EFFECTS OF ANNEALING ON THE COMPOSITION, STRUCTURE AND PHOTOCATALYTIC PROPERTIES OF C-DOPED TITANIA FILMS DEPOSITED BY REACTIVE MAGNETRON SPUTTERING USING CO2 AS CARBON SOURCE

2019 ◽  
Vol 26 (08) ◽  
pp. 1950036 ◽  
Author(s):  
B. WEI ◽  
J. L. XUE ◽  
H. T. CAO ◽  
H. G. LI ◽  
F. WEN ◽  
...  

Carbon-doped titania (C:TiO2) films were prepared by reactive magnetron sputtering using CO2 as a carbon source. The as-prepared films were annealed at different temperatures in vacuum condition. A TiO2 film using O2 gas was also prepared for comparisons with C:TiO2. The structure and composition of the as-prepared, the TiO2 films and the annealed C:TiO2 films were analyzed by X-ray diffraction and X-ray photoelectron spectroscopy, whereas the surface morphology of the C:TiO2 films was measured by atomic force microscopy. Furthermore, photocatalytic properties of the films were evaluated by the degradation of methyl orange (MO). The results indicate that the photocatalytic property was improved when carbon was doped into TiO2 films, and the C:TiO2 films consist of anatase and TiO phases. The experimental results of the MO’s degradation confirm that the annealing process at various temperatures can modify the surface morphology of the films and the content of oxygen vacancies in the films. Consequently, the variations in surface topography and oxygen vacancy potentially enhance the photocatalytic activity of TiO2 films.

2013 ◽  
Vol 750-752 ◽  
pp. 1891-1896
Author(s):  
Jin Xiao Wang ◽  
Zhi Min Wang ◽  
Yi Wang ◽  
Kai Zhao ◽  
Xiao Mei Su ◽  
...  

Al2O3films have been deposited at room temperature on polyimide substrates using oxygen ion beam assisted pulse reactive magnetron sputtering system in which aluminium sputtering is simultaneous with oxygen ion beam irradiation. A set of samples were prepared at different oxygen content and film characterizations have been carried out using X-ray diffraction (XRD) for film crystallization, atomic force microscopy (AFM) for surface morphology, and X-ray photoelectron spectroscopy (XPS) for elemental composition measurements and chemical bonding states. The films are smoother and near stoichiometric aluminum oxide as oxygen content increases up to 86%. All films are kept in amorphous structure. The optical properties of the films showed sensitive with oxygen content. Transparent films of refractive index 1.63 are obtained with a deposition rate as high as 70.3 nm/min by 86% oxygen ion beam assisted, which is about 5 times than the films by conventional reactive magnetron sputtering.


2011 ◽  
Vol 18 (01n02) ◽  
pp. 23-31 ◽  
Author(s):  
MANUEL GARCÍA-MÉNDEZ ◽  
SANTOS MORALES-RODRÍGUEZ ◽  
SADASIVAN SHAJI ◽  
BINDU KRISHNAN ◽  
PASCUAL BARTOLO-PÉREZ

A set of aluminium nitride ( AlN ) and oxidized AlN ( AlNO ) thin films were grown with the technique of direct current (dc) reactive magnetron sputtering. The main purpose of this investigation is to explore the influence of the oxygen on the structural properties of AlN and AlNO films. The crystalline properties and chemical identification of phases were studied by X-ray diffraction (XRD) and X-ray photoelectron spectroscopy (XPS), respectively. Electrical properties were analyzed from I-V measurements. It was found that films crystallized under the AlN würzite structure and presented a polycrystalline preferential growth along [0001] direction, perpendicular to substrate. Small amounts of secondary aluminium oxide phases were detected too. The oxide phases can induce defects, which can alter crystallinity of films.


2011 ◽  
Vol 3 (11) ◽  
pp. 4370-4373 ◽  
Author(s):  
C. V. Ramana ◽  
R. S. Vemuri ◽  
V. V. Kaichev ◽  
V. A. Kochubey ◽  
A. A. Saraev ◽  
...  

Author(s):  
Xiao Di Liu ◽  
Dacheng Zhang

Nanosized tin oxide thin films were fabricated on silicon and quartz glass substrates by direct current reactive magnetron sputtering method, and then were calcined at different temperatures ranging from 400°C to 900°C. The results analyzed by X ray photoemission spectra (XPS), scanning electron microscope (SEM), Spectroscopic ellipsometer, Powder X-ray diffraction (XRD), and HP4145B semiconductor parameter analyzer measurements show that the sample with quartz glass substrate and calcinated at 650°C possesses better properties and suitable to be used in our gas sensor.


1992 ◽  
Vol 7 (8) ◽  
pp. 2070-2079 ◽  
Author(s):  
Y. Pauleau ◽  
Ph. Gouy-Pailler

Tungsten-carbon coatings have been deposited on stainless steel substrates by reactive magnetron sputtering from Ar–CH4 mixtures. The carbon concentration in the coatings measured by electron microprobe analyses was found to be proportional to the CH4 flow rate. Only the cubic α–W phase with a dilated lattice parameter was identified in W–C coatings having a carbon content lower than 25 at. %. Since the lattice parameter of the α–W phase in these W–C coatings increased with increasing carbon content, these coatings may be assumed to be W–C solid solutions. Only the nonstoichiometric β–WC1−x carbide (cubic phase) was detected in W–C coatings containing 30 to 70 at. % of carbon. The chemical state of the elements was investigated by x-ray photoelectron spectroscopy. The Vickers hardness of the W–C coatings was found to be considerably dependent on the carbon concentration. A maximum microhardness of 26 000 MPa was measured for W–C coatings containing either 14–15 at. % or 40–45 at. % of carbon. The correlation between crystallographic structure and microhardness is analyzed and discussed in this paper.


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