MOCVD Route to the Fabrication of Calcium Copper Titanate (CaCu3Ti4O12) Thin Films
2006 ◽
Vol 45
◽
pp. 1194-1199
Keyword(s):
CaCu3Ti4O12 (CCTO) thin films have been successfully deposited by Metal Organic Chemical Vapor Deposition (MOCVD) technique. A novel approach based on a molten multicomponent precursor source has been applied. The molten mixture consists of the Ca(hfa)2•tetraglyme, Ti(tmhd)2(O-iPr)2, and Cu(tmhd)2 [Hhfa= 1,1,1,5,5,5-hexafluoro-2,4- pentanedione; tetraglyme= 2,5,8,11,14-pentaoxapentadecane; Htmhd= 2,2,6,6-tetramethyl-3,5- heptandione; O-iPr= iso-propoxide] precursors. Film complete structural and morphological characterizations have been carried out using several techniques [X-ray diffraction (XRD), scanning electron microscopy (SEM), transmission electron microscopy (TEM)].
2008 ◽
Vol 47
(10)
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pp. 7998-8002
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Keyword(s):
1996 ◽
Vol 54
◽
pp. 124-125
1998 ◽
Vol 335
(1-2)
◽
pp. 106-111
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