Surface Metrology Principles for Snow and Ice Friction Studies

Recent advances in surface metrology science are applied to understanding friction with snow and ice. Conventional surface metrology’s measurement, analyses, and characterizations, have inherent limitations for elucidating tribological interactions. Strong functional correlations and confident discriminations with slider surface topographies, textures, or “roughness”, have largely eluded researchers using conventional methods. Building on 4 decades of research using multiscale geometric methods, two surface metrology axioms and corollaries are proposed with good potential to provide new technological insights.

Discrimination of Surface Topographies Created by Two-Stage Process by Means of Multiscale Analysis

The fundamental issue in surface metrology is to provide methods that can allow the establishment of correlations between measured topographies and performance or processes, or that can discriminate confidently topographies that are processed or performed differently. This article presents a set of topographies from two-staged processed steel rings, measured with a 3D contact profilometer. Data were captured individually from four different regions, namely the top, bottom, inner, and outer surfaces. The rings were manufactured by drop forging and hot rolling. Final surface texture was achieved by mass finishing with spherical ceramic media or cut wire. In this study, we compared four different multiscale methods: sliding bandpass filtering, three geometric length- and area-scale analyses, and the multiscale curvature tensor approach. In the first method, ISO standard parameters were evaluated as a function of the central wavelength and bandwidth for measured textures. In the second and third method, complexity and relative length and area were utilized. In the last, multiscale curvature tensor statistics were calculated for a range of scales from the original sampling interval to its forty-five times multiplication. These characterization parameters were then utilized to determine how confident we can discriminate (through F-test) topographies between regions of the same specimen and between topographies resulting from processing with various technological parameters. Characterization methods that focus on the geometrical properties of topographic features allowed for discrimination at the finest scales only. Bandpass filtration and basic height parameters Sa and Sq proved to confidently discriminate against all factors at all three considered bandwidths.

Thickness Effect on Some Physical Properties of RF Sputtered ZnTe Thin Films for Potential Photovoltaic Applications

Zinc telluride thin films with different thicknesses were grown onto glass substrates by the rf magnetron sputtering technique, using time as a variable growth parameter. All other deposition process parameters were kept constant. The deposited thin films with thickness from 75 to 460 nm were characterized using X-ray diffraction, electron microscopy, atomic force microscopy, ellipsometry, and UV-Vis spectroscopy, to evaluate their structures, surface morphology, topology, and optical properties. It was found out that the deposition time increase leads to a larger growth rate. This determines significant changes on the ZnTe thin film structures and their surface morphology. Characteristic surface metrology parameter values varied, and the surface texture evolved with the thickness increase. Optical bandgap energy values slightly decreased as the thickness increased, while the mean grains radius remained almost constant at ~9 nm, and the surface to volume ratio of the films decreased by two orders of magnitude. This study is the first (to our knowledge) that thoroughly considered the correlation of film thickness with ZnTe structuring and surface morphology characteristic parameters. It adds value to the existing knowledge regarding ZnTe thin film fabrication, for various applications in electronic and optoelectronic devices, including photovoltaics.