scholarly journals Current Opportunities and Challenges in Biopolymer Thin Film Analysis—Determination of Film Thickness

2021 ◽  
Vol 3 ◽  
Author(s):  
Stefan Spirk ◽  
Chonnipa Palasingh ◽  
Tiina Nypelö
Keyword(s):  
Thin Film ◽  
Thin Films ◽  
Film Thickness ◽  
Polymer Thin Films ◽  
Cellulose Nanofibrils ◽  
Thin Film Thickness ◽  
Thin Film Analysis ◽  
Biopolymer Film ◽  
Analysis Determination

Polymer thin films with thickness below 100 nm are a fascinating class of 2D materials with commercial and research applications in many branches ranging from coatings to photoresists and insulating materials, to mention just a few uses. Biopolymers have extended the scope of polymer thin films with unique materials such as cellulose, cellulose nanocrystals, cellulose nanofibrils with tunable water uptake, crystallinity and optical properties. The key information needed in thin biopolymer film use and research is film thickness. It is often challenging to determine precisely and hence several techniques and their combinations are used. Additional challenges with hydrophilic biopolymers such as cellulose are the presence of humidity and the soft and often heterogenous structure of the films. This minireview summarizes currently used methods and techniques for biopolymer thin film thickness analysis and outlines challenges for accurate and reproducible characterization. Cellulose is chosen as the representative biopolymer.

scholarly journals Precise control of Jeff=12 magnetic properties in Sr2IrO4 epitaxial thin films by variation of strain and thin film thickness

2020 ◽  
Vol 102 (21) ◽  
Author(s):  
Stephan Geprägs ◽  
Björn Erik Skovdal ◽  
Monika Scheufele ◽  
Matthias Opel ◽  
Didier Wermeille ◽  
...  
Keyword(s):  
Thin Film ◽  
Thin Films ◽  
Magnetic Properties ◽  
Film Thickness ◽  
Epitaxial Thin Films ◽  
Thin Film Thickness ◽  
Precise Control

The effect of thin film thickness on thermal nonlinear optical properties and surface morphology of Cu nanostructure thin films

Optik ◽  
2019 ◽  
Vol 199 ◽  
pp. 163517 ◽  
Author(s):  
Mahsa Etminan ◽  
Nooshin. S. Hosseini ◽  
Narges Ajamgard ◽  
Ataalah Koohian ◽  
Mehdi Ranjbar
Keyword(s):  
Thin Film ◽  
Thin Films ◽  
Optical Properties ◽  
Surface Morphology ◽  
Film Thickness ◽  
Nonlinear Optical ◽  
Nonlinear Optical Properties ◽  
Thin Film Thickness

scholarly journals An Analysis of Non-Destructive Methods for Thin Film Thickness Measurement

2019 ◽  
pp. 18-27 ◽  
Author(s):  
A.E. Shupenev ◽  
N.S. Pankova ◽  
I.S. Korshunov ◽  
A.G. Grigoriyants
Keyword(s):  
Thin Film ◽  
Thin Films ◽  
Film Thickness ◽  
High Energy ◽  
Thickness Measurement ◽  
Film Deposition ◽  
Thin Film Thickness ◽  
Optimal Method ◽  
Non Destructive ◽  
Destructive Methods

The thickness of thin films determines the films’ unique properties, due to which they are widely used in optics and electronics. To measure the thickness of films in the range of 1 nm — 1 mcm during film deposition or on a finished product, it is important that non-destructive measurement methods should be used. An analysis of the most commonly used non-destructive methods for measuring and controlling the thickness of thin films is performed, with a possibility of in situ control of the technological process as well as for testing of finished products. This work describes theoretical and practical considerations of using reflection high-energy electron diffraction, piezoelectricity, interferometry and gravimetric methods for thin film thickness measurements. The results of the study can be used for selecting an optimal method of obtaining thin films when conducting theoretical and applied research.

The Determination of Elemental Composition, Thickness and Crystalline Phases in Single and Multi-Layer Thin Films

1989 ◽  
Vol 33 ◽  
pp. 197-204
Author(s):  
R. A. Brown ◽  
K. Toda ◽  
R. L. Wilson
Keyword(s):  
Thin Film ◽  
Thin Films ◽  
Film Thickness ◽  
Elemental Composition ◽  
Crystalline Phases ◽  
Film Composition ◽  
Layer Thin Film

The purpose of this paper is to show how XRD and XRF can be used as complimentary tools to determine multi-layer thin film composition, both elemental and crystalline, as well as film thickness.

scholarly journals Thin Film Thickness and Grain Structure Determination of Ferroelectric SrBi2Ta2O9 with Cross-Sectional Atomic Force Microscopy

2002 ◽  
Vol 8 (S02) ◽  
pp. 774-775
Author(s):  
D.L. Pechkis ◽  
C. Caragianis-Broadbridge ◽  
A.H. Lehman ◽  
K. L. Klein ◽  
J.-P. Han ◽  
...  
Keyword(s):  
Thin Film ◽  
Atomic Force Microscopy ◽  
Film Thickness ◽  
Structure Determination ◽  
Grain Structure ◽  
Thin Film Thickness ◽  
Cross Sectional ◽  
Force Microscopy ◽  
Atomic Force

Effects of Annealing Treatment on WO3 Thin Films Prepared by DC Reactive Magnetron Sputtering

2014 ◽  
Vol 979 ◽  
pp. 248-250 ◽  
Author(s):  
Thanat Srichaiyaperk ◽  
Kamon Aiempanakit ◽  
Mati Horprathum ◽  
Pitak Eiamchai ◽  
Chanunthorn Chananonnawathorn ◽  
...  
Keyword(s):  
Thin Film ◽  
Thin Films ◽  
Optical Properties ◽  
Magnetron Sputtering ◽  
Film Thickness ◽  
Annealing Temperature ◽  
Annealing Treatment ◽  
Reactive Magnetron ◽  
Thin Film Thickness ◽  
Dc Reactive Magnetron Sputtering

Tungsten trioxide (WO3) thin films were prepared by a DC reactive magnetron sputtering technique. The thin film fabrication process used tungsten (99.995%) as the sputtering target, the mixture of argon and oxygen as sputtering and reactive gases, and silicon (100) and glass slides as the substrates. The effects of annealing temperature in the range of 200-400°C on physical and optical properties of the WO3 thin films were investigated. The nanostructures and morphologies of these films were characterized by grazing-incident X-ray diffraction (GIXRD) and field-emission scanning electron microscopy (FE-SEM). The optical properties were analyzed by variable-angle spectroscopic ellipsometry (VASE) and spectrophotometer. From the XRD results, the as-deposited and annealed WO3 thin films up to 300°C were all amorphous. Only the WO3 thin film annealed at 400°C exhibited a polycrystalline monoclinic phase. The FE-SEM cross-sections and surface topologies demonstrated nearly identical thin-film thickness and physical grain sizes. The SE analyses showed that the thin films were all homogeneous dense layers with additional surface roughness. With the annealing treatment, the thin film thickness was slightly decreased. The SE physical model was best optimized with the Cauchy optical model. The results showed that the refractive index at 550 nm was increased from 2.17 to 2.23 with the increased annealing temperature. The results from the spectrophotometer confirmed that the optical spectra for the WO3 thin films were decreased. This study demonstrated that, the thin film annealed at 400°C exhibited the slightly lower transparency, which corresponded to the results from the GIXRD and SE analyses.

Sign in / Sign up

Export Citation Format

Share Document