Zirconium Based Metal Pretreatments: A Characterization Method for Ecologically Sustainable Thin Film Surface Pretreatments

2016 ◽  
Vol 869 ◽  
pp. 693-698
Author(s):  
Demetrio Jackson dos Santos ◽  
Lara Basilio Tavares ◽  
Maria Cecilia Salvadori
Keyword(s):  
Thin Film ◽  
Metal Oxide ◽  
Film Surface ◽  
Industrial Applications ◽  
Electrochemical Analysis ◽  
Corrosion Mechanism ◽  
Metal Oxide Thin Films ◽  
Thin Film Surface ◽  
Before And After ◽  
Ecologically Sustainable

Zirconium based metal pretreatments have become widely used in recent years as a substitute for phosphate deposition on steel alloys and for chromate on aluminum alloys in industrial applications. The choice of a zirconium based intermediate layer follows from its ecologic sustainability − decreased water and energy consumption, vehicle weight reduction, and low byproduct generation during processing. Here we describe our investigations of a characterization method of converted metal oxide thin films deposited by a plasma method. The thin film composition was characterized by Rutherford Backscattering Spectroscopy (RBS) and Energy Dispersive Spectroscopy (EDS) before and after conversion by a zirconium-based pretreatment, revealing the formation of zirconia after treatment. The corrosion mechanism of the deposited metal oxide films was investigated using electrochemical analysis, confirming the susceptibility of the film to corrosion and the applicability of corrosion investigations. The results pointed to a better performance of the RBS in comparison to EDS.

scholarly journals Microstructural and Energy-Dispersive X-ray Analyses on Argon Ion Implantations in Tantalum Thin Films for Microelectronic Substrates

Electronics ◽  
2021 ◽  
Vol 10 (23) ◽  
pp. 2941
Author(s):  
Amir Hoshang Ramezani ◽  
Siamak Hoseinzadeh ◽  
Zhaleh Ebrahiminejad ◽  
Milad Sangashekan ◽  
Saim Memon
Keyword(s):  
Thin Film ◽  
Film Surface ◽  
Sem Analysis ◽  
Energy Dispersive ◽  
Height Distribution ◽  
Correlation Lengths ◽  
X Ray ◽  
Thin Film Surface ◽  
Before And After ◽  
Argon Ion

In the present study, the microstructural and statistical properties of unimplanted in comparison to argon ion-implanted tantalum-based thin film surface structures are investigated for potential application in microelectronic thin film substrates. In the study, the argon ions were implanted at the energy of 30 keV and the doses of 1×1017, 3×1017, and 7×1017 (ion/cm2) at an ambient temperature. Two primary goals have been pursued in this study. First, by using atomic force microscopy (AFM) analysis, the roughness of samples, before and after implantation, has been studied. The corrosion apparatus wear has been used to compare resistance against tantalum corrosion for all samples. The results show an increase in resistance against tantalum corrosion after the argon ion implantation process. After the corrosion test, scanning electron microscopy (SEM) analysis was applied to study the sample morphology. The elemental composition of the samples was characterized by using energy-dispersive X-ray (EDX) analysis. Second, the statisticalcharacteristics of both unimplanted and implanted samples, using the monofractal analysis with correlation function and correlation length of samples, were studied. The results show, however, that all samples are correlated and that the variation of ion doses has a negligible impact on the values of correlation lengths. Moreover, the study of height distribution and higher-order moments show the deviation from Gaussian distribution. The calculations of the roughness exponent and fractal dimension indicates that the implanted samples are the self-affine fractal surfaces.

Stoichiometric composition of thin-film surface structures and its influence on the functional characteristics as regards gyroscopic devices

2020 ◽  
pp. 78-90
Author(s):  
M. A. Tit ◽  
S. N. Belyaev
Keyword(s):  
Thin Film ◽  
Titanium Nitride ◽  
Niobium Carbide ◽  
Structural Phase ◽  
Stoichiometric Composition ◽  
Film Surface ◽  
Surface Structures ◽  
Functional Surface ◽  
Base Surface ◽  
Thin Film Surface

This article considers the research results of the effect of stoichiometry on the properties of titanium nitride thin-film coatings of the float and electrostatic gyroscopes. It presents the results of tests of such mechanical and optical characteristics of titanium nitride thin-film structures as microhardness, resistance to wear and friction, and image contrast determined by the reflection coefficients of a titanium nitride base surface and a raster pattern formed by local laser oxidation. When making a rotor of a cryogenic gyroscope, the prospects of use and technological methods for the formation of functional surface structures of niobium carbide and nitride are considered. It is shown that during the formation of coatings of the required composition, the most important is the thermodynamic estimation of possible interactions. These interactions allow us to accomplish the structural-phase modification of the material, which is determined by the complex of possible topochemical reactions leading to the formation of compounds, including non-stoichiometric composition.

Microarray of neuroblastoma cells on the selectively functionalized nanocrystalline diamond thin film surface

2016 ◽  
Vol 361 ◽  
pp. 269-276 ◽  
Author(s):  
Young-Sang Park ◽  
Hyeong-Guk Son ◽  
Dae-Hoon Kim ◽  
Hong-Gi Oh ◽  
Da-Som Lee ◽  
...  
Keyword(s):  
Thin Film ◽  
Neuroblastoma Cells ◽  
Film Surface ◽  
Nanocrystalline Diamond ◽  
Thin Film Surface ◽  
Diamond Thin Film

Thin Film Surface Resistance Measurements For Superconducting Cavity Applications

1991 ◽  
pp. 155-160
Author(s):  
A. Andreone ◽  
C. Attanasio ◽  
A. Di Chiara ◽  
L. Maritato ◽  
A. Nigro ◽  
...  
Keyword(s):  
Thin Film ◽  
Surface Resistance ◽  
Film Surface ◽  
Superconducting Cavity ◽  
Thin Film Surface

scholarly journals SYNTHESIS OF THIN FILM OF TiO2 ON GRAPHITE SUBSTRATE BY CHEMICAL BATH DEPOSITION

2010 ◽  
Vol 6 (2) ◽  
pp. 121-126 ◽  
Author(s):  
Fitria Rahmawati ◽  
Sayekti Wahyuningsih ◽  
Pamularsih A.W
Keyword(s):  
Thin Film ◽  
Chemical Bath Deposition ◽  
Surfactant Concentration ◽  
High Efficiency ◽  
Anatase Phase ◽  
Film Surface ◽  
Optical Microscope ◽  
Graphite Substrate ◽  
Thin Film Surface ◽  
Photon Conversion

Thin film of TiO2 on graphite substrat has been prepared by means of chemical bath deposition. Cetyltrimethylammonium Bromide served  as linking agent of synthesized TiO2 to graphite substrate.The optical microscope and Scanning Electron Microscope (SEM) indicate that surfactant concentration affects the pore morphology of thin film Surface Area Analysis (SAA) of thin film indicated that the pore of thin film included in mesopore category. The anatase phase of TiO2 quantity arised as the surfactant concentration increase, gave high efficiency of induced photon conversion to current efficiency (% IPCE).   Keywords: thin film, TiO2, deposition, graphite

scholarly journals Positioning of the Precursor Gas Inlet in an Atmospheric Dielectric Barrier Reactor, and its Effect on the Quality of Deposited TiOx Thin Film Surface

10.14311/1767 ◽  
2013 ◽  
Vol 53 (2) ◽  
Author(s):  
Jan Píchal ◽  
Julia Klenko
Keyword(s):  
Thin Film ◽  
Thin Films ◽  
Dielectric Barrier Discharge ◽  
Atmospheric Pressure ◽  
Barrier Discharge ◽  
Film Surface ◽  
Dielectric Barrier ◽  
Thin Film Surface ◽  
Atmospheric Dielectric Barrier Discharge

Thin film technology has become pervasive in many applications in recent years, but it remains difficult to select the best deposition technique. A further consideration is that, due to ecological demands, we are forced to search for environmentally benign methods. One such method might be the application of cold plasmas, and there has already been a rapid growth in studies of cold plasma techniques. Plasma technologies operating at atmospheric pressure have been attracting increasing attention. The easiest way to obtain low temperature plasma at atmospheric pressure seems to be through atmospheric dielectric barrier discharge (ADBD). We used the plasma enhanced chemical vapour deposition (PECVD) method applying atmospheric dielectric barrier discharge (ADBD) plasmafor TiOx thin films deposition, employing titanium isopropoxide (TTIP) and oxygen as reactants, and argon as a working gas. ADBD was operated in filamentary mode. The films were deposited on glass. We studied the quality of the deposited TiOx thin film surface for various precursor gas inlet positions in the ADBD reactor. The best thin films quality was achieved when the precursor gases were brought close to the substrate surface directly through the inlet placed in one of the electrodes.High hydrophilicity of the samples was proved by contact angle tests (CA). The film morphology was tested by atomic force microscopy (AFM). The thickness of the thin films varied in the range of (80 ÷ 210) nm in dependence on the composition of the reactor atmosphere. XPS analyses indicate that composition of the films is more like the composition of TiOxCy.

Covalent immobilization of DNA and hybridization on microchips by microsecond electric field pulses

2004 ◽  
Vol 820 ◽  
Author(s):  
F. Fixe ◽  
H.M. Branz ◽  
D.M.F. Prazeres ◽  
V. Chu ◽  
J.P. Conde
Keyword(s):  
Thin Film ◽  
Electric Field ◽  
Film Surface ◽  
Covalent Immobilization ◽  
Plastic Substrate ◽  
Field Pulse ◽  
Thin Film Surface ◽  
Large Size ◽  
Electrode Voltage ◽  
Film Area

AbstractSingle square voltage pulses were used to enhance by 7 and 9 orders of magnitude the rate of covalent immobilization and hybridization, respectively, of single stranded DNA probes on a chemically functionalized thin film surface (silicon dioxide) using 2 mm size electrodes. These electrodes were scaled down to 20 μm. Photolithography was used to define the electrode voltage line, ground line, and functionalized thin-film area on a plastic substrate (polyimide). At all electrode dimensions, electric field-assisted DNA immobilization and hybridization can be achieved in the microsecond time scale, far faster than the 2 hr or 16 hr needed for immobilization and hybridization, respectively, without the electric field. Pulse conditions optimized with the large-size electrodes (2 mm) were used in the microelectrodes.

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