Variation of secondary electron yield in the fractured surface of melt-textured growth YBCO superconductor with Y2BaCu05 grains under a scanning electron microscope in the temperature range 81?300 K

1995 ◽  
Vol 14 (2) ◽  
pp. 99-101
Author(s):  
J. C. L. Chow ◽  
P. C. W. Fung
Keyword(s):  
Electron Microscope ◽  
Scanning Electron Microscope ◽  
Secondary Electron ◽  
Ybco Superconductor ◽  
Secondary Electron Yield ◽  
Temperature Range ◽  
Electron Yield ◽  
Fractured Surface ◽  
Scanning Electron

Edge Penetration Effects in the Low-Loss Electron Image in the SEM

1988 ◽  
Vol 46 ◽  
pp. 202-203
Author(s):  
Oliver C. Wells
Keyword(s):  
Electron Microscope ◽  
Scanning Electron Microscope ◽  
Beam Energy ◽  
Secondary Electron ◽  
Sharp Edge ◽  
Beam Diameter ◽  
Low Loss ◽  
Additional Information ◽  
Electron Image ◽  
Scanning Electron

The low-loss electron (LLE) image in the scanning electron microscope (SEM) is useful for the study of uncoated photoresist and some other poorly conducting specimens because it is less sensitive to specimen charging than is the secondary electron (SE) image. A second advantage can arise from a significant reduction in the width of the “penetration fringe” close to a sharp edge. Although both of these problems can also be solved by operating with a beam energy of about 1 keV, the LLE image has the advantage that it permits the use of a higher beam energy and therefore (for a given SEM) a smaller beam diameter. It is an additional attraction of the LLE image that it can be obtained simultaneously with the SE image, and this gives additional information in many cases. This paper shows the reduction in penetration effects given by the use of the LLE image.

Linewidth measurement using the low voltage SEM

1986 ◽  
Vol 44 ◽  
pp. 652-653
Author(s):  
M.G. Rosenfield
Keyword(s):  
Electron Microscope ◽  
Scanning Electron Microscope ◽  
Integrated Circuits ◽  
Secondary Electron ◽  
Low Voltage ◽  
Fabrication Process ◽  
Critical Dimensions ◽  
Linewidth Measurement ◽  
Threshold Technique ◽  
Scanning Electron

Minimum feature sizes in experimental integrated circuits are approaching 0.5 μm and below. During the fabrication process it is usually necessary to be able to non-destructively measure the critical dimensions in resist and after the various process steps. This can be accomplished using the low voltage SEM. Submicron linewidth measurement is typically done by manually measuring the SEM micrographs. Since it is desirable to make as many measurements as possible in the shortest period of time, it is important that this technique be automated.Linewidth measurement using the scanning electron microscope is not well understood. The basic intent is to measure the size of a structure from the secondary electron signal generated by that structure. Thus, it is important to understand how the actual dimension of the line being measured relates to the secondary electron signal. Since different features generate different signals, the same method of relating linewidth to signal cannot be used. For example, the peak to peak method may be used to accurately measure the linewidth of an isolated resist line; but, a threshold technique may be required for an isolated space in resist.

scholarly journals Coloring Pictures for Electron Microscopists or Elements of Digital Image Manipulation for Students

2008 ◽  
Vol 16 (4) ◽  
pp. 62-63
Author(s):  
V.M. Dusevich ◽  
J.H. Purk ◽  
J.D. Eick
Keyword(s):  
Electron Microscope ◽  
Scanning Electron Microscope ◽  
Digital Image ◽  
Secondary Electron ◽  
Image Manipulation ◽  
Sem Micrographs ◽  
Backscattered Electrons ◽  
Digital Picture ◽  
Scanning Electron

Coloring pictures is an educational exercise, which is fun, and helps develop important skills. Coloring SEM micrographs is especially suitable for electron microscopists. Color micrographs are not just great looking on a lab wall; they inspire both microscopists and students to exercise digital picture manipulation. Many microscopists enjoyed looking at the beautiful color micrographs by D. Scharf, but were frustrated to learn they needed a very particular scanning electron microscope equipped with multiple secondary electron detectors in order to color their own pictures. Fortunately, there are other ways to color SEM micrographs. Most SEMs are equipped with at least two detectors, for secondary and backscattered electrons.

scholarly journals Morphology and ecology of Thalassiosira Cleve (Bacillariophyta) species rarely recorded in Brazilian coastal waters

2009 ◽  
Vol 69 (4) ◽  
pp. 1059-1071 ◽  
Author(s):  
M. Garcia ◽  
C. Odebrecht
Keyword(s):  
Electron Microscope ◽  
Scanning Electron Microscope ◽  
Water Temperature ◽  
Wide Temperature Range ◽  
Coastal Waters ◽  
Light Microscope ◽  
Temperature Range ◽  
The World ◽  
First Time ◽  
Scanning Electron

The detailed description of rarely recorded Thalassiosira species in Brazil is presented with light microscope (LM) and scanning electron microscope (SEM) illustrations. A total of 78 phytoplankton net samples (20 µm) collected between the years 2000 and 2006 in coastal waters of southern Brazilian, Cassino Beach and the estuary of Lagoa dos Patos, were studied in cleaned material using the Axiovert Zeiss LM and Jeol 6060 SEM. Water temperature and salinity of samples and six species are presented: Thalassiosira endoseriata, T. hendeyi, T. lundiana, T. minuscula, T. oceanica and T. wongii. Two species, Thalassiosira hendeyi and T. endoseriata were the most common being observed in all seasons at Cassino Beach in a wide temperature range (10-26 ºC), while only sporadically in the estuary of Lagoa dos Patos. Thalassiosira endoseriata, T. lundiana, T. oceanica and T. wongii are for the first time reported in Brazilian coastal waters. The latter two species, rarely recorded in the world, are fully illustrated based on Brazilian material.

Novel and Advanced Applications of the Low Vacuum and Environmental Scanning Electron Microscope (SEM)

1997 ◽  
Vol 3 (S2) ◽  
pp. 385-386 ◽  
Author(s):  
Brendan J. Griffin
Keyword(s):  
Electron Microscope ◽  
Scanning Electron Microscope ◽  
Secondary Electron ◽  
Electron Gun ◽  
Environmental Scanning ◽  
Electron Detector ◽  
Environmental Sem ◽  
Practical Sense ◽  
Advanced Applications ◽  
Scanning Electron

The environmental SEM is an extremely adaptive instrument, allowing a range of materials to be examined under a wide variety of conditions. The limitations of the instrument lie mainly with the restrictions imposed by the need to maintain a moderate vacuum around the electron gun. The primary effect of this has been, in a practical sense, the limited low magnification available. Recently this has been overcome by modifications to the final pressure limiting aperture and secondary electron detector (Fig.l). The modifications are simple and users should be brave in this regard.A variety of electron detectors now exist including various secondary, backscattered and cathodoluminescence systems (Figs 2-5). These provide an excellent range of options; the ESEM must be regarded as a conventional SEM in that a range of imaging options should be installed. In some cases, e.g. cathodoluminescence, the lack of coating provides an advantage unique to the low vacuum SEMs.

Characteristics of Hot Ductility and Fracture in Micro-Alloyed Q345B Structural Steel

2011 ◽  
Vol 194-196 ◽  
pp. 150-156 ◽  
Author(s):  
Fang Dong ◽  
Cheng Su ◽  
Yuan Yuan Bai
Keyword(s):  
Electron Microscope ◽  
Scanning Electron Microscope ◽  
Continuous Casting ◽  
Structural Steel ◽  
Void Nucleation ◽  
Hot Ductility ◽  
Strain Rates ◽  
Casting Condition ◽  
Temperature Range ◽  
Scanning Electron

Hot-ductility tests of the microalloyed Q345B structural steel were performed in a tensile machine of Gleeble-1500D at different strain rates of 1.5•10-3/s 、2.5•10-3/s and 2•10-2/s and at temperature range from 1300°C to 700°C(Δ T=100°C ), which are close to the continuous casting condition of steel. Fracture surfaces were examined using a scanning electron microscope; it was found that the hot decrease as strain rate decrease, because the void growth mechanism predominates over void nucleation, giving time for nucleation cracks to grow. The minimum ductility was found at about 800°C for the strain rates of 1.5•10-3/s and 2.5•10-3/s, and the fracture was intergranular. The steel has good plasticity in temperature range from 1200°C to 900°C which is suitable for straighten operation.

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