New Techniques for Logic Fault Diagnosis with a Case Study on the 440BX Chipset

Author(s):  
Srikanth Venkataraman ◽  
Scott B. Drummonds

Abstract Logic fault diagnosis or fault isolation is the process of analyzing failing random logic portions of a chip to isolate the cause of failure. Fault diagnosis or fault isolation (FI) plays an important role in multiple applications at different stages of design and manufacturing. Most currently deployed FI techniques for random logic fault isolation include physical techniques with limited automated diagnosis followed by e-beam and/or laser voltage probing (LVP) on packaged parts. This paper will present the methodology and FI results obtained by executing automated scan based diagnosis on a chipset product (440BX). The logic diagnosis techniques used are presented along with simulation and Failure Analysis (FA) results

Author(s):  
Sarven Ipek ◽  
David Grosjean

Abstract The application of an individual failure analysis technique rarely provides the failure mechanism. More typically, the results of numerous techniques need to be combined and considered to locate and verify the correct failure mechanism. This paper describes a particular case in which different microscopy techniques (photon emission, laser signal injection, and current imaging) gave clues to the problem, which then needed to be combined with manual probing and a thorough understanding of the circuit to locate the defect. By combining probing of that circuit block with the mapping and emission results, the authors were able to understand the photon emission spots and the laser signal injection microscopy (LSIM) signatures to be effects of the defect. It also helped them narrow down the search for the defect so that LSIM on a small part of the circuit could lead to the actual defect.


2018 ◽  
Author(s):  
Lucile C. Teague Sheridan ◽  
Tanya Schaeffer ◽  
Yuting Wei ◽  
Satish Kodali ◽  
Chong Khiam Oh

Abstract It is widely acknowledged that Atomic force microscopy (AFM) methods such as conductive probe AFM (CAFM) and Scanning Capacitance Microscopy (SCM) are valuable tools for semiconductor failure analysis. One of the main advantages of these techniques is the ability to provide localized, die-level fault isolation over an area of several microns much faster than conventional nanoprobing methods. SCM, has advantages over CAFM in that it is not limited to bulk technologies and can be utilized for fault isolation on SOI-based technologies. Herein, we present a case-study of SCM die-level fault isolation on SOI-based FinFET technology at the 14nm node.


Author(s):  
Michael Woo ◽  
Marcos Campos ◽  
Luigi Aranda

Abstract A component failure has the potential to significantly impact the cost, manufacturing schedule, and/or the perceived reliability of a system, especially if the root cause of the failure is not known. A failure analysis is often key to mitigating the effects of a componentlevel failure to a customer or a system; minimizing schedule slips, minimizing related accrued costs to the customer, and allowing for the completion of the system with confidence that the reliability of the product had not been compromised. This case study will show how a detailed and systemic failure analysis was able to determine the exact cause of failure of a multiplexer in a high-reliability system, which allowed the manufacturer to confidently proceed with production knowing that the failure was not a systemic issue, but rather that it was a random “one time” event.


Author(s):  
Ravikumar Venkat Krishnan ◽  
Lua Winson ◽  
Vasanth Somasundaram ◽  
Phoa Angeline ◽  
Pey Kin Leong ◽  
...  

Abstract Short wavelength probing (SWP) uses wavelengths of light shorter than 1100 nm or energies higher than silicon bandgap for laser probing applications. While SWP allows a significant improvement to spatial resolution, there are aberrations to the collected laser probing waveforms which result in difficulties in signal interpretations. In this work, we assess the signals collected through SWP (785 nm) and introduce a photodiode model to explain the observations. We also present a successful case study using 785 nm for failure analysis in sub-20 nm FinFET technology.


Author(s):  
Gil Garteiz ◽  
Javeck Verdugo ◽  
David Aveline ◽  
Eric Williams ◽  
Arvid Croonquist ◽  
...  

Abstract In this paper, a failure analysis case study on a custom-built vacuum enclosure is presented. The enclosure’s unique construction and project requirement to preserve the maximum number of units for potential future use in space necessitated a fluorocarbon liquid bath for fault isolation and meticulous sample preparation to preserve the failure mechanism during failure analysis.


Author(s):  
Tien-Phu Ho ◽  
Eric Faehn ◽  
Arnaud Virazel ◽  
Alberto Bosio ◽  
Patrick Girard

Abstract In modern electronic designs, more and more memories are embedded in a single chip. With the latest technologies, defects due to the manufacturing process are more prone to occur in the periphery of the memory. Obtaining a fast and accurate localization of such defects has become much more difficult with traditional diagnosis approaches that do not allow a fast-enough yield learning and improvement. This paper describes a new and automated diagnosis flow for SRAMs to determine the localization of any given defect and thus, to precisely guide the Failure Analysis phase. Based on the electrical and topological fault signatures obtained through traditional methods, each potential fault on the identified active nets is automatically simulated to retrieve the best defect candidates. This paper also presents preliminary results on a representative case study.


Author(s):  
Dat Nguyen ◽  
Thao To ◽  
Ray Harrison ◽  
Cuong Phan ◽  
John Drummond

Abstract Owing to the configuration of cavity up and stacked die packaging and the requirements of backside analysis, both packaging types require similar sample preparation steps. This article describes the failure analysis (FA) process to be applied with cavity up and stack die packages. The FA process flow includes testing to determine the nature of the failure, failure correlation to chip and/or internal circuitry, die preparation for repackaging, die repackaging in a cavity down configuration, automated test equipment (ATE) testing to verify the integrity of the pre-packaging failure mode, backside thinning, global fault isolation, backside reconstruction, and defect identification by front side deprocessing. ATE FA can often be performed using special analysis modes and the modification of the test software to put tester in a halt or a loop during fault isolation. When this is completed, global FA techniques can be used. The article also presents a case study on the successful repackaging efforts of cavity up packages.


Author(s):  
Kevin Gearhardt ◽  
Chris Schuermyer ◽  
Ruifeng Guo

Abstract This paper presents an iterative diagnosis test generation framework to improve logic fault diagnosis resolution. Industrial examples are presented in this paper on how additional targeted pattern generation can be used to improve defect localization before physical failure analysis of a die. This enables failure analysts to be more effective by reducing the dependence on the more expensive physical fault isolation techniques.


Author(s):  
Gerald M. Martinez

Abstract Failure analysis of electronic components is almost always destructive, and there’s no going back once a destructive step is performed. Or, that’s the way it used to be, before the development of some of the more sophisticated nondestructive techniques such as computed tomography (CT). This paper presents a case study of an optocoupler, the suspected failure of which could not be confirmed until the last day of the month-long analysis, when the cause of failure was conclusively determined by a CT model captured weeks earlier.


Sensors ◽  
2021 ◽  
Vol 21 (5) ◽  
pp. 1645
Author(s):  
Nicholas Cartocci ◽  
Marcello R. Napolitano ◽  
Gabriele Costante ◽  
Mario L. Fravolini

Recent catastrophic events in aviation have shown that current fault diagnosis schemes may not be enough to ensure a reliable and prompt sensor fault diagnosis. This paper describes a comparative analysis of consolidated data-driven sensor Fault Isolation (FI) and Fault Estimation (FE) techniques using flight data. Linear regression models, identified from data, are derived to build primary and transformed residuals. These residuals are then implemented to develop fault isolation schemes for 14 sensors of a semi-autonomous aircraft. Specifically, directional Mahalanobis distance-based and fault reconstruction-based techniques are compared in terms of their FI and FE performance. Then, a bank of Bayesian filters is proposed to compute, in flight, the fault belief for each sensor. Both the training and the validation of the schemes are performed using data from multiple flights. Artificial faults are injected into the fault-free sensor measurements to reproduce the occurrence of failures. A detailed evaluation of the techniques in terms of FI and FE performance is presented for failures on the air-data sensors, with special emphasis on the True Air Speed (TAS), Angle of Attack (AoA), and Angle of Sideslip (AoS) sensors.


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