Electrical Characterization of N- and B- Doped Amorphous Carbon Film from Palmyra Sugar

2020 ◽  
Vol 860 ◽  
pp. 196-201
Author(s):  
Khoirotun Nadiyyah ◽  
Anna Zakiyatul Laila ◽  
Irma Septi Ardiani ◽  
Budhi Priyanto ◽  
Darminto
Keyword(s):  
Electrical Conductivity ◽  
Film Thickness ◽  
Amorphous Carbon ◽  
Deposition Time ◽  
Carbon Film ◽  
Electrical Characterization ◽  
Deposition Process ◽  
Basic Material ◽  
Heating Process ◽  
P Type

Structure of amorphous carbon can be composed of sp2 (graphite), or sp3 (diamond), or a combination of both, depending on their fractions. Therefore, many researchers were exploring to use it as solar cell material. This research used the amorphous carbon of bio-product as a basic material in the form of palmyra sugar which was synthesized through the heating and doping process to produce n-type and p-type semiconductors. This research aims to analyze the effect of dopant and deposition time on electrical properties. The heating process was carried out at 250°C and the doping process was carried out by adding NH4OH for a-C:N and H3BO3 for a-C:B. The deposition process was carried out by the nano-spray method using a variety of deposition time on the ITO substrate. The result of scanning electron microscopy (SEM) showed that the film thickness increased with the increase of deposition time. Besides, the result of four-point probe (FPP) showed that the dopant can increase electrical conductivity, but the film thickness did not influence it. The electrical conductivity obtained was 5x10-1 - 6x10-1 S/cm. And the result of further analysis, it can be concluded that electrical conductivity was still in the range of semiconducting material.

Structural Analysis of Boron- and Nitrogen-Doped Amorphous Carbon Films from Bio-Product

2020 ◽  
Vol 860 ◽  
pp. 190-195
Author(s):  
Irma Septi Ardiani ◽  
Khoirotun Nadiyyah ◽  
Anna Zakiyatul Laila ◽  
Sarayut Tunmee ◽  
Hideki Nakajima ◽  
...  
Keyword(s):  
Structural Analysis ◽  
Amorphous Carbon ◽  
Carbon Film ◽  
Carbon Films ◽  
Basic Material ◽  
Carbon Phase ◽  
Amorphous Carbon Film ◽  
Amorphous Carbon Films ◽  
Nitrogen Doped ◽  
P Type

Amorphous carbon films have been explored and used in a wide variety of applications. With the n-type and p-type amorphous carbon film, it can be used to make p-n junctions for solar cells. This research aims to study the structure of boron- and nitrogen-doped amorphous carbon (a-C:B and a-C:N) films. This research uses the basic material of bio-product from palmyra sugar to form amorphous carbon. Amorphous carbon was synthesized by heating the palmyra sugar at 250°C. The results of XRD showed that the doped films produce an amorphous carbon phase. PES was used to analyze the bonding state of dopants in the sample. B4C, BC3, and BC2O bonds formed in a-C:B, while pyridine and pyrrolic formed in a-C:N.

Difference of deposition process of an amorphous carbon film due to source gases

2010 ◽  
Vol 518 (13) ◽  
pp. 3497-3501 ◽  
Author(s):  
Masanori Shinohara ◽  
Hiroki Kawazoe ◽  
Takanori Inayoshi ◽  
Taka-aki Kawakami ◽  
Yoshinobu Matsuda ◽  
...  
Keyword(s):  
Amorphous Carbon ◽  
Carbon Film ◽  
Deposition Process ◽  
Amorphous Carbon Film

Influence of Deposition Time on Amorphous Carbon Thin Films Performance with Aerosol-Assisted Chemical Vapor Deposition

2013 ◽  
Vol 832 ◽  
pp. 712-717
Author(s):  
A.N. Fadzilah ◽  
Dayana Kamaruzaman ◽  
Yosri M. Siran ◽  
M. Rejab Syahril Anuar ◽  
Ahmad Jaril Asis ◽  
...  
Keyword(s):  
Thin Films ◽  
Amorphous Carbon ◽  
Vapor Deposition ◽  
Deposition Time ◽  
Electrical Characterization ◽  
Chemical Vapor ◽  
Argon Atmosphere ◽  
Carbon Precursor ◽  
Solar Simulator ◽  
Current Voltage

Pure amorphous Carbon (a-C) thin films had been deposited by Aerosol-Assisted CVD (AACVD) onto glass substrate in Argon atmosphere. The camphor oil was chosen as the carbon precursor to prepare the a-C thin films with the deposition time of 15 minutes, 30 minutes, 45 minutes, 60 minutes and 75 minutes. The electrical, optical and structural properties of the deposited a-C were discussed by using the current-voltage solar simulator system, UV-Vis-Nir spectrophotometer and Raman spectroscope respectively. For the electrical characterization, the samples showed the photoresponse performance when being illuminated under AM 1.5 illuminations: 100 mW/cm2, 25°C. Transmittance value for the a-C thin films was also considered high ~80% and the structural analysis by using Raman spectroscope exhibit two main peaks known as the D-peak and G-peak which is typical for the a-C.

A photovoltaic cell from p-type boron-doped amorphous carbon film

2003 ◽  
Vol 77 (1) ◽  
pp. 105-112 ◽  
Author(s):  
X.M. Tian ◽  
M. Rusop ◽  
Y. Hayashi ◽  
T. Soga ◽  
T. Jimbo ◽  
...  
Keyword(s):  
Amorphous Carbon ◽  
Carbon Film ◽  
Photovoltaic Cell ◽  
Amorphous Carbon Film ◽  
Boron Doped ◽  
P Type

PHOTON-ENHANCED SURFACE DISSOCIATION EFFECTS IN LASER PHOTOLYSIS OF AMORPHOUS CARBON FROM CH2I2

2001 ◽  
Vol 08 (06) ◽  
pp. 609-612 ◽  
Author(s):  
KLAUS PIGLMAYER ◽  
MIKAEL LINDSTAM ◽  
MATS BOMAN
Keyword(s):  
Amorphous Carbon ◽  
Room Temperature ◽  
Film Formation ◽  
Carbon Film ◽  
Deposition Process ◽  
Molecular Fragments ◽  
Large Area ◽  
Substrate Heating ◽  
Adsorbed Intermediate ◽  
Enhanced Surface

With near-UV Ar +-laser-induced photolysis of gaseous CH 2 I 2, efficient, large-area or localized deposition of iodine-free amorphous carbon is possible at room temperature. The method allows a separate substrate heating and thereby a tuning of the deposits properties from soft and polymer-like to diamond-like. This article reports on an observed photon–surface interaction resulting in an enhanced carbon film formation. The shape of the deposit indicates that the deposition process is supported by an increased absorption cross section of surface-adsorbed intermediate molecular fragments, with respect to flat-angle surface-impinging photons.

IR Absorption Spectroscopy of Deposition Process of Amorphous Carbon Film due to Ethylene Plasma

2018 ◽  
Vol 138 (11) ◽  
pp. 544-550
Author(s):  
Masanori Shinohara ◽  
Taisuke Tominaga ◽  
Hayato Shimomura ◽  
Takeshi Ihara ◽  
Yoshihito Yagyu ◽  
...  
Keyword(s):  
Absorption Spectroscopy ◽  
Amorphous Carbon ◽  
Carbon Film ◽  
Deposition Process ◽  
Ir Absorption ◽  
Amorphous Carbon Film

Amorphous carbon antireflective coatings in the 10 to 50 μm region of the far-IR

1994 ◽  
Vol 9 (2) ◽  
pp. 396-400 ◽  
Author(s):  
Serhat Metin ◽  
James H. Kaufman ◽  
David D. Saperstein ◽  
Campbell J. Scott ◽  
James Heyman ◽  
...  
Keyword(s):  
Amorphous Carbon ◽  
Carbon Film ◽  
Chemical Vapor ◽  
Deposition Process ◽  
Carbon Films ◽  
Antireflective Coatings ◽  
Good Adhesion ◽  
Amorphous Carbon Films ◽  
Photoconductive Detectors ◽  
Minimal Stress

The efficiency of far-IR germanium photoconductive detectors can be markedly improved by antireflective coatings. Recently, there has been an effort to develop several micrometer thick, low stress, amorphous carbon films for this purpose. To date, films of no more than 1 to 2 μm have been reported in the literature. In this paper we report the deposition of low stress carbon films which are over 5 μm thick and are effective antireflective coatings at wavelengths of up to Λ = 43 μm. Minimal stress, a requirement for good adhesion, was achieved with a chemical vapor deposition process (CVD) by controlling the hydrocarbon partial pressure (2.2 mTorr) and by doping the carbon film with nitrogen.

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