scholarly journals Ensuring uniform thickness of the conductive coating on the inner surface of the hemispherical resonator by magnetron sputtering

2021 ◽  
Vol 9 (6) ◽  
pp. 523-532
Author(s):  
Vladimir Kondratenko ◽  
Gaik Sagatelyan ◽  
Andrey Shishlov ◽  
Mikhail Bilinkin
Keyword(s):  
Thin Film ◽  
Magnetron Sputtering ◽  
Thickness Distribution ◽  
Metal Coating ◽  
Uniform Thickness ◽  
Final Configuration ◽  
Inner Surface ◽  
Hemispherical Resonator ◽  
Fixed Screen ◽  
Made In

The possibilities of technological ensuring of the uniformity of thickness distribution of a thin-film metal coating produced by magnetron sputtering on the inner surface of a thinwalled silica resonator made in the shape of a hemisphere are considered. The possibility of minimizing the thickness of the coating by optimizing the diameter of the annular magnetron emission zone in combination with the distance from the resonator to the target made of sprayed material is shown. A further increase in the evenness of thickness of the coating is possible on the basis of the use of a fixed screen with a hole, the shape and location of which are calculated analytically, and the final configuration of the contour is specified empirically

Experimental and Simulation Study of Magnetron Sputtering MgO Film Thickness Distribution

2014 ◽  
Vol 900 ◽  
pp. 401-404 ◽  
Author(s):  
Ya Ping Han ◽  
Jing Yan Feng ◽  
Qiang Fu ◽  
Fan Da Zeng ◽  
Guan Wang
Keyword(s):  
Thin Film ◽  
Magnetron Sputtering ◽  
Film Thickness ◽  
Physical Model ◽  
Simulation Study ◽  
Theoretical Basis ◽  
Thickness Distribution ◽  
Si Substrate

A physical model of magnetron sputtering process was built, the distribution of MgO film thickness on the substrate was deduced, and the data were analyzed by using the Matlab. nanosized MgO thin film was prepared on Si substrate by magnetron sputtering. SGC-10 was used to measure the thickness of MgO thin film. The results of experiment correspond fairly well with the theory. Both experiment and the theory show that the distribution of the film thickness on the substrate is uneven and it is also influenced by the radius as well as the distance between the target and substrate. The physical model provides a theoretical basis for evaluation and estimation of the film thickness.

Noise properties of thin-film Ni-P resistors embedded in printed circuit boards

2013 ◽  
Vol 61 (3) ◽  
pp. 731-735
Author(s):  
A.W. Stadler ◽  
Z. Zawiślak ◽  
W. Stęplewski ◽  
A. Dziedzic
Keyword(s):  
Thin Film ◽  
Printed Circuit Boards ◽  
Circuit Boards ◽  
Noise Component ◽  
Printed Circuit ◽  
Resistance Bridge ◽  
Different Types ◽  
Signal Path ◽  
Resistance Fluctuations ◽  
Made In

Abstract. Noise studies of planar thin-film Ni-P resistors made in/on Printed Circuit Boards, both covered with two different types of cladding or uncladded have been described. The resistors have been made of the resistive-conductive-material (Ohmega-Ply©) of 100 Ώ/sq. Noise of the selected pairs of samples has been measured in the DC resistance bridge with a transformer as the first stage in a signal path. 1/f noise caused by resistance fluctuations has been found to be the main noise component. Parameters describing noise properties of the resistors have been calculated and then compared with the parameters of other previously studied thin- and thick-film resistive materials.

Effect of Al2O3-doping on the structure and optoelectronic characteristics of MgZnO thin film prepared by RF magnetron sputtering

2021 ◽  
Vol 127 (7) ◽  
Author(s):  
Du-Cheng Tsai ◽  
Feng-Kuan Chen ◽  
Zue-Chin Chang ◽  
Bing-Hau Kuo ◽  
Erh-Chiang Chen ◽  
...  
Keyword(s):  
Thin Film ◽  
Magnetron Sputtering ◽  
Rf Magnetron Sputtering ◽  
Al2o3 Doping

scholarly journals Controlling Film Thickness Distribution by Magnetron Sputtering with Rotation and Revolution

Coatings ◽  
2021 ◽  
Vol 11 (5) ◽  
pp. 599
Author(s):  
Handan Huang ◽  
Li Jiang ◽  
Yiyun Yao ◽  
Zhong Zhang ◽  
Zhanshan Wang ◽  
...  
Keyword(s):  
Magnetron Sputtering ◽  
Film Thickness ◽  
Multilayer Film ◽  
Thickness Distribution ◽  
Parabolic Cylinder ◽  
Particle Model ◽  
Planetary Motion ◽  
X Rays ◽  
X Ray ◽  
Sputtering System

The laterally graded multilayer collimator is a vital part of a high-precision diffractometer. It is applied as condensing reflectors to convert divergent X-rays from laboratory X-ray sources into a parallel beam. The thickness of the multilayer film varies with the angle of incidence to guarantee every position on the mirror satisfies the Bragg reflection. In principle, the accuracy of the parameters of the sputtering conditions is essential for achieving a reliable result. In this paper, we proposed a precise method for the fabrication of the laterally graded multilayer based on a planetary motion magnetron sputtering system for film thickness control. This method uses the fast and slow particle model to obtain the particle transport process, and then combines it with the planetary motion magnetron sputtering system to establish the film thickness distribution model. Moreover, the parameters of the sputtering conditions in the model are derived from experimental inversion to improve accuracy. The revolution and rotation of the substrate holder during the final deposition process are achieved by the speed curve calculated according to the model. Measurement results from the X-ray reflection test (XRR) show that the thickness error of the laterally graded multilayer film, coated on a parabolic cylinder Si substrate, is less than 1%, demonstrating the effectiveness of the optimized method for obtaining accurate film thickness distribution.

AC Magnetron Sputtering: An Industrial Approach for High‐Voltage and High‐Performance Thin‐Film Cathodes for Li‐Ion Batteries

2021 ◽  
pp. 2002125
Author(s):  
Jokin Rikarte ◽  
Iñaki Madinabeitia ◽  
Giorgio Baraldi ◽  
Francisco José Fernández‐Carretero ◽  
Víctor Bellido‐González ◽  
...  
Keyword(s):  
Thin Film ◽  
Magnetron Sputtering ◽  
High Voltage ◽  
High Performance ◽  
Li Ion Batteries ◽  
Li Ion
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