Studies on the Surface of PTFE Membranes Treated with Atmospheric Pressure Low Temperature Plasma of Ar and Ar/H2

2014 ◽  
Vol 1048 ◽  
pp. 440-443
Author(s):  
Naohisa Akashi ◽  
Katsuhiko Hosoi ◽  
Shin-ichi Kuroda
Keyword(s):  
Low Temperature ◽  
Photoelectron Spectroscopy ◽  
Atmospheric Pressure ◽  
Spectroscopic Analysis ◽  
Attenuated Total Reflection ◽  
Low Temperature Plasma ◽  
Temperature Plasma ◽  
X Ray ◽  
Ft Ir ◽  
Ir Spectroscopic

Polytetrafluoroethylene (PTFE) has many excellent engineering applications for its great properties. We investigated the surface of the PTFE membranes treated with atmospheric pressure low temperature plasma in Ar and Ar/H2 to confirm the effectiveness for introducing functional groups as surface modifications. From the results of attenuated total reflection (ATR) Fourier transform infrared (FT-IR) spectroscopic analysis and X-ray photoelectron spectroscopy (XPS), it was found that the Ar/H2 plasma was more effective for proceeding defluorination reactions and introducing oxygen moieties compared to Ar plasma under the experimental condition. On the other hand, from the results of scanning electron microscopy (SEM), there were little differences in plasma-treated samples.

Treatment of Wool Fabrics by Argon Atmospheric Pressure Low Temperature Plasma and its Dyeing

2012 ◽  
Vol 441 ◽  
pp. 49-53
Author(s):  
Hua Qing Wang ◽  
Mei Yang
Keyword(s):  
Low Temperature ◽  
Photoelectron Spectroscopy ◽  
Atmospheric Pressure ◽  
Fiber Surface ◽  
Wool Fabric ◽  
Low Temperature Plasma ◽  
Temperature Plasma ◽  
X Ray ◽  
Wool Fabrics ◽  
Wool Fibers

With the increase in the environmental protection consciousness of people, attention has focused on plasma technology because of its efficiency and environmentally friendliness. In order to improve the dyeing behavior of wool fabrics, surface modification of wool fabrics was carried out using an atmospheric pressure (argon) low temperature plasma treatment (LTP). Morphology and chemical composition analyses of the treated wool fiber surface were carried out by scanning electron microscopy (SEM) and X-ray photoelectron spectroscopy (XPS). The effect on the surface properties of wool fabrics treated for different times was evaluated. The results showed that the coloration of wool fabric is improved with an argon atmospheric pressure low temperature plasma (LTP) treatment but the fabric has a lower color fastness to washing and rubbing. This results from the formation of sulfonic groups and the increase in nitrogen content attributed to more severe etching and oxidization on the surface of wool fibers.

scholarly journals The surface modification by O2 low temperature plasma to improve dyeing properties of Rex rabbit fibers

2019 ◽  
Vol 14 ◽  
pp. 155892501985402
Author(s):  
Ting Su ◽  
Ying Han ◽  
Hongyan Liu ◽  
Lixin Li ◽  
Zongcai Zhang ◽  
...  
Keyword(s):  
Fourier Transform ◽  
Low Temperature ◽  
Plasma Treatment ◽  
Photoelectron Spectroscopy ◽  
Total Reflection ◽  
Attenuated Total Reflection ◽  
Low Temperature Plasma ◽  
Temperature Plasma ◽  
X Ray ◽  
Rex Rabbit

Dyeability of the fiber plays a very important role in the textile industry. The presence of cuticle scales on the surface of Rex rabbit fibers brings difficulties to dyeing process. In this study, O2 low temperature plasma was used to improve the dyeability of Rex rabbit fibers and the two key parameters including the treating time and discharge power were optimized during O2 low temperature plasma treatment. The impact of plasma treatment on the surface morphology, physical-chemical properties, and dyeing behavior of Rex rabbit fibers using anionic dyes were investigated by a series of characterization methods such as scanning electron microscopy, atomic force microscopy, Fourier transform infrared–attenuated total reflection, and X-ray photoelectron spectroscopy. The surface dyeability and color fastness were studied by K/S measurement and washing fastness, respectively. The influence of O2 low temperature plasma treatment on the mechanical properties of Rex rabbit fibers was inspected by the tensile strength measurement. The wettability of the samples was evaluated in terms of wetting time and contact angle. The O2 low temperature plasma treatment resulted in a dramatic improvement in wettability of Rex rabbit fibers. X-ray photoelectron spectroscopy and Fourier transform infrared–attenuated total reflection analysis show that oxygen plasma treatment led to a significant increase in the content of sulfur oxides and polar groups such as (–C=O, –OH, and –NH2) on the fiber surface and resulted in reinforced wettability, dyeing rate and dyeing fixation of Rex rabbit fibers.

Effect of radical on defect and molecular structure of monolayer MoS2 by low temperature plasma treatment

2022 ◽  
Author(s):  
Shuya ASADA ◽  
Akihisa OGINO
Keyword(s):  
Molecular Structure ◽  
Low Temperature ◽  
Plasma Treatment ◽  
Photoelectron Spectroscopy ◽  
Microwave Plasma ◽  
Hydrogen Ions ◽  
Low Temperature Plasma ◽  
Temperature Plasma ◽  
X Ray ◽  
Ar Plasma

Abstract The aim of this study is to form the sulfur defects on monolayer molybdenum disulfide (MoS2) by low temperature microwave plasma treatment suppressing disturbance of molecular structure. CVD-grown and plasma treated multilayer MoS2 surface were analyzed to investigate the effects of H2 and Ar plasma treatment on sulfur defects and molecular structure. It was found that the disturbance of molecular structure was suppressed in the H2 plasma treatment compared to the Ar plasma treatment. Varying the incident ratio of hydrogen ions H+ and radicals H*, the influences of H2 plasma treatment with high and low H*/H+ ratio on monolayer MoS2 structure were discussed. As a result of X-ray photoelectron spectroscopy, Raman spectroscopy and photoluminescence analysis, sulfur defects increased with the increase in total amount of radical incident on MoS2. In addition, it is speculated that the etching with radical contributed to form sulfur defects suppressing the disturbance of molecular structure.

Effect of Low Temperature Plasma Treatment on Surface Properties of Polyphenylene Sulfide Fiber

2012 ◽  
Vol 557-559 ◽  
pp. 1668-1671 ◽  
Author(s):  
Jian Zhong Yang ◽  
Meng Zhao
Keyword(s):  
Low Temperature ◽  
Photoelectron Spectroscopy ◽  
Chemical Etching ◽  
Discharge Plasma ◽  
Breaking Strength ◽  
Polyphenylene Sulfide ◽  
Glow Discharge Plasma ◽  
Low Temperature Plasma ◽  
Temperature Plasma ◽  
X Ray

The performance of the polyphenylene sulfide fiber (PPS) was investigated by low temperature glow discharge plasma . The experimental results show that under the treatment of different plasma conditions, the PPS fiber surfaces appear the varying degree physics and chemical etching. It’s found that the friction coefficient and hydrophilicity of PPS fiber treated by low temperature plasma improve . X-ray photoelectron spectroscopy (XPS) analysis shows that the surface of PPS fiber produced etching, cross-linking, oxidation. Variations of tensile breaking strength of PPS with different parameters are analyzed.

Measurement of Carboxyl Group Separated from a Thin Film Copolymerized by Low-Temperature Plasma at Atmospheric Pressure of C2H2 and CO2

2006 ◽  
Vol 321-323 ◽  
pp. 1332-1335 ◽  
Author(s):  
Hong Lae Sohn ◽  
Young Tae Cho ◽  
Bong Ju Lee
Keyword(s):  
Thin Film ◽  
Low Temperature ◽  
Atmospheric Pressure ◽  
Carboxyl Group ◽  
Low Temperature Plasma ◽  
Temperature Plasma ◽  
Flow Rates ◽  
Co2 Gas ◽  
Plasma Generation ◽  
Ft Ir

We developed a device that makes possible the normal generation of low-temperature plasma under atmospheric pressure. For plasma generation, a radio frequency of rf (13.56 MHz) was used, for plasma gas, helium (He), and for material gases, acetylene (C2H2) and toluene (C6H5CH3) were used. As a result of measuring Fourier transform infrared (FT-IR) after adding the CO2 gas to the generated plasma, the absorption of C=O (carboxyl group) was observed around 1715 cm-1. When the flow rates of the added CO2 increased, the absorption peak increased at the same time, and we knew that this originated from the CO2 molecules.

The Carbonyl Group Measurement of the Membrane Copolymerized by Low-Temperature Plasma at Atmospheric Pressure of C2H2 and CO2

2007 ◽  
Vol 353-358 ◽  
pp. 3088-3091
Author(s):  
Kwang Joon Hong ◽  
Young Nam Chun ◽  
Bong Ju Lee
Keyword(s):  
Low Temperature ◽  
Carbonyl Group ◽  
Atmospheric Pressure ◽  
Absorption Peak ◽  
Low Temperature Plasma ◽  
Temperature Plasma ◽  
Plasma Generation ◽  
Ft Ir ◽  
Normal Production ◽  
The Fourier Transform

We developed a device that makes possible the normal production of low-temperature plasma under atmospheric pressure. For plasma generation, a radio frequency of rf (13.56MHz) was used. From the Fourier transform infrared (FT-IR) analysis, the absorption peak of C=O (the carbonyl group) was observed around 1715 cm-1, and the absorption peak of CH was observed around 2950 cm-1. Of those, from the conclusion that the absorption peak of C=O was proportional to the amount of CO2 added, we discovered that the C=O carbonyl group originated from the CO2 molecules.

Chemical Structures of Native Oxides Formed During Wet Chemical Treatments on NH4F Treated Si(111) Surfaces

1992 ◽  
Vol 259 ◽  
Author(s):  
Takeo Hattori ◽  
Hiroki Ogawa
Keyword(s):  
Photoelectron Spectroscopy ◽  
Attenuated Total Reflection ◽  
Native Oxide ◽  
X Ray ◽  
Chemical Treatments ◽  
Chemical Structures ◽  
Native Oxides ◽  
Ft Ir ◽  
Wet Chemical ◽  
Silicon Interface

ABSTRACTChemical structures of native oxides formed during wet chemical treatments on NH4F treated Si(111) surfaces were investigated using X-ray Photoelectron Spectroscopy (XPS) and Fourier Transformed Infrared Attenuated Total Reflection(FT-IR-ATR). It was found that the amounts of Si-H bonds in native oxides and those at native oxide/silicon interface are negligibly small in the case of native oxides formed in H2SO4-H2O2-H2O solution. Based on this discovery, it was confirmed that native oxides can be characterized by the amount of Si-H bonds in native oxides. Furthermore, it was found that the combination of various wet chemical treatments with the treatment in NH4OH-H2O2-H2O solution results in the drastic decrease in the amount of Si-H bonds in native oxides.

Sign in / Sign up

Export Citation Format

Share Document