Preparation and Properties of Niobate Thin Films from Nanosheets

2010 ◽  
Vol 177 ◽  
pp. 201-203
Author(s):  
Jing Chu ◽  
Yu Lin Li ◽  
Bing Xu ◽  
Na Zhang ◽  
Qiang Li
Keyword(s):  
Thin Films ◽  
Optical Properties ◽  
Phase Structure ◽  
Niobium Oxide ◽  
Oxide Thin Films ◽  
Transmittance Spectra ◽  
Different Thickness ◽  
Soaking Temperature

Niobium oxide thin films were successfully synthesized starting from niobate nanosheets. The microstructure of as-prepared nanosheets was observed by TEM. The morphology of niobate thin films was investigated by SEM. The phase structure was determined by XRD. The transmittance spectra of as-obtained niobium oxide thin films were measured, and the optical properties were studied. The influences of different thickness on optical properties were also analyzed. As-prepared niobium thin films were treated by being heated at different temperature. The effects of soaking temperature on the structure and optical properties of niobium oxide thin films were discussed in detail.

Effects of preparation conditions on the optical properties of niobium oxide thin films

2019 ◽  
Vol 50 (1) ◽  
pp. 22-27
Author(s):  
Imtiaz Ahmad ◽  
Muhammad Ashraf ◽  
Yaqoob Khan ◽  
Ehsan E. Khawaja ◽  
Zulfiqar Ali ◽  
...  
Keyword(s):  
Thin Films ◽  
Optical Properties ◽  
Niobium Oxide ◽  
Oxide Thin Films ◽  
Preparation Conditions

THICKNESS AND OXYGEN PRESSURE DEPENDENT OPTICAL PROPERTIES OF NIOBIUM OXIDE THIN FILMS

1999 ◽  
Vol 13 (04) ◽  
pp. 411-418 ◽  
Author(s):  
M. GHANASHYAM KRISHNA ◽  
A. K. BHATTACHARYA
Keyword(s):  
Thin Films ◽  
Refractive Index ◽  
Optical Properties ◽  
Band Gap ◽  
Oxygen Pressure ◽  
Absorption Edge ◽  
Niobium Oxide ◽  
Critical Value ◽  
Oxide Thin Films ◽  
Observed Behaviour

The optical properties of niobium oxide thin films in the thickness range between 75 and 200 nm have been studied. The films were deposited by dc magnetron sputtering and it was found that the refractive index, extinction coefficient and the absorption edge were all strongly dependent on the oxygen pressure during sputtering as well as the thickness of the deposited films. In general, the low thickness films had a lower refractive index than the high thickness films. The highest refractive index obtained was 2.46 at a wavelength of 650 nm for the film deposited at an oxygen pressure of 2 mTorr and to a thickness of 200 nm. The low thickness (~ 120 nm) films showed an initial decrease in refractive index, with oxygen pressure increasing above a critical value. The thicker films, however showed the opposite behaviour, increasing initially and decreasing marginally above the same critical pressure. The absorption edge showed a critical value of thickness above and below which it decreased and a critical value of oxygen pressure during sputtering above and below which it increased. The band gap values varied from 3.3 to 3.6 eV with the thinner films showing the higher band gap. The observed behaviour was explained using the single effective Lorentzian oscillator model.

Microstructural and optical properties of high-quality Mg–Zn oxide thin films

2021 ◽  
Vol 127 ◽  
pp. 105690
Author(s):  
A. Sáenz-Trevizo ◽  
D. Kuchle-Mena ◽  
P. Pizá-Ruiz ◽  
P. Amézaga-Madrid ◽  
O. Solís-Canto ◽  
...  
Keyword(s):  
Thin Films ◽  
Optical Properties ◽  
Oxide Thin Films ◽  
High Quality

scholarly journals Photoluminescence Activity of Neodymium-Doped Gallium Oxide Thin Films

2008 ◽  
Vol 1111 ◽  
Author(s):  
Celine Lecerf ◽  
Philippe Marie ◽  
Cedric Frilay ◽  
Julien Cardin ◽  
Xavier Portier
Keyword(s):  
Thin Films ◽  
Optical Properties ◽  
Substrate Temperature ◽  
Gallium Oxide ◽  
Electronic Transitions ◽  
Oxide Thin Films ◽  
Structural And Optical Properties ◽  
Luminescence Efficiency

AbstractPhotoluminescence activity was observed for neodymium-doped gallium oxide thin films prepared by radiofrequency magnetron co-sputtering. Structural and optical properties of as-grown and annealed films were studied and photoluminescence activity was especially investigated. The most intense lines were associated to the 4F3/2  4I9/2 and 4F3/2  4I11/2 electronic transitions of Nd3+. The effects of deposition and treatment parameters such as the substrate temperature, the post anneal treatment or the neodymium content in the films were particularly examined with the aim to reach the best luminescence efficiency.

Cuprous oxide thin films prepared by thermal oxidation of copper layer. Morphological and optical properties

2015 ◽  
Vol 159 ◽  
pp. 325-332 ◽  
Author(s):  
Artak Karapetyan ◽  
Anna Reymers ◽  
Suzanne Giorgio ◽  
Carole Fauquet ◽  
Laszlo Sajti ◽  
...  
Keyword(s):  
Thin Films ◽  
Optical Properties ◽  
Thermal Oxidation ◽  
Cuprous Oxide ◽  
Copper Layer ◽  
Oxide Thin Films

Thickness Dependent Structural and Optical Properties of Cadmium Selenide Thin Films

2013 ◽  
Vol 665 ◽  
pp. 159-167
Author(s):  
M.S. Jani ◽  
H.S. Patel ◽  
J.R. Rathod ◽  
K.D. Patel ◽  
V.M. Pathak ◽  
...  
Keyword(s):  
Thin Films ◽  
Optical Properties ◽  
Hexagonal Wurtzite Structure ◽  
Optical Bandgap ◽  
Bandgap Energy ◽  
Structural And Optical Properties ◽  
Structural Investigations ◽  
Glass Substrates ◽  
Optical Bandgap Energy ◽  
Different Thickness

In this paper structural and optical properties of CdSe thin films with different thickness deposited by thermal evaporation under vacuum onto glass substrates are presented. The structural investigations performed by means of XRD technique showed that the films have a polycrystalline and hexagonal (würtzite) structure. The values of some important parameters of the studied films (absorption coefficient and optical bandgap energy) are determined from transmission spectra. The values of the optical bandgap energy (Eg) calculated from the absorption spectra, ranged between 1.67 - 1.74 eV.

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