Effect of post-deposition annealing on electrical properties and structures of aluminum oxide passivation film on a crystalline silicon substrate

2019 ◽  
Vol 58 (12) ◽  
pp. 125502
Author(s):  
Koji Arafune ◽  
Sho Kitano ◽  
Haruhiko Yoshida ◽  
Atsushi Ogura ◽  
Yasushi Hotta
Keyword(s):  
Electrical Properties ◽  
Aluminum Oxide ◽  
Silicon Substrate ◽  
Crystalline Silicon ◽  
Post Deposition Annealing ◽  
Passivation Film ◽  
Post Deposition

Effects of Post-Deposition Annealing on the Electrical Properties of HfSiO Films Grown by Atomic Layer Deposition

2005 ◽  
Vol 44 (4B) ◽  
pp. 2230-2234 ◽  
Author(s):  
Hag-Ju Cho ◽  
Hye Lan Lee ◽  
Hong Bae Park ◽  
Taek Soo Jeon ◽  
Seong Geon Park ◽  
...  
Keyword(s):  
Electrical Properties ◽  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
Post Deposition Annealing ◽  
Layer Deposition ◽  
Post Deposition

Effects of post deposition annealing atmosphere on interfacial and electrical properties of HfO2/Ge3N4 gate stacks

2019 ◽  
Vol 675 ◽  
pp. 16-22 ◽  
Author(s):  
Kumar Mallem ◽  
S.V. Jagadeesh Chandra ◽  
Minkyu Ju ◽  
Subhajit Dutta ◽  
Swagata Phanchanan ◽  
...  
Keyword(s):  
Electrical Properties ◽  
Annealing Atmosphere ◽  
Gate Stacks ◽  
Post Deposition Annealing ◽  
Post Deposition
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