scholarly journals Comparative Study on Water Vapour Resistance of Poly(Lactic Acid) Films Prepared by Blending, Filling and Surface Deposit

Membranes ◽  
2021 ◽  
Vol 11 (12) ◽  
pp. 915
Author(s):  
Shuo Wang ◽  
Qinyu Shen ◽  
Chuanyan Guo ◽  
Hongge Guo
Keyword(s):  
Water Vapour ◽  
Transmission Rate ◽  
Film Surface ◽  
Atomic Layer ◽  
Poly Lactic Acid ◽  
Surface Deposit ◽  
Layer Deposition ◽  
Surface Contact Angle ◽  
Water Vapour Resistance ◽  
Deposition Effect

The polylactic acid (PLA) resin Ingeo 4032D was selected as the research object, with a focus on PLA modification by using polymers such as linear low-density polyethylene (LLDPE), high-density polyethylene (HDPE) and ethylene–propylene-diene monomer grafted with glycidyl methacrylate (EPDM-g-GMA), by using fillers such as nano calcium carbonate and zeolite. In order to characterize the deposition effect of Al2O3 on the film surface by plasma-assisted atomic layer deposition, Bio-oriented PLA (BOPLA) with more uniform thickness than blown film was purchased for study. The mechanical properties, friction coefficient, surface contact angle and water vapour transmission rate of the modified PLA film were compared and discussed. The aim was to find out the most influencing factors of film’s water vapour resistance.

Atomic Layer Deposition of Chalcogenides for Next-Generation Phase Change Memory

2021 ◽  
Author(s):  
Yoon Kyeung Lee ◽  
Chanyoung Yoo ◽  
Woohyun Kim ◽  
Jeongwoo Jeon ◽  
Cheol Seong Hwang
Keyword(s):  
Thin Film ◽  
Atomic Layer Deposition ◽  
Film Growth ◽  
Phase Change Memory ◽  
Film Surface ◽  
Atomic Layer ◽  
Thin Film Growth ◽  
Growth Technique ◽  
Layer Deposition ◽  
Change Memory

Atomic layer deposition (ALD) is a thin film growth technique that uses self-limiting, sequential reactions localized at the growing film surface. It guarantees exceptional conformality on high-aspect-ratio structures and controllability...

A Study of Atomic Layer Deposition and Reactive Plasma Compatibilitywith Mesoporous Organosilicate Glass Films

2003 ◽  
Vol 766 ◽  
Author(s):  
E. Todd Ryan ◽  
Melissa Freeman ◽  
Lynne Svedberg ◽  
J.J. Lee ◽  
Todd Guenther ◽  
...  
Keyword(s):  
Pore Structure ◽  
Film Surface ◽  
Atomic Layer ◽  
Metal Deposition ◽  
Carbon Doped ◽  
Layer Deposition ◽  
Reactive Plasma ◽  
Mesoporous Film ◽  
Organosilicate Glass ◽  
Positron Lifetime Spectroscopy

AbstractThe compatibility of ALD and CVD metal deposition with mesoporous and microporous carbon-doped organosilicate glass (OSG) films was examined. Blanket film studies using TEM, TOF-SIMS, and positron lifetime spectroscopy demonstrate that ALD Wand TaN penetrate deep into the mesoporous film via the film's connected pore structure. In contrast, metal penetration into microporous OSG films was not observed. He and NH3 plasma pretreatments to the mesoporous OSG film surface did not seal the mesopores to ALD metal penetration, but the plasmas did damage the bulk of the mesoporous OSG film with varying severity. The results indicate that porosity, pore size, and/or pore structure regulate ALD/CVD precursor diffusion and that ALD metal deposition is a good probe of pore sealing strategies.

scholarly journals Modelling water vapour permeability through atomic layer deposition coated photovoltaic barrier defects

2014 ◽  
Vol 570 ◽  
pp. 101-106 ◽  
Author(s):  
Mohamed Elrawemi ◽  
Liam Blunt ◽  
Leigh Fleming ◽  
David Bird ◽  
David Robbins ◽  
...  
Keyword(s):  
Atomic Layer Deposition ◽  
Water Vapour ◽  
Atomic Layer ◽  
Water Vapour Permeability ◽  
Vapour Permeability ◽  
Layer Deposition

Atomic layer deposition effect on the electrical properties of Al2O3-passivated PbS quantum dot field-effect transistors

2015 ◽  
Vol 106 (9) ◽  
pp. 093507 ◽  
Author(s):  
Hye-Mi So ◽  
Hyekyoung Choi ◽  
Hyung Cheoul Shim ◽  
Seung-Mo Lee ◽  
Sohee Jeong ◽  
...  
Keyword(s):  
Electrical Properties ◽  
Atomic Layer Deposition ◽  
Quantum Dot ◽  
Field Effect ◽  
Field Effect Transistors ◽  
Atomic Layer ◽  
Layer Deposition ◽  
Deposition Effect ◽  
Pbs Quantum Dot

scholarly journals Characterization of oxide barrier layers prepared by atomic layer deposition

2017 ◽  
Vol 9 (7) ◽  
pp. 168781401771180 ◽  
Author(s):  
Fa-Ta Tsai ◽  
Ching-Kong Chao ◽  
Kai-Jyun Jhong ◽  
Rwei-Ching Chang
Keyword(s):  
Water Vapor ◽  
Atomic Layer Deposition ◽  
Layer Structure ◽  
Transmission Rate ◽  
Single Layer ◽  
Atomic Layer ◽  
Optical Transmittance ◽  
Double Layer Structure ◽  
Layer Deposition ◽  
Water Vapor Transmission

Atomic layer deposition has become an important thin-film growth technique for producing gas diffusion barriers because of its low process temperature and its ability to produce uniform films. In this work, atomic layer deposition was used to deposit various Al2O3 and ZnO thin films on polyethylene terephthalate substrates; subsequently, the physical properties and water vapor transmission rates of the films were characterized. Single and hybrid films (Al2O3, ZnO, Al2O3/ZnO, and ZnO/Al2O3) with thicknesses of 25, 50, and 100 nm at a deposition temperature of 60°C were investigated. The deposited films were characterized for surface roughness, optical transmittance, adhesion, water vapor transmission rate, and contact angle. The results showed that the double-layer structure provided a higher water vapor transmission rate and higher adhesion strength than those of the single-layer structure although both the surface roughness and optical transmittance of the single-layer structure were slightly better than those of the double-layer structure. The results revealed that the atomic layer deposition-grown hybrids could act as water vapor barriers.

Rare earth scandate thin films by atomic layer deposition: effect of the rare earth cation size

2010 ◽  
Vol 20 (20) ◽  
pp. 4207 ◽  
Author(s):  
Pia Myllymäki ◽  
Martin Roeckerath ◽  
Joao Marcelo Lopes ◽  
Jürgen Schubert ◽  
Kenichiro Mizohata ◽  
...  
Keyword(s):  
Thin Films ◽  
Rare Earth ◽  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
Rare Earth Cation ◽  
Layer Deposition ◽  
Earth Cation ◽  
Deposition Effect ◽  
Cation Size ◽  
The Rare Earth
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