Kelvin Probe Force Microscope Measurement Uncertainty

2011 ◽  
Vol 222 ◽  
pp. 114-117
Author(s):  
Maciej Ligowski ◽  
Michiharu Tabe ◽  
Ryszard Jabłoński
Keyword(s):  
Measurement Uncertainty ◽  
Spatial Resolution ◽  
Surface Potential ◽  
High Spatial Resolution ◽  
High Sensitivity ◽  
Kelvin Probe ◽  
Force Microscopy ◽  
Calibration Methods ◽  
Standard Calibration ◽  
Nanoscale Measurements

Kelvin Probe Force Microscopy is an attractive technique for characterizing the surface potential of various samples. The main advantage of this technique is its high spatial resolution together with high sensitivity. However as in any nanoscale measurements also in case of KFM it is extremly difficult to describe the uncertainty of the measurement. Moreover, a wide variety of measuring conditions, together with the complicated operation principle cause situation, where no standard calibration methods are available. In the paper we propose the model of the KFM microscope and analyze the uncertainty of the KFM measurement.

scholarly journals High spatial resolution Kelvin probe force microscopy with coaxial probes

2012 ◽  
Vol 23 (11) ◽  
pp. 115703 ◽  
Author(s):  
Keith A Brown ◽  
Kevin J Satzinger ◽  
Robert M Westervelt
Keyword(s):  
Spatial Resolution ◽  
High Spatial Resolution ◽  
Kelvin Probe Force Microscopy ◽  
Kelvin Probe ◽  
Force Microscopy ◽  
Coaxial Probes

High-Spatial-Resolution Topographic Imaging and Dimer Distance Analysis of Si(100)-(2×1) Using Noncontact Atomic Force Microscopy

2008 ◽  
Vol 47 (7) ◽  
pp. 6085-6087 ◽  
Author(s):  
Daisuke Sawada ◽  
Takashi Namikawa ◽  
Masuhiro Hiragaki ◽  
Yoshiaki Sugimoto ◽  
Masayuki Abe ◽  
...  
Keyword(s):  
Atomic Force Microscopy ◽  
Spatial Resolution ◽  
High Spatial Resolution ◽  
Force Microscopy ◽  
Distance Analysis ◽  
Atomic Force ◽  
Topographic Imaging

Applications of a Laboratory X-ray Micropsobe to Materials Analysis

1988 ◽  
Vol 32 ◽  
pp. 115-120 ◽  
Author(s):  
D. A. Carpenter ◽  
M. A. Taylor ◽  
C. E. Holcombe
Keyword(s):  
Spatial Resolution ◽  
High Spatial Resolution ◽  
High Sensitivity ◽  
Specimen Preparation ◽  
X Rays ◽  
Glass Capillary ◽  
Materials Analysis ◽  
X Ray ◽  
Small Glass

A laboratory-based X-ray microprobe, composed of a high-brilliance microfocus X-ray tube, coupled with a small glass capillary, has been developed for materials applications. Because of total external reflectance of X rays from the smooth inside bore of the glass capillary, the microprobe has a high sensitivity as well as a high spatial resolution. The use of X rays to excite elemental fluorescence offers the advantages of good peak-to-background, the ability to operate in air, and minimal specimen preparation. In addition, the development of laboratory-based instrumentation has been of Interest recently because of greater accessibility when compared with synchrotron X-ray microprobes.

scholarly journals Measurement of electrostatic tip–sample interactions by time-domain Kelvin probe force microscopy

2020 ◽  
Vol 11 ◽  
pp. 911-921
Author(s):  
Christian Ritz ◽  
Tino Wagner ◽  
Andreas Stemmer
Keyword(s):  
Frequency Shift ◽  
Surface Potential ◽  
Electrostatic Force ◽  
Kelvin Probe Force Microscopy ◽  
Kelvin Probe ◽  
Force Microscopy ◽  
Atomic Force ◽  
Alternative Approach ◽  
Dc Component ◽  
Lock In

Kelvin probe force microscopy is a scanning probe technique used to quantify the local electrostatic potential of a surface. In common implementations, the bias voltage between the tip and the sample is modulated. The resulting electrostatic force or force gradient is detected via lock-in techniques and canceled by adjusting the dc component of the tip–sample bias. This allows for an electrostatic characterization and simultaneously minimizes the electrostatic influence onto the topography measurement. However, a static contribution due to the bias modulation itself remains uncompensated, which can induce topographic height errors. Here, we demonstrate an alternative approach to find the surface potential without lock-in detection. Our method operates directly on the frequency-shift signal measured in frequency-modulated atomic force microscopy and continuously estimates the electrostatic influence due to the applied voltage modulation. This results in a continuous measurement of the local surface potential, the capacitance gradient, and the frequency shift induced by surface topography. In contrast to conventional techniques, the detection of the topography-induced frequency shift enables the compensation of all electrostatic influences, including the component arising from the bias modulation. This constitutes an important improvement over conventional techniques and paves the way for more reliable and accurate measurements of electrostatics and topography.

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