scholarly journals The influence of substrate bias voltage on the electrochemical properties of ZrN thin films deposited by radio-frequency magnetron sputtering: Biomedical application

2019 ◽  
Vol 70 (7) ◽  
pp. 112-116
Author(s):  
Mourad Azibi ◽  
Nadia Saoula ◽  
Hamid Aknouche
Keyword(s):  
Thin Films ◽  
Magnetron Sputtering ◽  
Radio Frequency ◽  
Electrochemical Properties ◽  
Bias Voltage ◽  
Biomedical Application ◽  
Substrate Bias ◽  
Radio Frequency Magnetron Sputtering ◽  
Substrate Bias Voltage ◽  
Force Microscopy

Abstract In order to study the influence of the substrate bias on the properties of ZrN thin films deposited by radio-frequency magnetron sputtering for biomedical application. Films of ZrN were grown onto 316L stainless steel substrate using radio-frequency (rf) magnetron sputtering from a pure zirconium target in Ar - N2 gas mixture. The substrate bias voltage was varied from 0 to −100 V, which produces a variation in the structural and electrochemical properties of the obtained films. The deposited films were characterized by X-Rays Diffraction, Atomic Force Microscopy, scanning force microscopy and potentiodynamic polarization.

scholarly journals A study of properties of ZrO2 thin films deposited by magnetron sputtering under different plasma parameters: Biomedical application

2019 ◽  
Vol 70 (7) ◽  
pp. 117-121 ◽  
Author(s):  
Hind Zegtouf ◽  
Nadia Saoula ◽  
Mourad Azibi ◽  
Larbi Bait ◽  
Noureddine Madaoui ◽  
...  
Keyword(s):  
Thin Films ◽  
Magnetron Sputtering ◽  
Bias Voltage ◽  
Biomedical Application ◽  
Steel Substrate ◽  
Substrate Bias ◽  
X Rays ◽  
Plasma Parameters ◽  
Substrate Bias Voltage ◽  
Deposited Films

Abstract ZrO2 thin films were deposited on 316L stainless steel substrate by a radio-frequency magnetron sputtering system. The substrate bias voltage, the working gas rate and the reactive gas fraction in the gas mixture were varied. These variations produce a variation in the deferent properties of the obtained films. The deposited films were characterized by X-Rays Diffraction, Atomic Force Microscopy, nano-indentation and potentiodynamic polarization. The experimental results show that the film thickness and the roughness of the films are highly influenced by the plasma parameters. XRD results show that the monoclinic phase is predominant in unbiased deposited films. The best anti-corrosion performance and hardness were obtained for ZrO2 deposited with a substrate bias voltage of −75 V, Ar rate of 6 sccm and oxygen fraction of 25%.

Friction Force Microscopy Study of the Hydrophilicity of TiO2 Thin Films Deposited by Radio Frequency Magnetron Sputtering

2003 ◽  
Vol 10 (02n03) ◽  
pp. 345-349 ◽  
Author(s):  
L. Sirghi ◽  
T. Aoki ◽  
Y. Hatanaka
Keyword(s):  
Thin Films ◽  
Titanium Dioxide ◽  
Photocatalytic Activity ◽  
Magnetron Sputtering ◽  
Radio Frequency ◽  
Film Surface ◽  
Radio Frequency Magnetron ◽  
Radio Frequency Magnetron Sputtering ◽  
Force Microscopy ◽  
Adhesive Forces

Atomic force microscopy (AFM) measurements of the tip–sample friction and adhesive forces were used to study the chemical homogeneity of the surface of titanium dioxide thin films deposited by radio frequency magnetron sputtering deposition. As a result of the photocatalytic activity, the film surface turned superhydrophilic by UV light irradiation in air. However, the AFM measurements showed that the surface of titanium dioxide deposited at low gas pressure (1 mTorr) was chemically heterogeneous with grains of very low photocatalytic activity. In the ambient air, due to the capillary condensation of the water vapor at the AFM tip–sample contact, the superhydrophilic regions on the film surface show larger friction and adhesive forces compared to the regions of low hydrophilicity.

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