Pulse methods of strengthening nanocrystalline carbon coatings deposition

2021 ◽  
pp. 93-96
Author(s):  
Yu.V. Panfilov
Keyword(s):  
Magnetron Sputtering ◽  
Pulsed Laser ◽  
Ion Beams ◽  
Film Deposition ◽  
Laser Deposition ◽  
Vacuum Arc ◽  
Amorphous Coating ◽  
Nanostructured Film ◽  
Carbon Coatings ◽  
Pulsed Deposition

The most known methods of pulsed thin strengthening nanostructured film deposition such as magnetron sputtering HiPIMS, pulsed laser deposition PLD, vacuum arc pulsed deposition, high-intensity pulsed ion beams deposition HIPIB, as well, were described and analysed. It was shown that the stream of material, generated by means of a pulsed action, impacts to substrate and creates preconditions for nanocrystalline amorphous coating manufacture with superhigh hardness.

Pulsed Laser Deposition History and Laser-Target Interactions

MRS Bulletin ◽  
1992 ◽  
Vol 17 (2) ◽  
pp. 30-36 ◽  
Author(s):  
Jeff Cheung ◽  
Jim Horwitz
Keyword(s):  
Thin Film ◽  
Laser Beam ◽  
Pulsed Laser Deposition ◽  
Mechanical Energy ◽  
Pulsed Laser ◽  
Thin Film Deposition ◽  
Film Deposition ◽  
Laser Deposition ◽  
Small Branch ◽  
The Impact

The laser, as a source of “pure” energy in the form of monochromatic and coherent photons, is enjoying ever increasing popularity in diverse and broad applications from drilling micron-sized holes on semiconductor devices to guidance systems used in drilling a mammoth tunnel under the English Channel. In many areas such as metallurgy, medical technology, and the electronics industry, it has become an irreplaceable tool.Like many other discoveries, the various applications of the laser were not initially defined but were consequences of natural evolution led by theoretical studies. Shortly after the demonstration of the first laser, the most intensely studied theoretical topics dealt with laser beam-solid interactions. Experiments were undertaken to verify different theoretical models for this process. Later, these experiments became the pillars of many applications. Figure 1 illustrates the history of laser development from its initial discovery to practical applications. In this tree of evolution, Pulsed Laser Deposition (PLD) is only a small branch. It remained relatively obscure for a long time. Only in the last few years has his branch started to blossom and bear fruits in thin film deposition.Conceptually and experimentally, PLD is extremely simple, probably the simplest among all thin film growth techniques. Figure 2 shows a schematic diagram of this technique. It uses pulsed laser radiation to vaporize materials and to deposit thin films in a vacuum chamber. However, the beam-solid interaction that leads to evaporation/ablation is a very complex physical phenomenon. The theoretical description of the mechanism is multidisciplinary and combines equilibrium and nonequilibrium processes. The impact of a laser beam on the surface of a solid material, electromagnetic energy is converted first into electronic excitation and then into thermal, chemical, and even mechanical energy to cause evaporation, ablation, excitation, and plasma formation.

scholarly journals Polymer assisted deposition of epitaxial oxide thin films

2018 ◽  
Vol 6 (15) ◽  
pp. 3834-3844 ◽  
Author(s):  
José Manuel Vila-Fungueiriño ◽  
Beatriz Rivas-Murias ◽  
Juan Rubio-Zuazo ◽  
Adrian Carretero-Genevrier ◽  
Massimo Lazzari ◽  
...  
Keyword(s):  
Thin Film ◽  
Molecular Beam ◽  
High Vacuum ◽  
Pulsed Laser ◽  
Thin Film Deposition ◽  
Film Deposition ◽  
Laser Deposition ◽  
Chemical Solution ◽  
Solution Methods ◽  
Epitaxial Oxide

Chemical solution methods for thin-film deposition constitute an affordable alternative to high-vacuum physical technologies, like Sputtering, Pulsed Laser Deposition (PLD) or Molecular Beam Epitaxy (MBE).

scholarly journals Properties of carbon coatings obtained by pulsed high power methods of vacuum-arc and magnetron sputtering

2018 ◽  
Vol 5 (12) ◽  
pp. 25933-25938
Author(s):  
Alexander I. Poplavsky ◽  
Alexander Ya. Kolpakov ◽  
Marina E. Galkina ◽  
Marina G. Kovaleva ◽  
Maksim N. Japrintsev ◽  
...  
Keyword(s):  
Magnetron Sputtering ◽  
High Power ◽  
Vacuum Arc ◽  
Carbon Coatings

Pulsed laser deposition of hard carbon coatings at atmospheric pressure

2003 ◽  
Vol 33 (3) ◽  
pp. 189-191 ◽  
Author(s):  
Taras V Kononenko ◽  
Vitalii I Konov ◽  
Evgenii N Lubnin ◽  
F Dausinger
Keyword(s):  
Pulsed Laser Deposition ◽  
Atmospheric Pressure ◽  
Pulsed Laser ◽  
Laser Deposition ◽  
Hard Carbon ◽  
Carbon Coatings

Plasma diagnostics of hybrid magnetron sputtering and pulsed laser deposition

2006 ◽  
Vol 201 (7) ◽  
pp. 4040-4045 ◽  
Author(s):  
J.G. Jones ◽  
C. Muratore ◽  
A.R. Waite ◽  
A.A. Voevodin
Keyword(s):  
Magnetron Sputtering ◽  
Pulsed Laser Deposition ◽  
Plasma Diagnostics ◽  
Pulsed Laser ◽  
Laser Deposition

SrTiO3 Thin Films Deposition Using Pulsed Laser Deposition Technique

2013 ◽  
Vol 789 ◽  
pp. 72-75
Author(s):  
Pia Dinari ◽  
Christian Chandra ◽  
Joko Suwardy ◽  
Salim Mustofa ◽  
Yudi Darma
Keyword(s):  
Pulsed Laser Deposition ◽  
Thermal Annealing ◽  
Pulsed Laser ◽  
Film Deposition ◽  
Laser Deposition ◽  
Deposition Technique ◽  
X Ray Diffraction ◽  
Si Substrate ◽  
Thermal Annealing Process ◽  
Thermal Stability Of

Strontium titanate (SrTiO3) thin film has been deposited on Si (100) substrate using pulsed laser deposition technique. Film deposition was carried out at low temperature (150°C) by maintained the pressure at 10-4 Torr. Nanometer-thick SrTiO3 film on Si substrate was characterized using SEM, AFM, XRD, and Raman Spectroscopy. SEM and AFM images show that SrTiO3 film has growth on Si substrate uniformly. Raman and XRD spectroscopy also support the growth of SrTiO3 film on Si substrate. Furthermore, to investigate the effect of post-deposition thermal annealing, the samples were annealed up to 900°C. Thermal stability of SrTiO3/Si structure was studied by mean XRD spectra. The X-Ray Diffraction pattern indicates the crystallinity improvement through atomic arrangements during thermal annealing process.

Comparison Of Aln Films Synthesized By Pulsed Laser Ablation And Magnetron Sputtering Techniques

1997 ◽  
Vol 505 ◽  
Author(s):  
K. Jagannadham ◽  
A. K. Sharma ◽  
Q. Wei ◽  
R. Kalyanraman ◽  
J. Narayan
Keyword(s):  
Magnetron Sputtering ◽  
Secondary Ion Mass Spectrometry ◽  
Pulsed Laser ◽  
Wear Test ◽  
Laser Deposition ◽  
Grinding Method ◽  
Transmission Electron ◽  
Infra Red ◽  
Bonding Characteristics ◽  
Secondary Ion

ABSTRACTA comparative study is reported on the aluminum nitride (AIN) films on Si (111) substrate deposited by pulsed laser deposition and reactive magnetron sputtering. The structure, bonding characteristics, relative impurity levels, and wear resistance have been investigated to compare these films. We have used the techniques such as high resolution transmission electron microscopy, Raman spectroscopy, fourier transform infra-red spectroscopy, secondary ion mass spectrometry, and crater grinding method for wear test, to delineate differences between these AIN films.

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