Submicron Lithography by Demagnifying Electron-Beam Projection

1984 ◽  
pp. 119-128 ◽  
Author(s):  
H. W. P. Koops ◽  
J. Grob
Keyword(s):  
Electron Beam ◽  
Beam Projection

Development of data conversion system for electron beam projection lithography

2002 ◽  
Vol 20 (6) ◽  
pp. 2672 ◽  
Author(s):  
Kokoro Kato ◽  
Kuninori Nishizawa ◽  
Tamae Haruki ◽  
Tadao Inoue ◽  
Koichi Kamijo ◽  
...  
Keyword(s):  
Electron Beam ◽  
Data Conversion ◽  
Projection Lithography ◽  
Conversion System ◽  
Beam Projection

High-Speed Proximity Effect Correction System for Electron-Beam Projection Lithography by Cluster Processing

2003 ◽  
Vol 42 (Part 1, No. 6B) ◽  
pp. 3827-3832 ◽  
Author(s):  
Kozo Ogino ◽  
Hiromi Hoshino ◽  
Yasuhide Machida ◽  
Morimi Osawa ◽  
Hiroshi Arimoto ◽  
...  
Keyword(s):  
Electron Beam ◽  
Proximity Effect ◽  
High Speed ◽  
Projection Lithography ◽  
Beam Projection ◽  
Proximity Effect Correction ◽  
Correction System

Stencil Mask Technology for Electron-Beam Projection Lithography

2003 ◽  
Vol 42 (Part 1, No. 6B) ◽  
pp. 3811-3815 ◽  
Author(s):  
Isao Amemiya ◽  
Hiroshi Yamashita ◽  
Sakae Nakatsuka ◽  
Tadashi Sakurai ◽  
Ikuru Kimura ◽  
...  
Keyword(s):  
Electron Beam ◽  
Projection Lithography ◽  
Stencil Mask ◽  
Beam Projection

Stitching accuracy measurement system for EB direct writing and electron-beam projection lithography (EPL)

2001 ◽  
Author(s):  
Takao Tamura ◽  
Takahiro Ema ◽  
Hiroshi Nozue ◽  
Tamoya Sugahara ◽  
Akio Sugano ◽  
...  
Keyword(s):  
Electron Beam ◽  
Measurement System ◽  
Direct Writing ◽  
Accuracy Measurement ◽  
Projection Lithography ◽  
Beam Projection

Scaled measurements of global space-charge induced image blur in electron beam projection system

2000 ◽  
Vol 18 (6) ◽  
pp. 2999 ◽  
Author(s):  
Liqun Han ◽  
R. Fabian Pease ◽  
W. Dan Meisburger ◽  
Gil I. Winograd ◽  
Kimitoshi Takahashi
Keyword(s):  
Electron Beam ◽  
Space Charge ◽  
Projection System ◽  
Global Space ◽  
Image Blur ◽  
Beam Projection
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