Субмонослойные квантовые точки InGaAs/GaAs, выращенные методом МОС-гидридной эпитаксии
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AbstractThe mode of the growth of InGaAs quantum dots by MOS-hydride epitaxy on GaAs substrates without a deviation and with a deviation of 2° is selected for laser structures emitting at wavelengths above 1.2 μm at room temperature. As a result, a quantum-dot density of 4 × 10^10 cm^–2 is achieved. Stimulated emission is observed in laser structures with seven layers of quantum dots at a wavelength of 1.06 μm at liquid-nitrogen temperature. The threshold power density of optical pumping is about 5 kW/cm^2.
2019 ◽
Vol 45
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pp. 10
2002 ◽
Vol 13
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pp. 892-895
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2001 ◽
Vol 187
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pp. 45-48
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1999 ◽
Vol 38
(Part 1, No. 1B)
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pp. 605-607
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2013 ◽
Vol 01
(02)
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pp. 1350002
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