scholarly journals The configurational energy gap between amorphous and crystalline silicon

2011 ◽  
Vol 5 (10-11) ◽  
pp. 361-363 ◽  
Author(s):  
F. Kail ◽  
J. Farjas ◽  
P. Roura ◽  
C. Secouard ◽  
O. Nos ◽  
...  
2018 ◽  
Vol 8 (1) ◽  
pp. 25
Author(s):  
Moniruzzaman Syed ◽  
Cameron Hynes ◽  
Brittany Anderson ◽  
Temer S Ahmadi ◽  
Boon Tong Goh ◽  
...  

Hydrogenated Nanocrystalline Silicon (nc-Si:H) thin films using SiH4/H2 mixture by glow discharged decomposition were investigated on c-Si and glass substrates. The effects of substrate temperature on the Structural, Optical and Electrical properties of the films were investigated by X-ray diffraction, Raman scattering, FT/IR, Optical transmission and Atomic Force Microscopy (AFM). Substrate temperatures ([TSB]) of the films were changed from 100oC to 250oC. It has been revealed the strong dependence on the film’s properties with the substrate temperatures. XRD and Raman measurements were shown that the higher substrate temperature (250oC) exhibits the highest crystalline volume fraction ([ρ] = 95%) and the lowest crystalline size ([Ω] = 3.5 nm) as well, having the highest H-content and the lowest O-content. At 250oC, the lowest mobility and the highest resistivity were also found to be ~37.5 cm2/v.s and 7.35 Ω-cm. Refractive index and the optical energy gap (Eg) were estimated by 3.8 and 1.9 eV having the growth rate of 4.2 nm/min. At 250oC, it was resulted in a blue shift of the absorption edge having uniform grain distributions. Results indicate that in situ hydrogen cleaning effects is prominent and localized orderly high density Si-Si bonds are exhibiting quantum size effects at highest substrate temperature.


2002 ◽  
Vol 737 ◽  
Author(s):  
D. J. Lockwood ◽  
M. W. C. Dharma-wardana ◽  
Z. H. Lu ◽  
D. H. Grozea ◽  
P. Carrier ◽  
...  

ABSTRACTUltrathin single quantum wells of crystalline silicon (c-Si) confined by SiO2 have been prepared by chemical and thermal processing of silicon-on-insulator wafers. The photoluminescence (PL) produced by these nanometer-thick single wells contains two bands: one exhibits a peak energy of ∼1.8 eV, while the second increases rapidly in peak energy with decreasing c-Si layer thickness. Comparison with theories based on self-consistent first-principles calculations shows that the increase in PL peak energy of the second band is consistent with that predicted for the c-Si energy gap of such wells. It also agrees with the measured band gap variation. The ∼1.8 eV PL band is attributed to the recombination of electron-hole pairs confined at the c-Si/SiO2 interface.


1996 ◽  
Vol 79 (9) ◽  
pp. 6943-6946 ◽  
Author(s):  
V. Alex ◽  
S. Finkbeiner ◽  
J. Weber

Author(s):  
Mazen M. A. Al Ibraheemi ◽  
Zainb Hassan Radhy

Non-crystalline silicon has a leading position in many fields of electronic industrial applications. With this type of silicon material, localized states in the middle of the energy gap, play an important role in determining the wafer characteristic. Therefore, the region around the middle of the energy gap is regarded as the center of charge carrier activities, whereas the occupancy function is employed to define the condition of the localized states, whether they are empty or filled with charge carriers. The occupancy function is divided into three parts within the energy gap. The most important part is the gap center which is always a flat region of a certain width and level. This paper investigates the effect of various parameters on width and level of the flat region of the silicon wafer occupancy function. The work was achieved with the aid of statistical approaches for curve fitting through regression equations. The main contribution is verified through creating a novel MATLAB-SIMULINK model for this case study. The proposed model may represent a significant addition to the Simulink library that does not have such a modelling block.


2011 ◽  
Vol 1370 ◽  
Author(s):  
Zahraa A. Ibrahim ◽  
Anatoli I. Shkrebtii ◽  
Frederic Zimmer-De Iuliis ◽  
Franco Gaspari

ABSTRACTThe thermal stability, evolution and structure of the bond-centered-hydrogen (BCH) defect in crystalline silicon, its temperature induced dissociation, and the new H complexes formed have been studied in the temperature range from 50 K to 650 K by first-principles molecular dynamics (MD). We demonstrate that BCH is stable at 60 K, but decays at and above 310 K in agreement with experimental results. The dissolved BCH forms new complexes: transitional interstitials, stable monohydride-like and monohydride/dihydride-like complexes. The calculated asymmetric vibrational frequency of H in the BCH complex is 2000 cm-1, very close to the experimental values. Calculated vibrational frequencies, electron charge densities, electron densities of states (DOS), and optical spectra demonstrate noticeable differences for the different geometries with the BCH, interstitial and monohydride-like complexes, especially in the vicinity of the energy gap. The BCH complex is found to induce characteristic donor states below the conduction band, and raises the Fermi level to above the donor state energies.


Author(s):  
J.P.S. Hanjra

Tin mono selenide (SnSe) with an energy gap of about 1 eV is a potential material for photovoltaic applications. Various authors have studied the structure, electronic and photoelectronic properties of thin films of SnSe grown by various deposition techniques. However, for practical photovoltaic junctions the electrical properties of SnSe films need improvement. We have carried out investigations into the properties of flash evaporated SnSe films. In this paper we report our results on the structure, which plays a dominant role on the electrical properties of thin films by TEM, SEM, and electron diffraction (ED).Thin films of SnSe were deposited by flash evaporation of SnSe fine powder prepared from high purity Sn and Se, onto glass, mica and KCl substrates in a vacuum of 2Ø micro Torr. A 15% HF + 2Ø% HNO3 solution was used to detach SnSe film from the glass and mica substrates whereas the film deposited on KCl substrate was floated over an ethanol water mixture by dissolution of KCl. The floating films were picked up on the grids for their EM analysis.


2013 ◽  
Vol 58 (2) ◽  
pp. 142-150 ◽  
Author(s):  
A.V. Sachenko ◽  
◽  
V.P. Kostylev ◽  
V.G. Litovchenko ◽  
V.G. Popov ◽  
...  

2020 ◽  
Vol 65 (3) ◽  
pp. 236
Author(s):  
R. M. Rudenko ◽  
O. O. Voitsihovska ◽  
V. V. Voitovych ◽  
M. M. Kras’ko ◽  
A. G. Kolosyuk ◽  
...  

The process of crystalline silicon phase formation in tin-doped amorphous silicon (a-SiSn) films has been studied. The inclusions of metallic tin are shown to play a key role in the crystallization of researched a-SiSn specimens with Sn contents of 1–10 at% at temperatures of 300–500 ∘C. The crystallization process can conditionally be divided into two stages. At the first stage, the formation of metallic tin inclusions occurs in the bulk of as-precipitated films owing to the diffusion of tin atoms in the amorphous silicon matrix. At the second stage, the formation of the nanocrystalline phase of silicon occurs as a result of the motion of silicon atoms from the amorphous phase to the crystalline one through the formed metallic tin inclusions. The presence of the latter ensures the formation of silicon crystallites at a much lower temperature than the solid-phase recrystallization temperature (about 750 ∘C). A possibility for a relation to exist between the sizes of growing silicon nanocrystallites and metallic tin inclusions favoring the formation of nanocrystallites has been analyzed.


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