P-33: Impact of TiO2 Incorporation in the Structural and Electrical Property of the Sputtered Indium Tin Oxide Field Effect Transistors
2011 ◽
Vol 42
(1)
◽
pp. 1212-1214
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Keyword(s):
Fabrication and characterisation of transparent-gate field effect transistors using indium tin oxide
1996 ◽
Vol 143
(1)
◽
pp. 7-11
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2011 ◽
Vol 208
(12)
◽
pp. 2920-2925
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2009 ◽
Vol 131
(31)
◽
pp. 10826-10827
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Keyword(s):
2011 ◽
Vol 3
(7)
◽
pp. 2522-2528
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2009 ◽
Vol 115
(2)
◽
pp. 473-476
◽
1990 ◽
Vol 8
(3)
◽
pp. 1403-1406
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Keyword(s):
2005 ◽
Vol 44
(7A)
◽
pp. 4838-4842
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