Importance and Quality of Eating Related Photos in Diabetics

Author(s):  
Kyriaki Saiti ◽  
Martin Macaš ◽  
Lenka Lhotská
Keyword(s):  
2020 ◽  
Vol 10 (1) ◽  
pp. 31 ◽  
Author(s):  
Aleksandra S. Kristo ◽  
Büşra Gültekin ◽  
Merve Öztağ ◽  
Angelos K. Sikalidis

Evidence associates scholastic performance to quality of eating habits. However, there is limited information on this topic in Turkey, an emerging economy with notable disparities. Our work aimed to evaluate the effect of eating habits quality of high-school students in Turkey, on the Scholastic Aptitude Standardized Examination (TEOG) scores. The study was conducted in 29 different cities in Turkey during the academic year 2016–2017, involving students of ages 14–17 years (up to senior-high school). A dietary habits survey developed and validated for this population was distributed over the internet in February 2017. Apart from students’ TEOG scores, Family Affluence Score (FAS) was used to categorize the students into low, medium, and high financial standing. Eating Habits Score (EHS) was calculated by using a validated scoring system. A working sample of 298 participants was used. Based on our results, we observed that there is a significant positive correlation between EHS, FAS and success rate of students as assessed by TEOG scores. Further research on this subject should be conducted in combination with intervention studies to reveal potential strategies and policies that would enhance positive behavior change as it relates to nutritional habits, aiming at improved scholastic performance and overall health throughout lifespan.


2010 ◽  
Vol 20 (10) ◽  
pp. 1393-1399 ◽  
Author(s):  
Chaya Schweiger ◽  
Ram Weiss ◽  
Andrei Keidar

2009 ◽  
Vol 60 (sup3) ◽  
pp. 34-47 ◽  
Author(s):  
Rena I. Kosti ◽  
Demosthenes B. Panagiotakos ◽  
Anargiros Mariolis ◽  
Antonis Zampelas ◽  
Panagiotis Athanasopoulos ◽  
...  

2011 ◽  
Vol 24 (1) ◽  
pp. 33-37 ◽  
Author(s):  
Adrian T Smith ◽  
Susan Kelly-Weeder ◽  
Jennifer Engel ◽  
Katelyn A. McGowan ◽  
Bonnie Anderson ◽  
...  

Author(s):  
David Šmahel ◽  
Hana Macháčková ◽  
Martina Šmahelová ◽  
Michal Čevelíček ◽  
Carlos A. Almenara ◽  
...  
Keyword(s):  

Author(s):  
K. T. Tokuyasu

During the past investigations of immunoferritin localization of intracellular antigens in ultrathin frozen sections, we found that the degree of negative staining required to delineate u1trastructural details was often too dense for the recognition of ferritin particles. The quality of positive staining of ultrathin frozen sections, on the other hand, has generally been far inferior to that attainable in conventional plastic embedded sections, particularly in the definition of membranes. As we discussed before, a main cause of this difficulty seemed to be the vulnerability of frozen sections to the damaging effects of air-water surface tension at the time of drying of the sections.Indeed, we found that the quality of positive staining is greatly improved when positively stained frozen sections are protected against the effects of surface tension by embedding them in thin layers of mechanically stable materials at the time of drying (unpublished).


Author(s):  
L. D. Jackel

Most production electron beam lithography systems can pattern minimum features a few tenths of a micron across. Linewidth in these systems is usually limited by the quality of the exposing beam and by electron scattering in the resist and substrate. By using a smaller spot along with exposure techniques that minimize scattering and its effects, laboratory e-beam lithography systems can now make features hundredths of a micron wide on standard substrate material. This talk will outline sane of these high- resolution e-beam lithography techniques.We first consider parameters of the exposure process that limit resolution in organic resists. For concreteness suppose that we have a “positive” resist in which exposing electrons break bonds in the resist molecules thus increasing the exposed resist's solubility in a developer. Ihe attainable resolution is obviously limited by the overall width of the exposing beam, but the spatial distribution of the beam intensity, the beam “profile” , also contributes to the resolution. Depending on the local electron dose, more or less resist bonds are broken resulting in slower or faster dissolution in the developer.


Author(s):  
G. Lehmpfuhl

Introduction In electron microscopic investigations of crystalline specimens the direct observation of the electron diffraction pattern gives additional information about the specimen. The quality of this information depends on the quality of the crystals or the crystal area contributing to the diffraction pattern. By selected area diffraction in a conventional electron microscope, specimen areas as small as 1 µ in diameter can be investigated. It is well known that crystal areas of that size which must be thin enough (in the order of 1000 Å) for electron microscopic investigations are normally somewhat distorted by bending, or they are not homogeneous. Furthermore, the crystal surface is not well defined over such a large area. These are facts which cause reduction of information in the diffraction pattern. The intensity of a diffraction spot, for example, depends on the crystal thickness. If the thickness is not uniform over the investigated area, one observes an averaged intensity, so that the intensity distribution in the diffraction pattern cannot be used for an analysis unless additional information is available.


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