Study on the Manufacture of Microfluidic Chip with Coated Glass

2012 ◽  
Vol 548 ◽  
pp. 254-257 ◽  
Author(s):  
Yan He ◽  
Bai Ling Huang ◽  
Yong Lai Zhang ◽  
Li Gang Niu

In this paper, a simple and facile technique for manufacturing glass-based microfluidic chips was developed. Instead of using expensive dry etching technology, the standard UV lithography and wet chemical etching technique was used to fabricate microchannels on a K9 glass substrate. The fabrication process of microfluidic chip including vacuum evaporation, annealing, lithography, and BHF (HF-NH4F-H2O) wet etching were investigated. Through series experiments, we found that anneal was the critical factor for chip quality. As a representative example, a microfluidic channel with 20 m of depth, and 80 m of width was successfully prepared, and the channel surfaces are quite smooth. These results present a simple, low cost, flexible and easy way to fabricate glass-based microfluidic chips.

2015 ◽  
Vol 48 (36) ◽  
pp. 365303 ◽  
Author(s):  
Jingchang Sun ◽  
Ting Zhao ◽  
Zhangwei Ma ◽  
Ming Li ◽  
Cheng Chang ◽  
...  

1999 ◽  
Vol 7 (2) ◽  
pp. 24-25
Author(s):  
Lisa Litz-Montanaro

In the course of both physical and failure analysis of semiconductor chips (i.e., verifying what you actually deposited as a layer, vs, what caused the circuit to fail), it is essential to have appropriate deprocessing tools at your disposal in order to evaluate complex semiconductor structures, Deprocessing techniques are developed for each product manufactured and involve multi-step procedures that reveal the layer-by-layer secrets of the chip, These techniques require constant tweaking in duration and procedure as the manufacturing process imposes changes and as the architecture of the semiconductor changes. While there are many tools that assist in these analytical pursuits, such as RIE (reactive ion etching - a dry etching technique), ion milling, and microcleaving, the wet chemical etching of tungsten is sometimes more reproducible than RIE techniques.


2018 ◽  
Vol 13 (9) ◽  
pp. 1296-1301 ◽  
Author(s):  
Feng Wang ◽  
Shulan Jiang ◽  
Jinghui Han ◽  
Guangran Guo ◽  
Bingjun Yu ◽  
...  

2012 ◽  
Vol 2012 ◽  
pp. 1-8 ◽  
Author(s):  
Chien-Wei Liu ◽  
Chin-Lung Cheng ◽  
Bau-Tong Dai ◽  
Chi-Han Yang ◽  
Jun-Yuan Wang

Nanostructured solar cells with coaxial p-n junction structures have strong potential to enhance the performances of the silicon-based solar cells. This study demonstrates a radial junction silicon nanowire (RJSNW) solar cell that was fabricated simply and at low cost using wet chemical etching. Experimental results reveal that the reflectance of the silicon nanowires (SNWs) declines as their length increases. The excellent light trapping was mainly associated with high aspect ratio of the SNW arrays. A conversion efficiency of ∼7.1% and an external quantum efficiency of ∼64.6% at 700 nm were demonstrated. Control of etching time and diffusion conditions holds great promise for the development of future RJSNW solar cells. Improving the electrode/RJSNW contact will promote the collection of carries in coaxial core-shell SNW array solar cells.


Author(s):  
Athira N. Surendran ◽  
Ran Zhou

Abstract Microfluidics has a lot of applications in fields ranging from pharmaceutical to energy, and one of the major applications is micromixers. A challenge faced by most micromixers is the difficulty in mixing within micro-size fluidic channels because of the domination of laminar flow in a small channel. Hence, magnetic field generated by permanent magnets and electromagnets have been widely used to mix ferrofluids with other sample fluids on a micro level. However, permanent magnets are bulky, and electromagnets produce harmful heat to biological samples; both properties are detrimental to a microfluidic chip’s performance. Taking these into consideration, this study proposes rapid mixing of ferrofluid using a two-layer microfluidic device with microfabricated magnet. Two microfluidic chips that consist of microchannels and micromagnets respectively are fabricated using a simple and low-cost soft lithography method. The custom-designed microscale magnet consists of an array of stripes and is bonded below the plane of the microchannel. The combination of the planar location and angle of the array of magnets allow the migration of ferrofluids, hence mixing it with buffer flow. Parametric studies are performed to ensure comprehensive understanding, including the angle of micro-scale magnets with respect to the fluidic channels, total flow rate and density of the array of magnets. The result from this study can be applied in chemical synthesis and pre-processing, sample dilution, or inducing reactions between samples and reagent.


Small ◽  
2020 ◽  
Vol 16 (14) ◽  
pp. 2070076
Author(s):  
Mei Sun ◽  
Bocheng Yu ◽  
Mengyu Hong ◽  
Zhiwei Li ◽  
Fengjiao Lyu ◽  
...  

2007 ◽  
Vol 339 ◽  
pp. 246-251
Author(s):  
L.Q. Du ◽  
C. Liu ◽  
H.J. Liu ◽  
J. Qin ◽  
N. Li ◽  
...  

Micro hot embossing mold of microfluidic chip used in flow cytometry is designed and microfabricated. After some kinds of microfabrication processes are tried, this paper presents a novel microfabrication technology of micro hot embossing metal mold. Micro metal mold is fabricated by low-cost UV-LIGA surface micro fabrication process using negative thick photoresist, SU-8. Different from other micro hot embossing molds, the micro mold with vertical sidewalls is fabricated by micro nickel electroforming directly on Nickel base. Based on the micro Nickel mold and automation fabrication system, high precision and mass-producing microfluidic chips have been fabricated and they have been used in flow cytometry


2021 ◽  
Vol 11 (1) ◽  
Author(s):  
Yushen Zhang ◽  
Tsun-Ming Tseng ◽  
Ulf Schlichtmann

AbstractState-of-the-art microfluidic systems rely on relatively expensive and bulky off-chip infrastructures. The core of a system—the microfluidic chip—requires a clean room and dedicated skills to be fabricated. Thus, state-of-the-art microfluidic systems are barely accessible, especially for the do-it-yourself (DIY) community or enthusiasts. Recent emerging technology—3D-printing—has shown promise to fabricate microfluidic chips more simply, but the resulting chip is mainly hardened and single-layered and can hardly replace the state-of-the-art Polydimethylsiloxane (PDMS) chip. There exists no convenient fluidic control mechanism yet suitable for the hardened single-layered chip, and particularly, the hardened single-layered chip cannot replicate the pneumatic valve—an essential actuator for automatically controlled microfluidics. Instead, 3D-printable non-pneumatic or manually actuated valve designs are reported, but their application is limited. Here, we present a low-cost accessible all-in-one portable microfluidic system, which uses an easy-to-print single-layered 3D-printed microfluidic chip along with a novel active control mechanism for fluids to enable more applications. This active control mechanism is based on air or gas interception and can, e.g., block, direct, and transport fluid. As a demonstration, we show the system can automatically control the fluid in microfluidic chips, which we designed and printed with a consumer-grade 3D-printer. The system is comparably compact and can automatically perform user-programmed experiments. All operations can be done directly on the system with no additional host device required. This work could support the spread of low budget accessible microfluidic systems as portable, usable on-the-go devices and increase the application field of 3D-printed microfluidic devices.


1998 ◽  
Vol 537 ◽  
Author(s):  
D. A. Stocker ◽  
E. F. Schubert ◽  
K. S. Boutros ◽  
J. M. Redwing

AbstractA method is presented for fabricating fully wet-etched InGaN/GaN laser cavities using photoenhanced electrochemical wet etching followed by crystallographic wet etching. Crystallographic wet chemical etching of n- and p-type GaN grown on c-plane sapphire is achieved using H3PO4 and various hydroxides, with etch rates as high as 3.2 μm/min. The crystallographic GaN etch planes are {0001}, {1010}, {1011}, {1012}, and {1013}. The vertical {1010} planes appear perfectly smooth when viewed with a field-effect scanning electron microscope (FESEM), indicating a surface roughness less than 5 nm, suitable for laser facets. The etch rate and crystallographic nature for the various etching solutions are independent of conductivity, as shown by seamless etching of a p-GaN/undoped, high-resistivity GaN homojunction.


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