Tailoring the optical properties of tin oxide thin films via gamma irradiation

In the current work, the optical properties of tin oxide thin films have been tailored via gamma irradiation for energy applications. The effect of Gamma radiation (50, 100, 150, 200 and 250 kGy) on the microstructural, absorption and oscillator parameters of SnO2 thin films has been investigated. XRD results reveal that the SnO2 films have the symmetry of the space group P42/mnm belonging to the tetragonal system. The crystallite size of γ-irradiated SnO2 thin film slightly increases as the irradiation dose increases. The allowed optical band gaps are estimated by applying various methods such as Tauc’s method, derivation of absorption spectrum fitting and absorption spectrum fitting approaches. The dispersion parameters are extracted from the dispersion curve of the real part of the refractive index. The single-effective-oscillator and Drude models for free charge carrier absorption are applied to obtain the dispersion parameters before and after γ-irradiation.

Interfacial Chemical Effects of Amorphous Zinc Oxide/Graphene

Research on the preparation and performance of graphene composite materials has become a hotspot due to the excellent electrical and mechanical properties of graphene. Among such composite materials, zinc oxide/graphene (ZnO/graphene) composite films are an active research topic. Therefore, in this study, we used the vacuum thermal evaporation technique at different evaporation voltages to fabricate an amorphous ZnO/graphene composite film on a flexible polyethylene terephthalate (PET). The amorphous ZnO/graphene composite film inherited the great transparency of the graphene within the visible spectrum. Moreover, its electrical properties were better than those of pure ZnO but less than those of graphene, which is not consistent with the original theoretical research (wherein the performance of the composite films was better than that of ZnO film and slightly lower than that of graphene). For example, the bulk free charge carrier concentrations of the composite films (0.13, 1.36, and 0.47 × 1018 cm−3 corresponding to composite films with thicknesses of 40, 75, and 160 nm) were remarkably lower than that of the bare graphene (964 × 1018 cm−3) and better than that of the ZnO (0.10 × 1018 cm−3). The underlying mechanism for the abnormal electrical performance was further demonstrated by X-ray photoelectron spectroscopy (XPS) detection and first-principles calculations. The analysis found that chemical bonds were formed between the oxide (O) of amorphous ZnO and the carbon (C) of graphene and that the transfer of the π electrons was restricted by C=O and C-O-C bonds. Given the above, this study further clarifies the mechanism affecting the photoelectric properties of amorphous composite films.

Critical View on Buffer Layer Formation and Monolayer Graphene Properties in High-Temperature Sublimation

In this work we have critically reviewed the processes in high-temperature sublimation growth of graphene in Ar atmosphere using closed graphite crucible. Special focus is put on buffer layer formation and free charge carrier properties of monolayer graphene and quasi-freestanding monolayer graphene on 4H–SiC. We show that by introducing Ar at higher temperatures, TAr, one can shift the formation of the buffer layer to higher temperatures for both n-type and semi-insulating substrates. A scenario explaining the observed suppressed formation of buffer layer at higher TAr is proposed and discussed. Increased TAr is also shown to reduce the sp3 hybridization content and defect densities in the buffer layer on n-type conductive substrates. Growth on semi-insulating substrates results in ordered buffer layer with significantly improved structural properties, for which TAr plays only a minor role. The free charge density and mobility parameters of monolayer graphene and quasi-freestanding monolayer graphene with different TAr and different environmental treatment conditions are determined by contactless terahertz optical Hall effect. An efficient annealing of donors on and near the SiC surface is suggested to take place for intrinsic monolayer graphene grown at 2000 ∘C, and which is found to be independent of TAr. Higher TAr leads to higher free charge carrier mobility parameters in both intrinsically n-type and ambient p-type doped monolayer graphene. TAr is also found to have a profound effect on the free hole parameters of quasi-freestanding monolayer graphene. These findings are discussed in view of interface and buffer layer properties in order to construct a comprehensive picture of high-temperature sublimation growth and provide guidance for growth parameters optimization depending on the targeted graphene application.

Direct observation of charge separation in an organic light harvesting system by femtosecond time-resolved XPS

The ultrafast dynamics of photon-to-charge conversion in an organic light-harvesting system is studied by femtosecond time-resolved X-ray photoemission spectroscopy (TR-XPS) at the free-electron laser FLASH. This novel experimental technique provides site-specific information about charge separation and enables the monitoring of free charge carrier generation dynamics on their natural timescale, here applied to the model donor-acceptor system CuPc:C60. A previously unobserved channel for exciton dissociation into mobile charge carriers is identified, providing the first direct, real-time characterization of the timescale and efficiency of charge generation from low-energy charge-transfer states in an organic heterojunction. The findings give strong support to the emerging realization that charge separation even from energetically disfavored excitonic states is contributing significantly, indicating new options for light harvesting in organic heterojunctions.

Critical View on Buffer Layer Formation and Monolayer Graphene Properties in High-Temperature Sublimation

In this work we have critically reviewed the processes in high-temperature sublimation growth of graphene in Ar atmosphere using enclosed graphite crucible. Special focus is put on buffer layer formation and free charge carrier properties of monolayer graphene and quasi-freestanding monolayer garphene on 4H-SiC. We show that by introducing Ar at different temperatures, TAr one can shift to higher temperatures the formation of the buffer layer for both n-type and semi-insulating substrates. A scenario explaining the observed suppresed formation of buffer layer at higher TAr is proposed and discussed. Increased TAr is also shown to reduce the sp3 hybridization content and defect densities in the buffer layer on n-type conductive substrates. Growth on semi-insulating substrates results in ordered buffer layer with significantly improved structural properties, for which TAr plays only a minor role. The free charge density and mobility parameters of monolayer graphene and quasi-freestanding monolayer graphene with different TAr and different environmental treatment conditions are determined by contactless terahertz optical Hall effect. An efficient annealing of donors on and near the SiC surface takes place in intrinsic monolayer graphene grown at 2000∘C, and which is found to be independent of TAr. Higher TAr leads to higher free charge carrier mobility parameters in both intrinsically n-type and ambient p-type doped monolayer graphene. TAr is also found to have a profound effect on the free hole parameters of quasi-freestanding monolayer graphene. These findings are discussed in view of interface and buffer layer properties in order to construct a comprehensive picture of high-temperature sublimation growth and provide guidance for growth parameters optimization depending on the targeted graphene application.

Зависимость подвижности носителей заряда в гибридных наноструктурах на интерфейсе графена с молекулярными ионами от их зарядовой плотности

A.V. Butko, V.Y. Butko, Y.A.Kumzerov Ioffe Institute, 194021, St. Petersburg, Russia Hybrid nanostructures with large interface between nanostructural elements play an important role in the modern electronics. Among these nanostructures are hybrid nanostructures formed at the interface of graphene with ensembles of molecular ions in the solution gated Graphene Field Effect Transistors (GFETs) that are promising for chemical and biological sensor fabrication. Therefore investigation of interfacial effects in electrical transport in these systems is interesting. This work is a theoretical study of dependence of the charge carrier mobility (µ) in these nanostructures on density of the interfacial molecular ions (Nii). We show that dependence µ~1/(Nii)^1/2 obtained in free charge carrier model with short range scattering in case of the weak interaction between the charge carriers and the interfacial ions is in agreement with experimental transistor characteristics obtained at the high gate voltages.