scholarly journals Bulk phase shift, CFT Regge limit and Einstein gravity

2018 ◽  
Vol 2018 (6) ◽  
Author(s):  
Manuela Kulaxizi ◽  
Andrei Parnachev ◽  
Alexander Zhiboedov
Keyword(s):  
Phase Shift ◽  
Einstein Gravity ◽  
Bulk Phase ◽  
Regge Limit

scholarly journals The Regge limit of AdS3 holographic correlators with heavy states: towards the black hole regime

2021 ◽  
Vol 2021 (7) ◽  
Author(s):  
Nejc Čeplak ◽  
Marcel R. R. Hughes
Keyword(s):  
Black Hole ◽  
Phase Shift ◽  
Central Charge ◽  
Bulk Phase ◽  
Conformal Dimension ◽  
Order Relations ◽  
Conical Defect ◽  
Point Correlation ◽  
Light Probe ◽  
Regge Limit

Abstract We examine the Regge limit of holographic 4-point correlation functions in AdS3× S3 involving two heavy and two light operators. In this kinematic regime such correlators can be reconstructed from the bulk phase shift accumulated by the light probe as it traverses the geometry dual to the heavy operator. We work perturbatively — but to arbitrary orders — in the ratio of the heavy operator’s conformal dimension to the dual CFT2’s central charge, thus going beyond the low order results of [1] and [2]. In doing so, we derive all-order relations between the bulk phase shift and the Regge limit OPE data of a class of heavy-light multi-trace operators exchanged in the cross-channel. Furthermore, we analyse two examples for which the relevant 4-point correlators are known explicitly to all orders: firstly the case of heavy operators dual to AdS3 conical defect geometries and secondly the case of non-trivial smooth geometries representing microstates of the two-charge D1-D5 black hole.

scholarly journals Black holes, heavy states, phase shift and anomalous dimensions

2019 ◽  
Vol 6 (6) ◽  
Author(s):  
Manuela Kulaxizi ◽  
Gim Seng Ng ◽  
Andrei Parnachev
Keyword(s):  
Black Hole ◽  
Phase Shift ◽  
Central Charge ◽  
Complete Agreement ◽  
Black Hole Mass ◽  
Point Function ◽  
Expansion Parameter ◽  
Anomalous Dimensions ◽  
Leading Term ◽  
Regge Limit

We compute the phase shift of a highly energetic particle traveling in the background of an asymptotically AdS black hole. In the dual CFT, the phase shift is related to a four point function in the Regge limit. The black hole mass is translated to the ratio between the conformal dimension of a heavy operator and the central charge. This ratio serves as a useful expansion parameter; its power measures the number of stress tensors appearing in the intermediate channel. We compute the leading term in the phase shift in a holographic CFT of arbitrary dimensionality using Conformal Regge Theory and observe complete agreement with the gravity result. In a two-dimensional CFT with a large central charge the heavy-heavy-light-light Virasoro vacuum block reproduces the gravity phase shift to all orders in the expansion parameter. We show that the leading order phase shift is related to the anomalous dimensions of certain double trace operators and verify this agreement using known results for the latter. We also perform a separate gravity calculation of these anomalous dimensions to second order in the expansion parameter and compare with the phase shift expansion.

Object Wave Determination by Single-Sideband Methods

1973 ◽  
Vol 31 ◽  
pp. 266-267
Author(s):  
Kenneth H. Downing ◽  
Benjamin M. Siegel
Keyword(s):  
Phase Shift ◽  
Carbon Films ◽  
Object Wave ◽  
Electron Wave ◽  
Phase Object ◽  
Heavy Atoms ◽  
Single Sideband ◽  
Thin Carbon ◽  
Additional Phase Shift ◽  
Additional Phase

Under the “weak phase object” approximation, the component of the electron wave scattered by an object is phase shifted by π/2 with respect to the unscattered component. This phase shift has been confirmed for thin carbon films by many experiments dealing with image contrast and the contrast transfer theory. There is also an additional phase shift which is a function of the atomic number of the scattering atom. This shift is negligible for light atoms such as carbon, but becomes significant for heavy atoms as used for stains for biological specimens. The light elements are imaged as phase objects, while those atoms scattering with a larger phase shift may be imaged as amplitude objects. There is a great deal of interest in determining the complete object wave, i.e., both the phase and amplitude components of the electron wave leaving the object.

A Many-Beam Technique for Enhanced Resolution of Partial Dislocations

1972 ◽  
Vol 30 ◽  
pp. 646-647
Author(s):  
J. M. Oblak ◽  
B. H. Kear
Keyword(s):  
Phase Shift ◽  
Field Method ◽  
Dark Field ◽  
Bright Field ◽  
Field Technique ◽  
Weak Beam ◽  
Partial Dislocations ◽  
Enhanced Resolution ◽  
Nickel Base ◽  
Beam Technique

The “weak-beam” and systematic many-beam techniques are the currently available methods for resolution of closely spaced dislocations or other inhomogeneities imaged through strain contrast. The former is a dark field technique and image intensities are usually very weak. The latter is a bright field technique, but generally use of a high voltage instrument is required. In what follows a bright field method for obtaining enhanced resolution of partial dislocations at 100 KV accelerating potential will be described.A brief discussion of an application will first be given. A study of intermediate temperature creep processes in commercial nickel-base alloys strengthened by the Ll2 Ni3 Al γ precipitate has suggested that partial dislocations such as those labelled 1 and 2 in Fig. 1(a) are in reality composed of two closely spaced a/6 <112> Shockley partials. Stacking fault contrast, when present, tends to obscure resolution of the partials; thus, conditions for resolution must be chosen such that the phase shift at the fault is 0 or a multiple of 2π.

Observation of surface morphology by reflection electron holography

1989 ◽  
Vol 47 ◽  
pp. 536-537
Author(s):  
N. Osakabe ◽  
J. Endo ◽  
T. Matsuda ◽  
A. Tonomura
Keyword(s):  
Phase Shift ◽  
Surface Morphology ◽  
High Sensitivity ◽  
High Energy ◽  
Path Difference ◽  
Transmission Mode ◽  
Electron Holography ◽  
Dynamical Process ◽  
High Vertical Resolution ◽  
Amplification Technique

Progress in microscopy such as STM and TEM-TED has revealed surface structures in atomic dimension. REM has been used for the observation of surface dynamical process and surface morphology. Recently developed reflection electron holography, which employes REM optics to measure the phase shift of reflected electron, has been proved to be effective for the observation of surface morphology in high vertical resolution ≃ 0.01 Å.The key to the high sensitivity of the method is best shown by comparing the phase shift generation by surface topography with that in transmission mode. Difference in refractive index between vacuum and material Vo/2E≃10-4 owes the phase shift in transmission mode as shownn Fig. 1( a). While geometrical path difference is created in reflection mode( Fig. 1(b) ), which is measured interferometrically using high energy electron beam of wavelength ≃0.01 Å. Together with the phase amplification technique , the vertivcal resolution is expected to be ≤0.01 Å in an ideal case.

Inelastic mean free path and phase-shift determinations in NiO, using EXELFS

1993 ◽  
Vol 3 (7) ◽  
pp. 1649-1659
Author(s):  
Mohammad A. Tafreshi ◽  
Stefan Csillag ◽  
Zou Wei Yuan ◽  
Christian Bohm ◽  
Elisabeth Lefèvre ◽  
...  
Keyword(s):  
Phase Shift ◽  
Free Path ◽  
Mean Free Path ◽  
Inelastic Mean Free Path

Pb Electrodeposition in the Presence of Chlorine Ions on Cu(100): An in Situ Optical Reflectivity Difference Study

2003 ◽  
Vol 781 ◽  
Author(s):  
J. Gray ◽  
W. Schwarzacher ◽  
X.D. Zhu
Keyword(s):  
Oblique Incidence ◽  
Opposite Sign ◽  
Bulk Phase ◽  
Phase Layer ◽  
Optical Reflectivity ◽  
Scan Rate ◽  
Different Types ◽  
Chlorine Ions ◽  
High Overpotentials

AbstractWe studied the initial stages of the electrodeposition of Pb in the presence of chlorine ions on Cu(100), using an oblique-incidence optical reflectivity difference (OIRD) technique. The OI-RD results reveal that immediately following the underpotential deposition (UPD) of the first Pb monolayer, two different types of bulk-phase films grow depending upon the magnitude of overpotential and cyclic voltammetry (CV) scan rate. At low overpotentials and/or slow scan rates, we propose that a bulk-phase Pb film grows on top of the UPD monolayer. At high overpotentials and/or fast scan rates, either a PbO, PbCl2, or a rough Pb bulk-phase layer grows on top of the UPD layer such that the reflectivity difference signal from such a film has an opposite sign.

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