructure evolution and achieved an initial active-area efficiency of 8.4% for a c-Si:H single-junction solar cell, and 13.6% for an a-Si:H/a-SiGe:H/m c-Si:H triple-junction solar cell.

High Efficiency Hydrogenated Nanocrystalline Silicon Solar Cells Deposited at High Rates

2010 ◽  
Vol 1245 ◽  
Author(s):  
Guozhen Yue ◽  
Laura Sivec ◽  
Baojie Yan ◽  
Jeff Yang ◽  
Subhendu Guha
Keyword(s):  
Solar Cells ◽  
Triple Junction ◽  
High Efficiency ◽  
Nanocrystalline Silicon ◽  
Active Area ◽  
Very High Frequency ◽  
Area Efficiency ◽  
Hydrogen Dilution ◽  
Back Reflectors ◽  
Junction Structure

AbstractWe report recent progress on hydrogenated nanocrystalline silicon (nc-Si:H) solar cells prepared at different deposition rates. The nc-Si:H intrinsic layer was deposited, using a modified very high frequency (MVHF) glow discharge technique, on Ag/ZnO back reflectors (BRs). The nc-Si:H material quality, especially the evolution of the nanocrystallites, was optimized using hydrogen dilution profiling. First, an initial active-area efficiency of 10.2% was achieved in a nc-Si:H single-junction cell deposited at ~5 Å/s. Using the improved nc-Si:H cell, we obtained 14.5% initial and 13.5% stable active-area efficiencies in an a-Si:H/nc-Si:H/nc-Si:H triple-junction structure. Second, we achieved a stabilized total-area efficiency of 12.5% using the same triple-junction structure but with nc-Si:H deposited at ~10 Å/s; the efficiency was measured at the National Renewable Energy Laboratory (NREL). Third, we developed a recipe using a shorter deposition time and obtained initial 13.0% and stable 12.7% active-area efficiencies for the same triple-junction design.

Hydrogenated Microcrystalline Silicon Single-Junction and Multi-Junction Solar Cells

2003 ◽  
Vol 762 ◽  
Author(s):  
Baojie Yan ◽  
Guozhen Yue ◽  
Jeffrey Yang ◽  
Arindam Banerjee ◽  
Subhendu Guha
Keyword(s):  
Solar Cells ◽  
Solar Cell ◽  
Glow Discharge ◽  
Silicon Germanium ◽  
Active Area ◽  
Microcrystalline Silicon ◽  
Very High Frequency ◽  
Hydrogenated Silicon ◽  
Area Efficiency ◽  
Bottom Cell

AbstractThis paper summarizes our recent studies of hydrogenated microcrystalline silicon (μc-Si:H) solar cells as a potential substitute for hydrogenated silicon germanium alloy (a-SiGe:H) bottom cells in multi-junction structures. Conventional radio frequency (RF) glow discharge is used to deposit hydrogenated amorphous silicon (a-Si:H) and μc-Si:H at low rates (∼ 1 Å/s), searching for the highest efficiency. We have achieved an initial active-area efficiency of 13.0% and stable efficiency of 11.2% using an a-Si:H/μc-Si:H double-junction structure. Modified very high frequency (MVHF) glow discharge is used to deposit a-Si:H and μc-Si:H at high rates (∼ 3-10 Å/s) for comparison with our a-Si:H/a-SiGe:H/a-SiGe:H triple-junction production technology. The deposition time for the μc-Si:H intrinsic (i) layer in the bottom cell should be less than 30 minutes in order to be acceptable for mass production. To date, an initial active-area efficiency of 12.3% has been achieved with the bottom cell deposited in 50 minutes. By increasing the deposition rate and reducing the bottom cell thickness, we have achieved an initial active-area efficiency of 11.4% with the bottom cellilayer deposited in 30 minutes. The cell stabilized to 10.4% after prolonged light soaking. We will address issues related to μc-Si:H material, solar cell design, solar cell analysis, and stability.

Hydrogenated Microcrystalline Silicon Solar Cells Made with Modified Very-High-Frequency Glow Discharge

2002 ◽  
Vol 715 ◽  
Author(s):  
Baojie Yan ◽  
Kenneth Lord ◽  
Jeffrey Yang ◽  
Subhendu Guha ◽  
Jozef Smeets ◽  
...  
Keyword(s):  
Solar Cells ◽  
Glow Discharge ◽  
Short Circuit ◽  
Short Circuit Current ◽  
Microcrystalline Silicon ◽  
Very High Frequency ◽  
Area Efficiency ◽  
Double Junction ◽  
Stability Data ◽  
The Stability

AbstractHydrogenated microcrystalline silicon (μc-Si:H) solar cells are made using modified veryhigh-frequency (MVHF) glow discharge at deposition rates ∼3-5 Å/s. We find that the solar cells made under certain conditions show degradation in air without intentional light soaking. The short-circuit current drops significantly within a few days after deposition, and then stabilizes. We believe that post-deposition oxygen diffusion along the grain boundaries or cracks is the origin of the ambient degradation. By optimizing the deposition conditions, we have found a plasma regime in which the μc-Si:H solar cells do not show such ambient degradation. The best a-Si:H/μc-Si:H double-junction solar cell has an initial active-area efficiency of 10.9% and is stable against the ambient degradation. The stability data of the solar cells after light soaking are also presented.

Correlation of Hydrogen Dilution Profiling to Material Structure and Device Performance of Hydrogenated Nanocrystalline Silicon Solar Cells

2008 ◽  
Vol 1066 ◽  
Author(s):  
Baojie Yan ◽  
Guozhen Yue ◽  
Yanfa Yan ◽  
Chun-Sheng Jiang ◽  
Charles W. Teplin ◽  
...  
Keyword(s):  
Solar Cells ◽  
Solar Cell ◽  
Cell Structure ◽  
Nanocrystalline Silicon ◽  
Cell Performance ◽  
Solar Cell Performance ◽  
Seeding Layer ◽  
Single Junction ◽  
Junction Solar Cell ◽  
Hydrogen Dilution

ABSTRACTWe present a systematic study on the correlation of hydrogen dilution profiles to structural properties materials and solar cell performance in nc-Si:H solar cells. We deposited nc-Si:H single-junction solar cells using a modified very high frequency (VHF) glow discharge technique on stainless steel substrates with various profiles of hydrogen dilution in the gas mixture during deposition. The material properties were characterized using Raman spectroscopy, X-TEM, AFM, and C-AFM. The solar cell performance correlates well with the material structures. Three major conclusions are made based on the characterization results. First, the optimized nc-Si:H material does not show an incubation layer, indicating that the seeding layer is well optimized and works as per design. Second, the nanocrystalline evolution is well controlled by hydrogen dilution profiling in which the hydrogen dilution ratio is dynamically reduced during the intrinsic layer deposition. Third, the best nc-Si:H single-junction solar cell was made using a proper hydrogen dilution profile, which caused a nanocrystalline distribution close to uniform throughout the thickness, but with a slightly inverse nanocrystalline evolution. We have used the optimized hydrogen dilution profiling and improved the nc-Si:H solar cell performance significantly. As a result, we have achieved an initial active-area cell efficiency of 9.2% with a nc-Si:H single-junction structure, and 15.4% with an a-Si:H/a-SiGe:H/nc-Si:H triple-junction solar cell structure.

scholarly journals N-I-P Micromorph Solar Cells on Aluminium Substrates

1996 ◽  
Vol 452 ◽  
Author(s):  
M. Goetz ◽  
P. Torres ◽  
P. Pernet ◽  
J. Meier ◽  
D. Fischer ◽  
...  
Keyword(s):  
Solar Cells ◽  
Solar Cell ◽  
Amorphous Silicon ◽  
Spectral Response ◽  
Single Layer ◽  
Antireflection Coating ◽  
Microcrystalline Silicon ◽  
Single Junction ◽  
Junction Solar Cell ◽  
Single Junction Solar Cell

AbstractThe first successful deposition of ‘micromorph’ silicon tandem solar cells of the n-i-p-n-i-p configuration is reported. In order to implement the ‘micromorph’ solar cell concept, four key elements had to be prepared: First, the deposition of mid-gap, intrinsic microcrystalline silicon (μc-Si:H) by the 'gas purifier method', second, the amorphous silicon (a-Si:H) n-i-p single junction solar cell, third, the microcrystalline silicon n-i-p single junction solar cell and fourth, the ability of depositing on aluminium sheet substrates.All the solar cells presented have been deposited on flat aluminium sheets, using a single layer antireflection coating to couple the light into the cell. It is shown, that this antireflection concept- together with a flat substrate- holds for amorphous single junction solar cells, but it reaches its limit with the extended range of spectral response of the ‘micromorph’ cell.The best initial efficiencies for each category of n-i-p cells on flat substrates were: 8.7% for the amorphous silicon single junction cell, 4.9% for the microcrystalline silicon single junction cell and 9.25% for the ‘micromorph’ tandem cell.

Microcrystalline silicon solar cells prepared by 13.56 MHz PECVD at high growth rates: Solar cell and material properties

2001 ◽  
Vol 664 ◽  
Author(s):  
Tobias Roschek ◽  
Bernd Rech ◽  
Wolfhard Beyer ◽  
Peter Werner ◽  
Felix Edelman ◽  
...  
Keyword(s):  
Raman Spectroscopy ◽  
Solar Cells ◽  
Solar Cell ◽  
Volume Fraction ◽  
Chemical Vapour ◽  
High Growth ◽  
Microcrystalline Silicon ◽  
Deposition Parameters ◽  
Wide Range ◽  
Low Efficiency

ABSTRACTMicrocrystalline silicon (μc-Si:H) solar cells were prepared in a wide range of deposition parameters using 13.56 MHz plasma-enhanced chemical vapour deposition (PECVD). The best μc-Si:H solar cells were prepared close to the transition to amorphous silicon (a-Si:H) growth at very high deposition pressures (∼10 Torr) showing solar cell efficiencies up to 8.0 % at a deposition rate of 5ÊÅ/s. Investigations of the solar cells were performed by Raman spectroscopy and transmission electron microscopy (TEM). TEM measurements revealed similar structural properties with similar high crystalline volume fractions for these cells although they showed distinctly different efficiencies. However, an increased amorphous volume fraction was detected by Raman spectroscopy for the low efficiency cells prepared at low deposition pressures. This result is attributed to an increased ion bombardment at low pressures.

A Wide Band Gap Boron-doped Microcrystalline Silicon Film Obtained with VHF Glow Discharge Method

2005 ◽  
Vol 872 ◽  
Author(s):  
Zhu feng ◽  
Zhao ying ◽  
Wei changcun ◽  
Zhang xiaodan ◽  
Gao yantao ◽  
...  
Keyword(s):  
Solar Cells ◽  
Glow Discharge ◽  
Raman Spectra ◽  
Volume Fraction ◽  
Silicon Film ◽  
Window Layer ◽  
Microcrystalline Silicon ◽  
Silicon Thin Film ◽  
Very High Frequency ◽  
Microcrystalline Silicon Film

AbstractA wide bandgap microcrystalline silicon film for the window layer of microcrystalline silicon thin film solar cells was obtained with very high frequency (VHF) glow discharge technology. The material was deposited on corning 7059 substrate at about 170 When H2/SiH4 was more than 100, Raman spectra showed that this material was highly crystallized, and no peak correlation with amorphous silicon was observed. This material showed strong n type before any intentional doping. We considered that the unintentional doping of oxygen and unpurified gases. The doping performance of this material was investigated by introducing B2H6 into the reacting gas. As increasing the rate of B2H6/SiH4 from zero to 0.5%, the conductivity changed from 10-1S.cm-1 (n type) to 10-8 S.cm-1 dramatically and than backed to 10-1 S.cm-1 (p type), which indicated that this material had excellent doping ability. Raman spectra also showed that the microstructure of these materials did not change obviously in this doping range. We gained the p-uc-Si:H film with thickness less than 30nm, and the conductivity was more than 10-2 S.cm-1, and crystalline volume fraction no less than 40%, the Egopt could be wider than 2.10eV. Using this p window layer in microcrystalline silicon solar cells with no ZnO rear reflection, the conversion efficiency was 8.30% (Voc=0.531V, Jsc=24.66mA/cm2, FF=63.41% ).

scholarly journals Grown Low-Temperature Microcrystalline Silicon Thin Film by VHF PECVD for Thin Films Solar Cell

2015 ◽  
Vol 2015 ◽  
pp. 1-5 ◽  
Author(s):  
Shanglong Peng ◽  
Desheng Wang ◽  
Fuhua Yang ◽  
Zhanguo Wang ◽  
Fei Ma
Keyword(s):  
Thin Film ◽  
Thin Films ◽  
Solar Cells ◽  
Solar Cell ◽  
Short Circuit ◽  
High Growth ◽  
Microcrystalline Silicon ◽  
Silicon Thin Film ◽  
Very High Frequency ◽  
Silicon Thin Films

Hydrogenated microcrystalline silicon thin films can be used to fabricate stable thin film solar cell, which were deposited by very high frequency plasma-enhanced chemical vapor deposition at low temperatures (~200°C). It has been found that the obtained film presented excellent structural and electrical properties, such as high growth rate and good crystallinity. With the decreasing of silane concentration, the optical gap and the dark conductivity increased, whereas the activation energy decreased. A reasonable explanation was presented to elucidate these phenomena. In addition, we fabricated p-i-n structure solar cells using the optimum microcrystalline silicon thin films, and preliminary efficiency of 4.6% was obtained for 1 μm thick microcrystalline silicon thin film solar cells with open-circuits voltage of 0.773 V and short-circuits current density of 12.28 mA/cm2. Future scope for performance improvement lies mainly in further increasing the short-circuit current.

scholarly journals GaInP/GaAs/poly-Si Multi-Junction Solar Cells by in Metal Balls Bonding

Crystals ◽  
2021 ◽  
Vol 11 (7) ◽  
pp. 726
Author(s):  
Ray-Hua Horng ◽  
Yu-Cheng Kao ◽  
Apoorva Sood ◽  
Po-Liang Liu ◽  
Wei-Cheng Wang ◽  
...  
Keyword(s):  
Solar Cells ◽  
Solar Cell ◽  
Low Temperature ◽  
Triple Junction ◽  
Short Circuit ◽  
Short Circuit Current ◽  
Open Circuit ◽  
Metal Line ◽  
Solar Simulator ◽  
Junction Solar Cell

In this study, a mechanical stacking technique has been used to bond together the GaInP/GaAs and poly-silicon (Si) solar wafers. A GaInP/GaAs/poly-Si triple-junction solar cell has mechanically stacked using a low-temperature bonding process which involves micro metal In balls on a metal line using a high-optical-transmission spin-coated glue material. Current–voltage measurements of the GaInP/GaAs/poly-Si triple-junction solar cells have carried out at room temperature both in the dark and under 1 sun with 100 mW/cm2 power density using a solar simulator. The GaInP/GaAs/poly-Si triple-junction solar cell has reached an efficiency of 24.5% with an open-circuit voltage of 2.68 V, a short-circuit current density of 12.39 mA/cm2, and a fill-factor of 73.8%. This study demonstrates a great potential for the low-temperature micro-metal-ball mechanical stacking technique to achieve high conversion efficiency for solar cells with three or more junctions.

Intrinsic and Doped m c-Si:H TFT Layers using 13.56 MHz PECVD at 250°C

2004 ◽  
Vol 808 ◽  
Author(s):  
Czang-Ho Lee ◽  
Denis Striakhilev ◽  
Arokia Nathan
Keyword(s):  
Performance Improvement ◽  
Volume Fraction ◽  
Chemical Vapor ◽  
Dark Conductivity ◽  
Rf Power ◽  
Crystalline Volume Fraction ◽  
Microcrystalline Silicon ◽  
Bias Stress ◽  
Hydrogen Dilution ◽  
Low Threshold

ABSTRACTUndoped and n+ hydrogenated microcrystalline silicon (μc-Si:H) films for thin film transistors (TFTs) were deposited at a temperature of 250°C with 99 ∼ 99.6 % hydrogen dilution of silane by standard 13.56 MHz plasma enhanced chemical vapor deposition (PECVD). High crystallinity m c-Si:H films were achieved at 99.6 % hydrogen dilution and at low rf power. An undoped 80 nm thick m c-Si:H film showed a dark conductivity of the order of 10−7 S/cm, the photosensitivity of an order of 102, and a crystalline volume fraction of 80 %. However, a 60 nm thick n+ μc-Si:H film deposited using a seed layer showed a high dark conductivity of 35 S/cm and a crystalline volume fraction of 60 %. Using n+ μc-Si:H films as drain and source contact layers in a-Si:H TFTs provides substantial performance improvement over n+ a-Si:H contacts. Finally, fully μ c-Si:H TFTs incorporating intrinsic m c-Si:H films as channel layers and n+ μc-Si:H films as contact layers have been fabricated and characterized. These TFTs exhibit a low threshold voltage and a field effect mobility of 0.85 cm2/Vs, and are far more stable under gate bias stress than a-Si:H TFTs.

Sign in / Sign up

Export Citation Format

Share Document