The Influences of Oxygen Content on Microstructures and Optical Properties of Al2O3 Films Deposited by Oxygen Ion Beam Assisted Pulse Reactive Magnetron Sputtering

2013 ◽  
Vol 750-752 ◽  
pp. 1891-1896
Author(s):  
Jin Xiao Wang ◽  
Zhi Min Wang ◽  
Yi Wang ◽  
Kai Zhao ◽  
Xiao Mei Su ◽  
...  
Keyword(s):  
Optical Properties ◽  
Magnetron Sputtering ◽  
Oxygen Content ◽  
Photoelectron Spectroscopy ◽  
Ion Beam ◽  
Amorphous Structure ◽  
Reactive Magnetron Sputtering ◽  
Reactive Magnetron ◽  
X Ray ◽  
Oxygen Ion

Al2O3films have been deposited at room temperature on polyimide substrates using oxygen ion beam assisted pulse reactive magnetron sputtering system in which aluminium sputtering is simultaneous with oxygen ion beam irradiation. A set of samples were prepared at different oxygen content and film characterizations have been carried out using X-ray diffraction (XRD) for film crystallization, atomic force microscopy (AFM) for surface morphology, and X-ray photoelectron spectroscopy (XPS) for elemental composition measurements and chemical bonding states. The films are smoother and near stoichiometric aluminum oxide as oxygen content increases up to 86%. All films are kept in amorphous structure. The optical properties of the films showed sensitive with oxygen content. Transparent films of refractive index 1.63 are obtained with a deposition rate as high as 70.3 nm/min by 86% oxygen ion beam assisted, which is about 5 times than the films by conventional reactive magnetron sputtering.

STRUCTURAL PROPERTIES OF AlN FILMS WITH OXYGEN CONTENT DEPOSITED BY REACTIVE MAGNETRON SPUTTERING: XRD AND XPS CHARACTERIZATION

2011 ◽  
Vol 18 (01n02) ◽  
pp. 23-31 ◽  
Author(s):  
MANUEL GARCÍA-MÉNDEZ ◽  
SANTOS MORALES-RODRÍGUEZ ◽  
SADASIVAN SHAJI ◽  
BINDU KRISHNAN ◽  
PASCUAL BARTOLO-PÉREZ
Keyword(s):  
Magnetron Sputtering ◽  
Structural Properties ◽  
Photoelectron Spectroscopy ◽  
Reactive Magnetron Sputtering ◽  
Reactive Magnetron ◽  
X Ray Diffraction ◽  
Preferential Growth ◽  
X Ray ◽  
Xps Characterization ◽  
Oxide Phases

A set of aluminium nitride ( AlN ) and oxidized AlN ( AlNO ) thin films were grown with the technique of direct current (dc) reactive magnetron sputtering. The main purpose of this investigation is to explore the influence of the oxygen on the structural properties of AlN and AlNO films. The crystalline properties and chemical identification of phases were studied by X-ray diffraction (XRD) and X-ray photoelectron spectroscopy (XPS), respectively. Electrical properties were analyzed from I-V measurements. It was found that films crystallized under the AlN würzite structure and presented a polycrystalline preferential growth along [0001] direction, perpendicular to substrate. Small amounts of secondary aluminium oxide phases were detected too. The oxide phases can induce defects, which can alter crystallinity of films.

Deposition Of Aluminium Nitride Film By Ion Beam Enhanced Reactive Magnetron Sputtering

1991 ◽  
Vol 223 ◽  
Author(s):  
R. F. Huang ◽  
L. S. Wen ◽  
H. Wang ◽  
J. Wu ◽  
R. J. Hong
Keyword(s):  
Magnetron Sputtering ◽  
Physical Vapor Deposition ◽  
Ion Beam ◽  
Aluminium Nitride ◽  
Reactive Magnetron Sputtering ◽  
Nitride Film ◽  
Reactive Magnetron ◽  
X Ray Diffraction ◽  
X Ray ◽  
Substrate Temperatures

ABSTRACTAluminium nitride film has been synthesized at substrate temperatures lower than 100 °C by using ion beam enhanced reactive magnetron sputtering. The growth rate was much higher than that obtained by usual physical vapor deposition at low substrate temperatures. The stoichiometry of the film was controlled by varying the resultant current of the ion beam used and identified by X-ray diffraction analysis. The optical properties of the film were also studied.

X-ray Photoelectron Spectroscopy Depth Profiling of La2O3/Si Thin Films Deposited by Reactive Magnetron Sputtering

2011 ◽  
Vol 3 (11) ◽  
pp. 4370-4373 ◽  
Author(s):  
C. V. Ramana ◽  
R. S. Vemuri ◽  
V. V. Kaichev ◽  
V. A. Kochubey ◽  
A. A. Saraev ◽  
...  
Keyword(s):  
Thin Films ◽  
Magnetron Sputtering ◽  
Photoelectron Spectroscopy ◽  
Depth Profiling ◽  
Reactive Magnetron Sputtering ◽  
Reactive Magnetron ◽  
X Ray

EFFECTS OF ANNEALING ON THE COMPOSITION, STRUCTURE AND PHOTOCATALYTIC PROPERTIES OF C-DOPED TITANIA FILMS DEPOSITED BY REACTIVE MAGNETRON SPUTTERING USING CO2 AS CARBON SOURCE

2019 ◽  
Vol 26 (08) ◽  
pp. 1950036 ◽  
Author(s):  
B. WEI ◽  
J. L. XUE ◽  
H. T. CAO ◽  
H. G. LI ◽  
F. WEN ◽  
...  
Keyword(s):  
Carbon Source ◽  
Surface Morphology ◽  
Magnetron Sputtering ◽  
Photoelectron Spectroscopy ◽  
Photocatalytic Property ◽  
Reactive Magnetron Sputtering ◽  
Photocatalytic Properties ◽  
Reactive Magnetron ◽  
X Ray ◽  
Doped Titania

Carbon-doped titania (C:TiO2) films were prepared by reactive magnetron sputtering using CO2 as a carbon source. The as-prepared films were annealed at different temperatures in vacuum condition. A TiO2 film using O2 gas was also prepared for comparisons with C:TiO2. The structure and composition of the as-prepared, the TiO2 films and the annealed C:TiO2 films were analyzed by X-ray diffraction and X-ray photoelectron spectroscopy, whereas the surface morphology of the C:TiO2 films was measured by atomic force microscopy. Furthermore, photocatalytic properties of the films were evaluated by the degradation of methyl orange (MO). The results indicate that the photocatalytic property was improved when carbon was doped into TiO2 films, and the C:TiO2 films consist of anatase and TiO phases. The experimental results of the MO’s degradation confirm that the annealing process at various temperatures can modify the surface morphology of the films and the content of oxygen vacancies in the films. Consequently, the variations in surface topography and oxygen vacancy potentially enhance the photocatalytic activity of TiO2 films.

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