Low-Temperature, Nontoxic Water-Induced Metal-Oxide Thin Films and Their Application in Thin-Film Transistors

2015 ◽  
Vol 25 (17) ◽  
pp. 2564-2572 ◽  
Author(s):  
Guoxia Liu ◽  
Ao Liu ◽  
Huihui Zhu ◽  
Byoungchul Shin ◽  
Elvira Fortunato ◽  
...  
Keyword(s):  
Thin Film ◽  
Thin Films ◽  
Low Temperature ◽  
Metal Oxide ◽  
Thin Film Transistors ◽  
Oxide Thin Films ◽  
Metal Oxide Thin Films

Facile patterning of amorphous indium oxide thin films based on a gel-like aqueous precursor for low-temperature, high performance thin-film transistors

2016 ◽  
Vol 4 (10) ◽  
pp. 2072-2078 ◽  
Author(s):  
Yuzhi Li ◽  
Linfeng Lan ◽  
Peng Xiao ◽  
Zhenguo Lin ◽  
Sheng Sun ◽  
...  
Keyword(s):  
Thin Film ◽  
Thin Films ◽  
Low Temperature ◽  
Indium Oxide ◽  
Thin Film Transistors ◽  
High Performance ◽  
Oxide Thin Film ◽  
Oxide Thin Films ◽  
Indium Oxide Thin Film

Facile patterning of chloride-based precursor films for low-temperature, high performance indium oxide thin-film transistors.

Low-Temperature Steam Annealing of Metal Oxide Thin Films from Aqueous Precursors: Enhanced Counterion Removal, Resistance to Water Absorption, and Dielectric Constant

2017 ◽  
Vol 29 (19) ◽  
pp. 8531-8538 ◽  
Author(s):  
Keenan N. Woods ◽  
Paul N. Plassmeyer ◽  
Deok-Hie Park ◽  
Lisa J. Enman ◽  
Aidan K. Grealish ◽  
...  
Keyword(s):  
Thin Films ◽  
Dielectric Constant ◽  
Low Temperature ◽  
Metal Oxide ◽  
Water Absorption ◽  
Oxide Thin Films ◽  
Metal Oxide Thin Films

scholarly journals 2D and 3D Analyses of Metal Oxide Thin Films Examined by Atomic Force Microscope

2015 ◽  
Vol 773-774 ◽  
pp. 716-719
Author(s):  
Mokhter Faezahana ◽  
Nayan Nafarizal ◽  
Jia Wei Low ◽  
Che Ani Norhidayah ◽  
Mohd Zainizan Sahdan ◽  
...  
Keyword(s):  
Thin Film ◽  
Thin Films ◽  
Metal Oxide ◽  
Three Dimensional ◽  
Thin Film Deposition ◽  
Film Deposition ◽  
Oxide Thin Films ◽  
Metal Oxide Thin Films ◽  
Atomic Force ◽  
Measured Sample

Atomic force microscope (AFM) is a useful tool to capture the two- and three-dimensional image of height and size of nanostructured thin film. It operate by measuring the forces between a sharp tip and surface of the measured sample. In addition, AFM is equipped with powerful software for image processing to interpret experimental results in detail. For example, by using the height and scanning length parameters of measured sample, average roughness and root mean square roughness can be evaluated. In the present works, the effect of image flattening process toward the surface roughness and surface fluctuations of metal oxide thin films will be presented. Set of samples were prepared by magnetron sputtering deposition and sol-gel coating techniques. In gas sensor industries using metal oxide thin film, surface roughness of metal oxide thin films are very important in order to improve the sensitivity and respond time of gas sensor. Therefore, optimization of thin film deposition and characterization are very important. The correlation between the three-dimensional image and thin film deposition and image processing parameters will also be presented.

Role of Combustion Chemistry in Low-Temperature Deposition of Metal Oxide Thin Films from Solution

2017 ◽  
Vol 29 (21) ◽  
pp. 9480-9488 ◽  
Author(s):  
Elizabeth A. Cochran ◽  
Deok-Hie Park ◽  
Matthew G. Kast ◽  
Lisa J. Enman ◽  
Cory K. Perkins ◽  
...  
Keyword(s):  
Thin Films ◽  
Low Temperature ◽  
Metal Oxide ◽  
Oxide Thin Films ◽  
Combustion Chemistry ◽  
Metal Oxide Thin Films ◽  
Low Temperature Deposition ◽  
Temperature Deposition

scholarly journals Low-temperature crystallization of solution-derived metal oxide thin films assisted by chemical processes

2018 ◽  
Vol 47 (2) ◽  
pp. 291-308 ◽  
Author(s):  
Iñigo Bretos ◽  
Ricardo Jiménez ◽  
Jesús Ricote ◽  
M. Lourdes Calzada
Keyword(s):  
Thin Films ◽  
Low Temperature ◽  
Metal Oxide ◽  
Chemical Processes ◽  
Oxide Thin Films ◽  
Metal Oxide Thin Films ◽  
Solution Methods ◽  
Low Temperature Crystallization ◽  
Crystalline Metal ◽  
Temperature Crystallization

Low-temperature chemical solution methods to prepare crystalline metal oxide thin films and to integrate them with flexible substrates are shown.

scholarly journals Advanced processes for low-temperature formation of functional metal oxide based thin films

2021 ◽  
Vol 2056 (1) ◽  
pp. 012046
Author(s):  
A Abduev ◽  
A Akhmedov ◽  
A Asvarov ◽  
V Kanevsky ◽  
A Muslimov ◽  
...  
Keyword(s):  
Thin Films ◽  
Low Temperature ◽  
Metal Oxide ◽  
Transparent Conductive Oxide ◽  
Oxide Thin Films ◽  
Metal Oxide Thin Films ◽  
Magnetron Deposition ◽  
Current Voltage ◽  
Plasma Target ◽  
Current Voltage Characteristics

Abstract The analysis the discharge processes in magnetron plasma, target sputtering processes, as well as nucleation and formation of oxide thin films during dc magnetron sputtering is carried out. Particular attention is paid to the phenomenon of instabilities of the current-voltage characteristics of magnetron plasma during the sputtering of oxide targets, the processes of structural transformations of the surface of metal oxide targets under ion bombardment impact, and the mechanisms of low-temperature magnetron deposition of metal oxide thin films. Based on the results of the analysis performed the optimal routes for improving technologies for the low-temperature formation of transparent conductive oxide thin films have been discussed.

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