Preparation of Chitosan/TPP Nanoparticles Used as Carrier in Enzyme Immobilization

2013 ◽  
Vol 718-720 ◽  
pp. 271-274 ◽  
Author(s):  
Bi Ying Sha ◽  
Qing Shan Liu ◽  
Jing Jing You ◽  
Xiao Dan Ren ◽  
Hui Feng ◽  
...  
Keyword(s):  
Response Surface Methodology ◽  
Electron Microscope ◽  
Experimental Design ◽  
Immobilized Enzyme ◽  
Chitosan Nanoparticles ◽  
Influence Factors ◽  
Ionotropic Gelation ◽  
Atomic Force ◽  
Scanning Electron

This work investigated the preparation of chitosan nanoparticles used as carriers for immobilized enzyme. Methods The nanoparticles were prepared by ionotropic gelation method. Response surface methodology was used in the preparation of nanoparticles. The morphologic characterization of chitosan nanoparticles was evaluated by scanning electron microscope and atomic force microscope. Results Using an appropriate experimental design, we have studied the significant influence factors (pH of the solution, concentrations of the chitosan , ratios of components) in the preparation of chitosan/triphosphate (TPP) nanoparticles.

Characterization of Cu2Zn1-xCdxSnS4 Nanostructures

2015 ◽  
Vol 1109 ◽  
pp. 171-175 ◽  
Author(s):  
A.S. Ibraheam ◽  
Y. Al-Douri ◽  
U. Hashim ◽  
M. Wesam Al-Mufti
Keyword(s):  
Grain Size ◽  
Electron Microscope ◽  
Scanning Electron Microscope ◽  
Sol Gel ◽  
Obvious Effect ◽  
Atomic Force ◽  
Characterization Study ◽  
Gel Technique ◽  
Scanning Electron

Pentrary alloys of Cu2Zn1-xCdxSnS4 nanostructures have been grown on glass substrate using sol-gel technique. The concentration of Cd has showed obvious effect for characterization study. Field emission-scanning electron microscope (FE-SEM) and atomic force microscope (AFM) have provide nanostructures of the utilized alloys. Those alloys give good impression about increasing the grain size with Cd concentration increasing, that lead to increasing the surface coarse.

Characterization of Sputtered Films using the Scanning Electron Microscope

1973 ◽  
Vol 31 ◽  
pp. 44-45
Author(s):  
R. F. Schneidmiller ◽  
W. F. Thrower ◽  
C. Ang
Keyword(s):  
Electron Microscope ◽  
Scanning Electron Microscope ◽  
Thin Film Deposition ◽  
Film Deposition ◽  
Sputtered Films ◽  
Plasma Sputtering ◽  
Microelectronic Devices ◽  
Control Film ◽  
Scanning Electron

Solid state materials in the form of thin films have found increasing structural and electronic applications. Among the multitude of thin film deposition techniques, the radio frequency induced plasma sputtering has gained considerable utilization in recent years through advances in equipment design and process improvement, as well as the discovery of the versatility of the process to control film properties. In our laboratory we have used the scanning electron microscope extensively in the direct and indirect characterization of sputtered films for correlation with their physical and electrical properties.Scanning electron microscopy is a powerful tool for the examination of surfaces of solids and for the failure analysis of structural components and microelectronic devices.

Electrical Characterization of Different Failure Modes in Sub-100 nm Devices Using Nanoprobing Technique

2009 ◽  
Author(s):  
E. Hendarto ◽  
S.L. Toh ◽  
J. Sudijono ◽  
P.K. Tan ◽  
H. Tan ◽  
...  
Keyword(s):  
Electron Microscope ◽  
Focused Ion Beam ◽  
Failure Modes ◽  
Ion Beam ◽  
Electrical Characterization ◽  
Nickel Silicide ◽  
Fault Isolation ◽  
Technology Nodes ◽  
Scanning Electron

Abstract The scanning electron microscope (SEM) based nanoprobing technique has established itself as an indispensable failure analysis (FA) technique as technology nodes continue to shrink according to Moore's Law. Although it has its share of disadvantages, SEM-based nanoprobing is often preferred because of its advantages over other FA techniques such as focused ion beam in fault isolation. This paper presents the effectiveness of the nanoprobing technique in isolating nanoscale defects in three different cases in sub-100 nm devices: soft-fail defect caused by asymmetrical nickel silicide (NiSi) formation, hard-fail defect caused by abnormal NiSi formation leading to contact-poly short, and isolation of resistive contact in a large electrical test structure. Results suggest that the SEM based nanoprobing technique is particularly useful in identifying causes of soft-fails and plays a very important role in investigating the cause of hard-fails and improving device yield.

Preparation of Carbon Nanofibers from Polyacrylonitrile Nanofibers by Electrospinning

2011 ◽  
Vol 415-417 ◽  
pp. 642-647
Author(s):  
En Zhong Li ◽  
Da Xiang Yang ◽  
Wei Ling Guo ◽  
Hai Dou Wang ◽  
Bin Shi Xu
Keyword(s):  
Electron Microscope ◽  
Carbon Nanofibers ◽  
Photoelectron Spectroscopy ◽  
Solution Concentration ◽  
Dimethyl Formamide ◽  
Ultrafine Fibers ◽  
X Ray ◽  
Scanning Electron ◽  
Pan Fibers

Ultrafine fibers were electrospun from polyacrylonitrile (PAN)/N,N-dimethyl formamide (DMF) solution as a precursor of carbon nanofibers. The effects of solution concentration, applied voltage and flow rate on preparation and morphologies of electrospun PAN fibers were investigated. Morphologies of the green fibers, stabilized fibers and carbonized fibers were compared by scanning electron microscope (SEM). The diameter of PAN nanofibers is about 450nm and the distribution of diameter is well-proportioned. Characterization of the elements changes of fibers were performed by X-ray photoelectron spectroscopy (XPS).

Advancement in fabrication of carbon nanotube tip for atomic force microscope using multi-axis nanomanipulator in scanning electron microscope

2022 ◽  
Author(s):  
Sanjeev Kumar Kanth ◽  
Anjli Sharma ◽  
Byong Chon Park ◽  
Woon Song ◽  
Hyun Rhu ◽  
...  
Keyword(s):  
Electron Beam ◽  
Electron Microscope ◽  
Carbon Nanotube ◽  
Scanning Electron Microscope ◽  
Atomic Force Microscope ◽  
Structural Integrity ◽  
Ion Beam ◽  
Rectilinear Motion ◽  
Atomic Force ◽  
Scanning Electron

Abstract We have constructed a new nanomanipulator (NM) in a field emission scanning electron microscope (FE-SEM) to fabricate carbon nanotube (CNT) tip to precisely adjust the length and attachment angle of CNT onto the mother atomic force microscope (AFM) tip. The new NM is composed of 2 modules, each of which has the degree of freedom of three-dimensional rectilinear motion x, y and z and one-dimensional rotational motion θ. The NM is mounted on the stage of a FE-SEM. With the system of 14 axes in total which includes 5 axes of FE-SEM and 9 axes of nano-actuators, it was possible to see CNT tip from both rear and side view about the mother tip. With the help of new NM, the attachment angle error could be reduced down to 0º as seen from both the side and the rear view, as well as, the length of the CNT could be adjusted with the precision using electron beam induced etching. For the proper attachment of CNT on the mother tip surface, the side of the mother tip was milled with focused ion beam. In addition, electron beam induced deposition was used to strengthen the adhesion between CNT and the mother tip. In order to check the structural integrity of fabricated CNT, transmission electron microscope image was taken which showed the fine cutting of CNT and the clean surface as well. Finally, the performance of the fabricated CNT tip was demonstrated by imaging 1-D grating and DNA samples with atomic force microscope in tapping mode.

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