In Situ Analysis of Thin Film Nucleation and Growth using Variable Angle X-Ray Fluorescence

Author(s):  
Timothy Roberts ◽  
Kenneth Gray
2016 ◽  
Vol 23 (5) ◽  
pp. 1110-1117 ◽  
Author(s):  
M. V. Vitorino ◽  
Y. Fuchs ◽  
T. Dane ◽  
M. S. Rodrigues ◽  
M. Rosenthal ◽  
...  

A compact high-speed X-ray atomic force microscope has been developed forin situuse in normal-incidence X-ray experiments on synchrotron beamlines, allowing for simultaneous characterization of samples in direct space with nanometric lateral resolution while employing nanofocused X-ray beams. In the present work the instrument is used to observe radiation damage effects produced by an intense X-ray nanobeam on a semiconducting organic thin film. The formation of micrometric holes induced by the beam occurring on a timescale of seconds is characterized.


Nanoscale ◽  
2016 ◽  
Vol 8 (4) ◽  
pp. 1849-1853 ◽  
Author(s):  
S. E. R. Tay ◽  
A. E. Goode ◽  
J. Nelson Weker ◽  
A. A. Cruickshank ◽  
S. Heutz ◽  
...  

The nucleation and growth of a nanostructure controls its size and morphology, and ultimately its functional properties.


2018 ◽  
Vol 127 (2) ◽  
pp. 371-389 ◽  
Author(s):  
Tyler Oesch ◽  
Frank Weise ◽  
Dietmar Meinel ◽  
Christian Gollwitzer

JOM ◽  
2020 ◽  
Vol 73 (1) ◽  
pp. 201-211 ◽  
Author(s):  
Benjamin Gould ◽  
Sarah Wolff ◽  
Niranjan Parab ◽  
Cang Zhao ◽  
Maria Cinta Lorenzo-Martin ◽  
...  

Sign in / Sign up

Export Citation Format

Share Document