Planar Defects and Dislocations in C40 and FCC Lattices

2013 ◽  
Vol 592-593 ◽  
pp. 67-70
Author(s):  
Vaclav Paidar

Atomic planes at three different positions ABC form the stacking along the <111> directions in the FCC lattice and similarly along the <0001> hexagonal axis in the C40 structure in transition metal silicides. However, the structures of silicides are constituted of several stacking of identical atomic planes at four different positions: AB in C11bstructures of e.g. MoSi2, ABC in C40 structures of e.g. VSi2and ABDC in C54 structures of e.g. TiSi2disilicides. The occurrence of the fourth position essentially influences the properties of defects and consequently the mechanical properties of C40 materials.

2021 ◽  
Author(s):  
Ali Sheraz ◽  
Naveed Mehmood ◽  
Mert Mirac Cicek ◽  
İbrahim Ergün ◽  
Hamid Reza Rasouli ◽  
...  

Mechanical properties of transition metal dichalcogenides (TMDCs) are relevant to their prospective applications in flexible electronics. So far, the focus has been on the semiconducting TMDCs, mostly MoX2 and WX2...


2017 ◽  
Vol 114 ◽  
pp. 234-244 ◽  
Author(s):  
D. Dinesh Kumar ◽  
N. Kumar ◽  
S. Kalaiselvam ◽  
R. Radhika ◽  
Arul Maximus Rabel ◽  
...  

2021 ◽  
Author(s):  
Yue Zhu ◽  
Qingyu Peng ◽  
Haowen Zheng ◽  
Fuhua Xue ◽  
Pengyang Li ◽  
...  

With the development of multifunction and miniaturization in modern electronics, polymeric films with strong mechanical performance and high thermal conductivity are urgently needed. Two-dimensional transition metal carbides and nitrides (MXenes)...


2006 ◽  
Vol 958 ◽  
Author(s):  
Takehide Miyazaki ◽  
Toshihiko Kanayama

ABSTRACTWe propose a novel form of graphene-like Si nanostructure based on ab initio total-energy calculation and geometry optimization, (MSi12)n, with M being transition metal atom. It has a three-layer structure, where the two layers of Si atoms in graphene-like positions sandwich another layer of transition metal atoms. The electronic structure may become semiconducting or metallic, depending on the choice of M and arrangement of Si atoms. This hypothetical material can be regarded as a Si-rich phase of transition metal silicide. A potential impact of our finding in forthcoming ultra-scaled Si technology is also discussed.


1983 ◽  
Vol 2 (1) ◽  
pp. 31-34 ◽  
Author(s):  
P.A. Heimann ◽  
S.P. Murarka ◽  
J. Rosario

2006 ◽  
Vol 980 ◽  
Author(s):  
Haruyuki Inui ◽  
Katsushi Tanaka ◽  
Kyosuke Kishida

AbstractThe microstructure, defect structure and thermoelectric properties of two different semiconducting transition-metal silicides, ReSi1.75 and Ru2Si3 upon alloying with a substitutional element with a valence electron number different from that of the constituent metal have been investigated in order to see if the crystal and defect structures of these silicides and thereby their physical properties can be controlled through defect engineering according to the valence electron counting rule. The Si vacancy concentration and its arrangement can be successfully controlled in ReSi1.75 while the relative magnitude of the metal and silicon subcell dimensions in the chimney-ladder structures can be successfully controlled in Ru2Si3. As a result, the improvement in the thermoelectric properties and the p- to n-type conduction transition are successfully achieved respectively for these semiconducting transition-metal silicides.


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