scholarly journals What Is the Real State of Single-Atom Catalysts under Electrochemical Conditions—From Adsorption to Surface Pourbaix Plots?

Catalysts ◽  
2021 ◽  
Vol 11 (10) ◽  
pp. 1207
Author(s):  
Ana S. Dobrota ◽  
Tanja Đokić ◽  
Natalia V. Skorodumova ◽  
Slavko V. Mentus ◽  
Igor A. Pašti
Keyword(s):  
Active Sites ◽  
Density Functional ◽  
High Vacuum ◽  
Theoretical Models ◽  
Operating Conditions ◽  
Ultra High Vacuum ◽  
Ex Situ ◽  
Single Atom ◽  
Experimental Conditions ◽  
Metal Centers

The interest in single-atom catalysts (SACs) is increasing, as these materials have the ultimate level of catalyst utilization, while novel reactions where SACs are used are constantly being discovered. However, to properly understand SACs and to further improve these materials, it is necessary to consider the nature of active sites under operating conditions. This is particularly important when SACs are used as electrocatalysts due to harsh experimental conditions, including extreme pH values or high anodic and cathodic potential. In this contribution, density functional theory-based thermodynamic modelling is used to address the nature of metal centers in SACs formed by embedding single metal atoms (Ru, Rh, Ir, Ni, Pd, Pt, Cu, Ag, and Au) into graphene monovacancy. Our results suggest that none of these SAC metal centers are clean at any potential or pH in the water thermodynamic stability region. Instead, metal centers are covered with Hads, OHads, or Oads, and in some cases, we observed the restructuring of the metal sites due to oxygen incorporation. Based on these findings, it is suggested that setting up theoretical models for SAC modelling and the interpretation of ex situ characterization results using ultra-high vacuum (UHV) techniques requires special care, as the nature of SAC active sites under operating conditions can significantly diverge from the basic models or the pictures set by the UHV measurements.

scholarly journals Application of Scanning Tunneling Microscopy in Electrocatalysis and Electrochemistry

2021 ◽  
Author(s):  
Haifeng Feng ◽  
Xun Xu ◽  
Yi Du ◽  
Shi Xue Dou
Keyword(s):  
Scanning Tunneling Microscopy ◽  
Active Sites ◽  
Rational Design ◽  
High Vacuum ◽  
Operating Conditions ◽  
Ultra High Vacuum ◽  
Surface Structures ◽  
Scanning Tunneling ◽  
Detailed Knowledge ◽  
Tunneling Microscopy

Abstract Scanning tunneling microscopy (STM) has gained increasing attention in the field of electrocatalysis due to its ability to reveal electrocatalyst surface structures down to the atomic level in either ultra-high-vacuum (UHV) or harsh electrochemical conditions. The detailed knowledge of surface structures, surface electronic structures, surface active sites as well as the interaction between surface adsorbates and electrocatalysts is highly beneficial in the study of electrocatalytic mechanisms and for the rational design of electrocatalysts. Based on this, this review will discuss the application of STM in the characterization of electrocatalyst surfaces and the investigation of electrochemical interfaces between electrocatalyst surfaces and reactants. Based on different operating conditions, UHV-STM and STM in electrochemical environments (EC-STM) are discussed separately. This review will also present emerging techniques including high-speed EC-STM, scanning noise microscopy and tip-enhanced Raman spectroscopy. Graphic Abstract

An in situ and ex situ TEM study of the formation of thin cobalt silicide films by molecular beam epitaxy on the silicon (100) surface

1988 ◽  
Vol 46 ◽  
pp. 884-885
Author(s):  
D. Loretto ◽  
J. M. Gibson ◽  
S. M. Yalisove ◽  
R. T. Tung
Keyword(s):  
Molecular Beam Epitaxy ◽  
Molecular Beam ◽  
Defect Density ◽  
High Vacuum ◽  
Ultra High Vacuum ◽  
Ex Situ ◽  
Metal Base ◽  
In Situ Experiments ◽  
Potential Applications

The cobalt disilicide/silicon system has potential applications as a metal-base and as a permeable-base transistor. Although thin, low defect density, films of CoSi2 on Si(111) have been successfully grown, there are reasons to believe that Si(100)/CoSi2 may be better suited to the transmission of electrons at the silicon/silicide interface than Si(111)/CoSi2. A TEM study of the formation of CoSi2 on Si(100) is therefore being conducted. We have previously reported TEM observations on Si(111)/CoSi2 grown both in situ, in an ultra high vacuum (UHV) TEM and ex situ, in a conventional Molecular Beam Epitaxy system.The procedures used for the MBE growth have been described elsewhere. In situ experiments were performed in a JEOL 200CX electron microscope, extensively modified to give a vacuum of better than 10-9 T in the specimen region and the capacity to do in situ sample heating and deposition. Cobalt was deposited onto clean Si(100) samples by thermal evaporation from cobalt-coated Ta filaments.

Transmission Electron Microscopy of Epitaxial silicides grown by ultra high vacuum deposition

1989 ◽  
Vol 47 ◽  
pp. 462-463
Author(s):  
D. Loretto ◽  
J. M. Gibson ◽  
S. M. Yalisove
Keyword(s):  
Electron Microscopy ◽  
Transmission Electron Microscopy ◽  
Electron Diffraction ◽  
High Vacuum ◽  
High Energy ◽  
Energy Electron ◽  
Ultra High Vacuum ◽  
Ex Situ ◽  
Transmission Electron

The silicides CoSi2 and NiSi2 are both metallic with the fee flourite structure and lattice constants which are close to silicon (1.2% and 0.6% smaller at room temperature respectively) Consequently epitaxial cobalt and nickel disilicide can be grown on silicon. If these layers are formed by ultra high vacuum (UHV) deposition (also known as molecular beam epitaxy or MBE) their thickness can be controlled to within a few monolayers. Such ultrathin metal/silicon systems have many potential applications: for example electronic devices based on ballistic transport. They also provide a model system to study the properties of heterointerfaces. In this work we will discuss results obtained using in situ and ex situ transmission electron microscopy (TEM).In situ TEM is suited to the study of MBE growth for several reasons. It offers high spatial resolution and the ability to penetrate many monolayers of material. This is in contrast to the techniques which are usually employed for in situ measurements in MBE, for example low energy electron diffraction (LEED) and reflection high energy electron diffraction (RHEED), which are both sensitive to only a few monolayers at the surface.

Coverage and Stability of NHx Terminated Cobalt and Ruthenium Surfaces: a First Principles Investigation

2019 ◽  
Author(s):  
Ji Liu ◽  
Michael Nolan
Keyword(s):  
Metal Surfaces ◽  
High Vacuum ◽  
Atomic Layer ◽  
Nitrogen Plasma ◽  
Operating Conditions ◽  
Ultra High Vacuum ◽  
Bridge Site ◽  
Stable Surface ◽  
Saturation Coverage ◽  
The Stability

<div>In the atomic layer deposition (ALD) of Cobalt (Co) and Ruthenium (Ru) metal using nitrogen plasma, the structure and composition of the post N-plasma NHx terminated (x = 1 or 2) metal surfaces are not well known but are important in the subsequent metal containing pulse. In this paper, we use the low-index (001) and (100) surfaces of Co and Ru as models of the metal polycrystalline thin films. The (001) surface with a hexagonal surface structure is the most stable surface and the (100) surface with a zigzag structure is the least stable surface but has high reactivity. We investigate the stability of NH and NH2 terminations on these surfaces to determine the saturation coverage of NHx on Co and Ru. NH is most stable in the hollow hcp site on (001) surface and the bridge site on the (100) surface, while NH2 prefers the bridge site on both (001) and (100) surfaces. The differential energy is calculated to find the saturation coverage of NH and NH2. We also present results on mixed NH/NH2-terminations. The results are analyzed by thermodynamics using Gibbs free energies (ΔG) to reveal temperature effects on the stability of NH and NH2 terminations. Ultra-high vacuum (UHV) and standard ALD</div><div>operating conditions are considered. Under typical ALD operating conditions we find that the most stable NHx terminated metal surfaces are 1 ML NH on Ru (001) surface (350K-550K), 5/9 ML NH on Co (001) surface (400K-650K) and a mixture of NH and NH2 on both Ru (100) and Co (100) surfaces.</div>

scholarly journals Engineering single-atomic ruthenium catalytic sites on defective nickel-iron layered double hydroxide for overall water splitting

2021 ◽  
Vol 12 (1) ◽  
Author(s):  
Panlong Zhai ◽  
Mingyue Xia ◽  
Yunzhen Wu ◽  
Guanghui Zhang ◽  
Junfeng Gao ◽  
...  
Keyword(s):  
Hydrogen Evolution ◽  
Water Splitting ◽  
Layered Double Hydroxide ◽  
Hydrogen Evolution Reaction ◽  
Active Sites ◽  
Density Functional ◽  
Rational Design ◽  
Single Atom ◽  
Nickel Iron ◽  
Double Hydroxide

AbstractRational design of single atom catalyst is critical for efficient sustainable energy conversion. However, the atomic-level control of active sites is essential for electrocatalytic materials in alkaline electrolyte. Moreover, well-defined surface structures lead to in-depth understanding of catalytic mechanisms. Herein, we report a single-atomic-site ruthenium stabilized on defective nickel-iron layered double hydroxide nanosheets (Ru1/D-NiFe LDH). Under precise regulation of local coordination environments of catalytically active sites and the existence of the defects, Ru1/D-NiFe LDH delivers an ultralow overpotential of 18 mV at 10 mA cm−2 for hydrogen evolution reaction, surpassing the commercial Pt/C catalyst. Density functional theory calculations reveal that Ru1/D-NiFe LDH optimizes the adsorption energies of intermediates for hydrogen evolution reaction and promotes the O–O coupling at a Ru–O active site for oxygen evolution reaction. The Ru1/D-NiFe LDH as an ideal model reveals superior water splitting performance with potential for the development of promising water-alkali electrocatalysts.

scholarly journals Nitrile versus isonitrile adsorption at interstellar grain surfaces

2017 ◽  
Vol 608 ◽  
pp. A50 ◽  
Author(s):  
M. Bertin ◽  
M. Doronin ◽  
X. Michaut ◽  
L. Philippe ◽  
A. Markovits ◽  
...  
Keyword(s):  
Density Functional ◽  
Surface Defects ◽  
High Vacuum ◽  
Solid Support ◽  
Ultra High Vacuum ◽  
Structural Defects ◽  
Adsorption Energies ◽  
The Difference ◽  
Temperature Programmed ◽  
Open Question

Context. Almost 20% of the ~200 different species detected in the interstellar and circumstellar media present a carbon atom linked to nitrogen by a triple bond. Of these 37 molecules, 30 are nitrile R-CN compounds, the remaining 7 belonging to the isonitrile R-NC family. How these species behave in their interactions with the grain surfaces is still an open question. Aims. In a previous work, we have investigated whether the difference between nitrile and isonitrile functional groups may induce differences in the adsorption energies of the related isomers at the surfaces of interstellar grains of various nature and morphologies. This study is a follow up of this work, where we focus on the adsorption on carbonaceous aromatic surfaces. Methods. The question is addressed by means of a concerted experimental and theoretical approach of the adsorption energies of CH3CN and CH3NC on the surface of graphite (with and without surface defects). The experimental determination of the molecule and surface interaction energies is carried out using temperature-programmed desorption in an ultra-high vacuum between 70 and 160 K. Theoretically, the question is addressed using first-principle periodic density functional theory to represent the organised solid support. Results. The adsorption energy of each compound is found to be very sensitive to the structural defects of the aromatic carbonaceous surface: these defects, expected to be present in a large numbers and great diversity on a realistic surface, significantly increase the average adsorption energies to more than 50% as compared to adsorption on perfect graphene planes. The most stable isomer (CH3CN) interacts more efficiently with the carbonaceous solid support than the higher energy isomer (CH3NC), however.

scholarly journals Precise nanoscale temperature mapping in operational microelectronic devices by use of a phase change material

2020 ◽  
Vol 10 (1) ◽  
Author(s):  
Qilong Cheng ◽  
Sukumar Rajauria ◽  
Erhard Schreck ◽  
Robert Smith ◽  
Na Wang ◽  
...  
Keyword(s):  
Thin Film ◽  
Phase Change ◽  
Phase Change Material ◽  
Heat Dissipation ◽  
Radiation Thermometry ◽  
High Vacuum ◽  
Operating Conditions ◽  
Ultra High Vacuum ◽  
Scanning Thermal Microscopy ◽  
Change Material

AbstractThe microelectronics industry is pushing the fundamental limit on the physical size of individual elements to produce faster and more powerful integrated chips. These chips have nanoscale features that dissipate power resulting in nanoscale hotspots leading to device failures. To understand the reliability impact of the hotspots, the device needs to be tested under the actual operating conditions. Therefore, the development of high-resolution thermometry techniques is required to understand the heat dissipation processes during the device operation. Recently, several thermometry techniques have been proposed, such as radiation thermometry, thermocouple based contact thermometry, scanning thermal microscopy, scanning transmission electron microscopy and transition based threshold thermometers. However, most of these techniques have limitations including the need for extensive calibration, perturbation of the actual device temperature, low throughput, and the use of ultra-high vacuum. Here, we present a facile technique, which uses a thin film contact thermometer based on the phase change material $$Ge_2 Sb_2 Te_5$$ G e 2 S b 2 T e 5 , to precisely map thermal contours from the nanoscale to the microscale. $$Ge_2 Sb_2 Te_5$$ G e 2 S b 2 T e 5 undergoes a crystalline transition at $$\hbox {T}_{{g}}$$ T g with large changes in its electric conductivity, optical reflectivity and density. Using this approach, we map the surface temperature of a nanowire and an embedded micro-heater on the same chip where the scales of the temperature contours differ by three orders of magnitude. The spatial resolution can be as high as 20 nanometers thanks to the continuous nature of the thin film.

Eine Methode zur Messung geringster Ölbedeckungen in Vakuumsystemen

1967 ◽  
Vol 22 (4) ◽  
pp. 549-553 ◽  
Author(s):  
R. Dobrozemsky ◽  
W. K. Huber ◽  
F. Viehböck
Keyword(s):  
High Vacuum ◽  
High Sensitivity ◽  
Radioactive Tracer ◽  
Operating Conditions ◽  
Ultra High Vacuum ◽  
Vacuum System ◽  
First Results ◽  
Tracer Isotope ◽  
Radioactive Tracer Method ◽  
Vacuum Systems

To get information on extremely small organic deposits in ultra high vacuum systems the sensitivity of most of the conventional methods for thickness measurements is not high enough. On the other hand the radioactive tracer method has shown its high sensitivity and wide versatility in many fields. Tritium with a half life of 12.3 γ and a mean β-energy of 5.4 keV was choosen as tracer isotope. A method is described for Tritium-labelling diffusion pump oils with specific activities up to 100 mC/g. Using the liquid scintillation counting technique one can detect deposits down to below 1010 molecules/cm2. First results with this Tritium labelled pump fluid are given under different operating conditions in an all metal ultra high vacuum system.

scholarly journals How Stable Are 2H-MoS2 Edges Under Hydrogen Evolution Reaction Conditions?

2021 ◽  
Author(s):  
Nawras Abidi ◽  
Audrey Bonduelle-Skrzypczak ◽  
Stephan Steinmann
Keyword(s):  
Hydrogen Evolution ◽  
Hydrogen Evolution Reaction ◽  
Active Sites ◽  
Density Functional ◽  
External Source ◽  
Operating Conditions ◽  
Adsorbed Hydrogen ◽  
Functional Theory ◽  
Acidic Conditions

MoS<sub>2</sub>, have emerged as a promising class of electrocatalysts for the production of H<sub>2</sub> via the hydrogen evolution reaction (HER) in acidic conditions.<div>The edges of MoS<sub>2</sub> are known for their HER activity, but their precise atomistic nature and stability under HER conditions is not yet known. In contrast to other typical uses of MoS<sub>2</sub> as a catalyst, under HER there is no external source of sulfur. Therefore, the sulfidation of the edges can only decrease under operating conditions and the thermodynamics of the process are somewhat ill-defined. Our results suggest that the 50%S S-edge may be active for HER via the Volmer-Tafel mechanism and is, despite a high H coverage, stable with respect to H<sub>2</sub>S release. </div><div>At the 50%S Mo-edge, the adsorbed hydrogen opens the way for H<sub>2</sub>S release, leading to the 0%S Mo-edge, which was previously investigated and found to be HER active. HER being a water-based process, we also considered the effect of the presence of H<sub>2</sub>O and the in-situ formation of OH. For the 50%S Mo-edge, H<sub>2</sub>O is only very weakly adsorbed and OH formation is unfavorable. Nevertheless, OH assists the loss of sulfur coverage, leading to OH-based HER active sites. In contrast, OH is strongly adsorbed on the 50%S S-edge. By explicitly considering the electrochemical potential using grand-canonical density functional theory, we unveil that the Volmer-Heyrovsky mechanism on sulfur sites is still accessible in the presence of surface OH at the 50%S S-edge. However, the 50%S S-edge is found to be mildly unstable with respect to H<sub>2</sub>S in the presence of water/OH. Hence, we suggest that the 50%S S-edge evolves over time towards a 0%S S-edge, covered by surface OH that will block permanently the active sites. </div>

scholarly journals Effect of H Adsorption on the Magnetic Properties of an Fe Island on a W(110) Surface

2019 ◽  
Author(s):  
Marko Melander ◽  
Hannes Jonsson
Keyword(s):  
Magnetic Properties ◽  
Data Storage ◽  
Density Functional ◽  
Hydrogen Adsorption ◽  
High Vacuum ◽  
Ultra High Vacuum ◽  
Generalized Gradient ◽  
Functional Theory ◽  
Low Dimensional ◽  
Low Dimensional Materials

<p>Low-dimensional materials, such as ultrathin films, nanoislands and wires, are actively being researched due to their interesting magnetic properties and possible technological applications for example in high density data storage. Results of calculations of an Fe nanoisland on a W(110) support are presented here with particular focus on the effect of hydrogen adsorption on its magnetic properties. This is an important consideration since hydrogen is present even under ultra-high vacuum conditions. The calculations are based on density functional theory within the generalized gradient approximation. The adsorption of H atoms is found to strongly decrease the magnetic moment of the Fe atoms they are bound to, down to less than a half in some cases as compared with the clean Fe island. The results show that it may be important to take the presence of hydrogen into account in measurements of magnetic properties of nanoislands.</p>

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