Chemical Vapor Deposition (CVD) of ZrC Coatings from ZrCl4-C3H6-H2
2011 ◽
Vol 189-193
◽
pp. 648-652
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Keyword(s):
ZrC coatings were prepared by CVD using ZrCl4, C3H6, and H2as the precursors. The mechanisms responsible for the effects of deposition temperature, H2flow rate and inlet C/Zr ratio on the ZrC coatings were studied based on the deposition mechanism of ZrC. The results indicate that the ZrC morphologies change from a loose spherical structure to a cauliflower structure, then to a glassy structure as the deposition temperature increases from 1050°C to 1150°C, then to 1250°C. The carbon content in the ZrC coatings increases with increasing the deposition temperature. Higher inlet C/Zr ratio can lead to rough surfaces and higher carbon content. Reasonable H2concentration can inhibit carbon deposition, and lead to a cauliflower structure.
2008 ◽
Vol 8
(5)
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pp. 2680-2683
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Keyword(s):
2006 ◽
Vol 200
(10)
◽
pp. 3134-3139
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Keyword(s):
2016 ◽
Vol 33
(9)
◽
pp. 2711-2715
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Keyword(s):
Keyword(s):