Electrical Properties of Al2O3 Films Grown by the Electron Cyclotron Resonance Plasma-Enhanced Atomic Layer Deposition (ECR-PEALD) and Thermal ALD Methods
2017 ◽
Vol 27
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pp. 295-300
Dae-Gyu Yang
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Yang-Soo Kim
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Jong-Heon Kim
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Hyoung-Do Kim
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2013 ◽
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pp. 52-55
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Yuqing Xiong
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Lijun Sang
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Qiang Chen
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Lizhen Yang
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Zhengduo Wang
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2010 ◽
Vol 49
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pp. 08JG05
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Byung-Woo Kang
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Woong-Sun Kim
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Chang-Mook Hwang
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Dae-Yong Moon
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Jay-Jung Kim
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2012 ◽
Vol 21
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pp. 078105
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Yu-Qing Xiong
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Xing-Cun Li
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Qiang Chen
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Wen-Wen Lei
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1998 ◽
Vol 16
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B. B. Jagannathan
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W. A. Anderson
1996 ◽
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1991 ◽
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D. A. Carl
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D. W. Hess
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M. A. Lieberman
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T. D. Nguyen
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R. Gronsky
2010 ◽
Vol 518
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pp. S140-S142
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Takayuki Nosaka
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Masao Sakuraba
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Bernd Tillack
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Junichi Murota
1991 ◽
Vol 58
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pp. 604-606
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Norio Yamamoto
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Naoto Kondo
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Yasushi Nanishi
2006 ◽
Vol 45
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pp. 7351-7353
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Yukio Fukuda
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Koji Kato
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Hiroshi Toyota
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Toshiro Ono
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Yoshitaka Nagasato
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2001 ◽
Vol 34
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pp. 1025-1031
Junli Wang
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Hiroshi Nakashima
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Junsi Gao
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Katsunori Muraoka
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