scholarly journals Thermionic and tunneling transport mechanisms in graphene field-effect transistors

2008 ◽  
Vol 205 (7) ◽  
pp. 1527-1533 ◽  
Author(s):  
Victor Ryzhii ◽  
Maxim Ryzhii ◽  
Taiichi Otsuji
2015 ◽  
Vol 106 (8) ◽  
pp. 083501 ◽  
Author(s):  
Takahiro Mori ◽  
Yukinori Morita ◽  
Noriyuki Miyata ◽  
Shinji Migita ◽  
Koichi Fukuda ◽  
...  

2020 ◽  
Vol 8 (44) ◽  
pp. 15759-15770
Author(s):  
Alexandra Harbuzaru ◽  
Iratxe Arrechea-Marcos ◽  
Alberto D. Scaccabarozzi ◽  
Yingfeng Wang ◽  
Xugang Guo ◽  
...  

Different charge transport mechanisms at the device interface are found for a series of ladder-type semiconductors with increasing chain length.


2013 ◽  
Vol 8 (2) ◽  
pp. 110-115
Author(s):  
Márcio D. V. Martino ◽  
Felipe S. Neves ◽  
Paula Ghedini Der Agopian ◽  
João Antonio Martino ◽  
Rita Rooyackers ◽  
...  

The aim of this work is to study how the performance of nanowire tunnel field effect transistors (TFETs) is influenced by temperature variation. First of all, simulated energy band diagrams were presented to justify its fundamental working principle and this analysis was compared to experimental data obtained for temperature ranging from 300 to 420 K. This methodology was performed for different nanowire diameters and bias conditions, leading to a deep investigation of parameters such as the ratio of on-state and off-state current (ION/IOFF) and the subthreshold slope (S). Three different transport mechanisms (band-to-band tunneling, Shockley-Read-Hall generation/recombination and trap-assisted tunneling) were highlighted to explain the temperature influence on the drain current. As the final step, subthreshold slope values for each configuration were compared to the room temperature. Therefore, it was observed that larger nanowire diameters and lower temperatures tended to increase ION/IOFF ratio. Meanwhile, it was clear that band-to-band tunneling prevailed for higher gate voltage bias, resulting in a much slighter temperature effect on the drain current.


2007 ◽  
Vol 21 (08n09) ◽  
pp. 1219-1227 ◽  
Author(s):  
JIAN HUANG ◽  
D. S. NOVIKOV ◽  
D. C. TSUI ◽  
L. N. PFEIFFER ◽  
K. W. WEST

We present a fabrication process and results of transport measurements of a number of p-channel heterojunction-insulated-gate field-effect transistors (HIGFETs). Without intentional doping in HIGFETs, the disorder is likely to be less than that in the modulation-doped samples. We established a process that eliminates the well-known gate leakage problem. The hole density in our devices can be continuously tuned down to a record low value of 7 × 108 cm -2. Remarkably, such a dilute system (with Fermi wavelength approaching 1 μm) exhibits a non-activated conductivity that grows with temperature approximately as a power law at sufficiently low temperatures. We contrast it with the activated transport found in more disordered samples and discuss possible transport mechanisms in this strongly-interacting regime.


2013 ◽  
Vol 5 (10) ◽  
pp. 4417-4422 ◽  
Author(s):  
Simone Fabiano ◽  
Hiroyuki Yoshida ◽  
Zhihua Chen ◽  
Antonio Facchetti ◽  
Maria Antonietta Loi

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