Synthesis of carbon films by magnetron sputtering of a graphite target using hydrogen as plasma-forming gas

2011 ◽  
Vol 38 (9) ◽  
pp. 263-266 ◽  
Author(s):  
A. N. Yurkov ◽  
N. N. Melnik ◽  
V. V. Sychev ◽  
V. V. Savranskii ◽  
D. V. Vlasov ◽  
...  
Keyword(s):  
Magnetron Sputtering ◽  
Carbon Films ◽  
Graphite Target

scholarly journals Computer simulation of sputtering of graphite target in magnetron sputtering device with two zones of erosion

2015 ◽  
Vol 33 (1) ◽  
pp. 82-94
Author(s):  
R.V. Bogdanov ◽  
O.M. Kostiukevych
Keyword(s):  
Carbon Nanotubes ◽  
Computer Simulation ◽  
Monte Carlo ◽  
Magnetron Sputtering ◽  
Energy Flux ◽  
Discharge Current ◽  
Carbon Films ◽  
Monte Carlo Code ◽  
Graphite Target ◽  
Computer Simulation Program

AbstractA computer simulation program for discharge in a magnetron sputtering device with two erosion zones was developed. Basic laws of the graphite target sputtering process and transport of sputtered material to the substrate were taken into account in the Monte Carlo code. The results of computer simulation for radial distributions of density and energy flux of carbon atoms on the substrate (at different values of discharge current and pressure of the working gas) confirmed the possibility of obtaining qualitative homogeneous films using this magnetron sputtering device. Also the discharge modes were determined for this magnetron sputtering device, in which it was possible to obtain such energy and density of carbon atoms fluxes, which were suitable for deposition of carbon films containing carbon nanotubes and other nanoparticles.

Diamond like carbon films deposited from graphite target by asymmetric bipolar pulsed-DC magnetron sputtering

2007 ◽  
Vol 16 (4-7) ◽  
pp. 1286-1290 ◽  
Author(s):  
M. Rubio-Roy ◽  
C. Corbella ◽  
J. Garcia-Céspedes ◽  
M.C. Polo ◽  
E. Pascual ◽  
...  
Keyword(s):  
Magnetron Sputtering ◽  
Carbon Films ◽  
Diamond Like Carbon ◽  
Dc Magnetron Sputtering ◽  
Graphite Target ◽  
Pulsed Dc ◽  
Pulsed Dc Magnetron Sputtering

scholarly journals Reactive High-Power Impulse Magnetron Sputtering of Chromium-Carbon Films

Coatings ◽  
2020 ◽  
Vol 10 (12) ◽  
pp. 1269
Author(s):  
Chin-Chiuan Kuo ◽  
Chun-Hui Lin ◽  
Jing-Tang Chang ◽  
Yu-Tse Lin
Keyword(s):  
Magnetron Sputtering ◽  
Amorphous Carbon ◽  
High Power ◽  
Deposition Temperature ◽  
Average Power ◽  
Carbon Films ◽  
Strengthening Effect ◽  
Substrate Bias ◽  
Hydrogenated Amorphous Carbon ◽  
Hydrogenated Amorphous

Chromium-carbon films were deposited by utilizing reactive high-power impulse magnetron sputtering at different mixture ratios of ethyne and argon atmosphere, and different substrate bias voltages and deposition temperature, with the same pulse frequency, duty cycle, and average power. The microstructure and mechanical properties of the obtained films were compared. The films consist of amorphous or nanocrystalline chromium carbide, hydrogenated amorphous carbon, and minor α-chromium phase. Decreasing the fraction of ethyne increases the content of the α-chromium phase but decreases hydrogenated amorphous carbon phase. The film’s hardness increases by enhancing the negative substrate bias and raising the deposition temperature, which could be attributed to the increase of film density and the Hall–Petch strengthening effect induced by the nanoscale crystallization of the amorphous carbide phase.

scholarly journals Characterization of Thin Carbon Films Produced by the Magnetron Sputtering Technique

2016 ◽  
Vol 19 (3) ◽  
pp. 669-672 ◽  
Author(s):  
Danilo Lopes Costa e Silva ◽  
Luciana Reyes Pires Kassab ◽  
Jose Roberto Martinelli ◽  
Antonio Domingues dos Santos ◽  
Sidney José Lima Ribeiro ◽  
...  
Keyword(s):  
Magnetron Sputtering ◽  
Carbon Films ◽  
Thin Carbon

An Apparatus for Depositing Carbon Films in Magnetron Sputtering under Conditions of Photoactivation of a Film Surface

2019 ◽  
Vol 62 (4) ◽  
pp. 568-572
Author(s):  
A. V. Kostanovskiy ◽  
A. A. Pronkin ◽  
M. G. Zeodinov ◽  
M. E. Kostanovskaya
Keyword(s):  
Magnetron Sputtering ◽  
Film Surface ◽  
Carbon Films

scholarly journals Investigation of diamond-like-carbon films prepared by unbalanced magnetron sputtering

2005 ◽  
Vol 54 (10) ◽  
pp. 4944
Author(s):  
Yang Wu-Bao ◽  
Fan Song-Hua ◽  
Zhang Gu-Ling ◽  
Ma Pei-Ning ◽  
Zhang Shou-Zhong ◽  
...  
Keyword(s):  
Magnetron Sputtering ◽  
Carbon Films ◽  
Diamond Like Carbon ◽  
Unbalanced Magnetron Sputtering ◽  
Unbalanced Magnetron

The Structure and Electrical Property of sp2 Rich Carbon Films by Magnetron Sputtering

2014 ◽  
Vol 998-999 ◽  
pp. 120-123
Author(s):  
Jun Du ◽  
Xiao Ying Zhu ◽  
Yan Zang ◽  
Lei Guo
Keyword(s):  
Electrical Resistivity ◽  
Magnetron Sputtering ◽  
Carbon Films ◽  
Wear Volume ◽  
Chemical Bonds ◽  
Micro Hardness ◽  
X Ray Diffraction ◽  
Sputtering Deposition ◽  
X Ray ◽  
Pin On Disk

sp2 rich carbon films were produced by using magnetron sputtering deposition. The hardness, friction coefficient and wear volume were elevated by Knoop micro-hardness and pin-on-disk tester; The composition and microstructure of the carbon films have been characterized in detail by combining the techniques of Rutherford Backscattering Spectrum (RBS), X-Ray Photoelectron Spectrum (XPS) and X-Ray Diffraction (XRD); the electrical resistivity was measured by Four Probe Methods (FPM). It is found that: the films hardness are 11~17GPa (HK0.05), the friction coefficients are 0.1-0.2, the wear rate is 10-15m3/Nm; The maximum intensity position in the C1s indicates the chemical bonds are mainly sp2; the electrical resistivity is 1~2×10-4Ω·m. XRD proves these carbon films are amorphous.

Sign in / Sign up

Export Citation Format

Share Document