MeV Multiple Implantation of Nitrogen Ions to Pure Chromium. II. Effect of Heat Treatment on the Depth Profile of Nitrogen Concentration.

Although gold nitride has been produced by Siller and co-workers by irradiating a gold film with low energy nitrogen ions, the unsuccessful reason for previous attempts to produce gold nitride is not clear yet. In general, nitrogen concentration depth profile probably influences gold nitride formation. But it is difficult to measure nitrogen concentration depth profile in the N-implanted layer at a low implantation energy of 500 eV. Ion concentration depth profiles in amorphous solids can be determined rather accurately in the case of low implantation fluences using TRIM code. The sputtering effect of ion implantation of high fluences on the concentration depth profile of implanted nitrogen ions should be considered. A dynamic computer simulation based on a TRIDYN code has been applied to calculate nitrogen concentration depth profile in a N-implanted gold film using the different parameters of the fluence and energy in the present work. The sputtering effect of a high fluence on the concentration depth profile can be considered in the TRIDYN simulation. The parameters of fluence and energy that enable to get the gold nitride in thin film are analyzed based on the simulation results. It is put forward some possible ways to improve the formation of gold nitride further.

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Computer Simulation of Ion Beam Enhanced Deposition of Titanium Nitride Films

MRS Proceedings ◽

10.1557/proc-157-91 ◽

1989 ◽

Vol 157 ◽

Author(s):

Wang Xi ◽

Zhou Jiankun ◽

Chen Youshan ◽

Liu Xianghuai ◽

Zou Shichang

Keyword(s):

Computer Simulation ◽

Titanium Nitride ◽

Film Growth ◽

Ion Beam ◽

Nitrogen Concentration ◽

Ion Source ◽

Nitrogen Gas ◽

Titanium Layer ◽

Adsorption Of Nitrogen ◽

Nitrogen Ions

ABSTRACTA Monte-Carlo computer simulation has been performed to describe, at atomic level, the growth of titanium nitride films formed by ion beam enhanced deposition (IBED). The simulation is based on a random target, fixed free path of moving particles and binary collisions. An alternate process of deposition of titanium atoms and implantation of nitrogen ions is applied instead of the actual continuous and synchronous process of IBED. According to the actual conditions, the adsorption of nitrogen gas, which is leaked out from the ion source, at the fresh titanium layer surface has been considered. In addition, the change of the composition profile and the density profile during film growth is taken into account. It is demonstrated that the width of the intermixed region between the film and substrate increases with the increase of the atomic arrival ratio, R, of implanted nitrogen ions to deposited titanium atoms. When the titanium deposition rate is low, the nitrogen concentration of the film is relatively insensitive to R, indicating that a dominant contribution to the nitrogen concentration is derived from the nitrogen gas leaked out from the ion source. The results obtained in this study are in agreement with the experimental measurements.

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Stress Induced Nitrogen Diffusion in Nitrided Austenitic Stainless Steel

Materials Science ◽

10.5755/j01.ms.17.1.241 ◽

1970 ◽

Vol 17 (1) ◽

pp. 11-15 ◽

Cited By ~ 4

Author(s):

Teresa MOSKALIOVIENĖ ◽

Arvaidas GALDIKAS

Keyword(s):

Stainless Steel ◽

Austenitic Stainless Steel ◽

Depth Profile ◽

Nitrogen Concentration ◽

Stress Gradient ◽

Surface Concentration ◽

Plasma Source ◽

Fickian Diffusion ◽

Internal Stresses ◽

Nitrogen Diffusion

The nitrogen transport mechanism in plasma nitrided austenitic stainless steel at moderate temperatures (around 400 °C) is explained by non-Fickian diffusion model. The model considers the diffusion of nitrogen in presence of internal stresses gradient induced by penetrating nitrogen as the next driving force of diffusion after concentration gradient. For mathematical description of stress induced diffusion process the equation of barodiffusion is used, which involves concentration dependant barodiffusion coefficient. For calculation of stress gradient it is assumed that stress depth profile linearly relates with the nitrogen concentration depth profile. The calculated nitrogen depth profiles in an austenitic stainless steel are in good agreement with experimental nitrogen profiles. The diffusion coefficient D = 1.68-10 -12 cm2/s for nitrogen in a plasma source ion nitrided 1Cr18Ni9Ti (18-8 type) austenitic stainless steel at 380 °C was found from fitting of experimental data. It is shown that nitrogen penetration depth and nitrogen surface concentration increases with nitriding temperature nonlinearly.http://dx.doi.org/10.5755/j01.ms.17.1.241

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Residual stress and strain-free lattice-parameter depth profiles in a γ′-Fe4N1-x layer on an α-Fe substrate measured by x-ray diffraction stress analysis at constant information depth

Journal of Materials Research ◽

10.1557/jmr.2009.0153 ◽

2009 ◽

Vol 24 (4) ◽

pp. 1342-1352 ◽

Cited By ~ 6

Author(s):

M. Wohlschlögel ◽

U. Welzel ◽

E.J. Mittemeijer

Keyword(s):

Residual Stress ◽

Stress Analysis ◽

Depth Profile ◽

Nitrogen Concentration ◽

Lattice Parameter ◽

Free Lattice ◽

X Ray Diffraction ◽

X Ray ◽

Depth Profiles ◽

Grain Interaction

The residual stress and lattice-parameter depth profiles in a γ′-Fe4N1-x layer (6-μm thickness) grown on top of an α-Fe substrate were investigated using x-ray diffraction stress analysis at constant penetration depths. Three different reflections (220, 311, and 222) were recorded at six different penetration depths using three different wavelengths. At each penetration depth, x-ray diffraction stress analysis was performed on the basis of the sin2ψ method. As a result, the residual-stress depth profile was obtained from the measured lattice strains. The lattice spacings measured in the strain-free direction were used to determine the (strain-free) lattice-parameter depth profile. The nitrogen-concentration depth profile in the layer was calculated by applying a relationship between the (strain-free) γ′ lattice parameter and the nitrogen concentration. It was found that the strain-free lattice-parameter depth profile as derived from the 311 reflections is best compatible with nitrogen concentrations at the surface and at the γ′/α interface as predicted on the basis of local thermodynamic equilibrium. It could be shown that the 311 reflection is most suitable for the analysis of lattice-parameter and residual stress depth profiles because the corresponding x-ray elastic constants exhibit the least sensitivity to the type of and changes in grain interaction. The depth-dependence of the grain interaction could be revealed. It was found that the grain interaction changes from Voigt-type near the surface to Reuss-type at the layer/substrate interface.

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Chemical heat treatment of steels with super-equilibrium nitrogen concentration

Politechnical student journal ◽

10.18698/2541-8009-2020-8-636 ◽

2020 ◽

Author(s):

D.A. Goncharevskaya ◽

Keyword(s):

Heat Treatment ◽

Nitrogen Concentration ◽

Chemical Heat Treatment ◽

Chemical Heat

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Depth profile of nitrogen concentration and nano-hardness in nitrogen implanted Zr at RT and at 600°C

Surface and Coatings Technology ◽

10.1016/s0257-8972(98)00408-3 ◽

1998 ◽

Vol 103-104 ◽

pp. 323-327 ◽

Cited By ~ 9

Author(s):

Y Miyagawa ◽

S Nakao ◽

K Baba ◽

R Hatada ◽

M Ikeyama ◽

...

Keyword(s):

Depth Profile ◽

Nitrogen Concentration

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MeV Multiple Implantation of Nitrogen Ions to Pure Chromium. I. Effect of Substrate Temperature on the Crystallinity of the Modified Layer.

Journal of The Surface Finishing Society of Japan ◽

10.4139/sfj.43.1209 ◽

1992 ◽

Vol 43 (12) ◽

pp. 1209-1215 ◽

Cited By ~ 1

Author(s):

Fumitaka NISHIYAMA ◽

Satoshi YOSHIDA ◽

Hiroki SAKAMOTO ◽

Takeshi HIROKAWA ◽

Yoshiyuki KISO ◽

...

Keyword(s):

Substrate Temperature ◽

Nitrogen Ions ◽

Modified Layer ◽

Pure Chromium

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Surface evaluation of carbon steel doped with nitrogen ions

Revista UIS Ingenierías ◽

10.18273/revuin.v19n1-2020019 ◽

2020 ◽

Vol 19 (1) ◽

pp. 205-212

Author(s):

Felipe Sanabria-Martínez ◽

ElyDannier Valbuena-Niño ◽

Miryam Rincon-Joya ◽

HugoArmando Estupiñán-Duran ◽

Fernando Viejo-Abrante

Keyword(s):

Energy Dispersive Spectroscopy ◽

Nitrogen Concentration ◽

High Vacuum ◽

High Voltage Pulse ◽

Energy Dispersive ◽

Uniform Corrosion ◽

Scanning Electronic Microscopy ◽

Atmo Sphere ◽

Nitrogen Ions ◽

Steel Substrates

This studyproposes by meansof analytical characterization techniques, astructural evaluation of the surfacemodification of aferrous material bythree-dimensionalion implantationplasma technology.Carbon steel substrates immerse in a gaseous atMo sphere,were surface implantedwith nitrogen ionsvia high voltage pulse discharges activated at a low-pressure range (“high vacuum”).The effect of the surface treatment on the structure, composition and morphology of the substrates was verified by microscopy and spectroscopy techniques. From the micrographs obtained by scanning electronic microscopy and the analysis elemental by energy dispersive spectroscopy the morphology and nitrogen concentration of thetreated and non-treated samples wereanalyzedand compared. As for the elemental analysis by energy dispersive spectroscopy, nitrogen concentration in the implanted substrates were detected and determinedat a relatively low amount. In regard to the X-raydiffraction results, a decrease in the intensity of the (110), (200)and (211)planes of the treated substratecompared with the reference substrate,wasobserved. Theanalysis ofphases-formation onthe surface materialperformed by Raman spectroscopy, identified mainly ferric oxy-hydroxidestypical uniform corrosion products.

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