Investigations on crack generation mechanism and crack reduction by buffer layer insertion in thermal-plasma-jet crystallization of amorphous silicon films on glass substrate

2014 ◽  
Vol 54 (1S) ◽  
pp. 01AE05
Author(s):  
Keisuke Tanaka ◽  
Shohei Hayashi ◽  
Seiji Morisaki ◽  
Seiichiro Higashi
Keyword(s):  
Amorphous Silicon ◽  
Buffer Layer ◽  
Thermal Plasma ◽  
Glass Substrate ◽  
Plasma Jet ◽  
Silicon Films ◽  
Generation Mechanism ◽  
Thermal Plasma Jet ◽  
Crack Generation

Generation of ultra high-power thermal plasma jet and its application to crystallization of amorphous silicon films

2017 ◽  
Vol 56 (6S2) ◽  
pp. 06HE05
Author(s):  
Ryosuke Nakashima ◽  
Ryota Shin ◽  
Hiroaki Hanafusa ◽  
Seiichiro Higashi
Keyword(s):  
Amorphous Silicon ◽  
High Power ◽  
Thermal Plasma ◽  
Plasma Jet ◽  
Silicon Films ◽  
Thermal Plasma Jet

Leading Wave Crystallization Induced by Micro-Thermal-Plasma-Jet Irradiation of Amorphous Silicon Films

2013 ◽  
Vol 52 (5S2) ◽  
pp. 05EE02 ◽  
Author(s):  
Shohei Hayashi ◽  
Yuji Fujita ◽  
Takahiro Kamikura ◽  
Kohei Sakaike ◽  
Muneki Akazawa ◽  
...  
Keyword(s):  
Amorphous Silicon ◽  
Thermal Plasma ◽  
Plasma Jet ◽  
Silicon Films ◽  
Thermal Plasma Jet

A new crystallization technique of Si films on glass substrate using thermal plasma jet

2005 ◽  
Vol 244 (1-4) ◽  
pp. 8-11 ◽  
Author(s):  
H. Kaku ◽  
S. Higashi ◽  
H. Taniguchi ◽  
H. Murakami ◽  
S. Miyazaki
Keyword(s):  
Thermal Plasma ◽  
Glass Substrate ◽  
Plasma Jet ◽  
Thermal Plasma Jet ◽  
Si Films

Effect of Grain Growth Control by Atmospheric Micro-Thermal- Plasma-Jet Crystallization of Amorphous Silicon Strips on TFT Characteristics

2014 ◽  
Vol 64 (10) ◽  
pp. 23-29 ◽  
Author(s):  
S. Morisaki ◽  
S. Hayashi ◽  
S. Yamamoto ◽  
T. Nakatani ◽  
S. Higashi
Keyword(s):  
Amorphous Silicon ◽  
Grain Growth ◽  
Thermal Plasma ◽  
Growth Control ◽  
Plasma Jet ◽  
Thermal Plasma Jet
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