In-situ electrical characterisation of a photodiode during nano-structuring with a focussed ion beam

2012 ◽  
Vol 110 (4) ◽  
pp. 935-941
Author(s):  
Jan Junis Rindermann ◽  
Mohammed Henini ◽  
Pavlos G. Lagoudakis
Keyword(s):  
Ion Beam ◽  
Focussed Ion Beam

scholarly journals An in-situ approach for preparing atom probe tomography specimens by xenon plasma-focussed ion beam

2019 ◽  
Vol 202 ◽  
pp. 121-127 ◽  
Author(s):  
J.E. Halpin ◽  
R.W.H. Webster ◽  
H. Gardner ◽  
M.P. Moody ◽  
P.A.J. Bagot ◽  
...  
Keyword(s):  
Atom Probe Tomography ◽  
Ion Beam ◽  
Atom Probe ◽  
Focussed Ion Beam

Ion microprobe analysis—a review of geological applications

1989 ◽  
Vol 53 (369) ◽  
pp. 3-24 ◽  
Author(s):  
S. J. B. Reed
Keyword(s):  
Microprobe Analysis ◽  
Ion Beam ◽  
Isotopic Analysis ◽  
Specimen Preparation ◽  
Ion Microprobe ◽  
Spatially Resolved ◽  
Secondary Ions ◽  
Focussed Ion Beam ◽  
Isotope Studies

AbstractIn ion microprobe analysis the specimen is bombarded with a focussed ion beam a few µm in diameter and the secondary ions produced are accelerated into the entrance slit of a mass spectrometer. An outline of the salient features of the instrument is given here, together with an account of the methods used for quantitative elemental and isotopic analysis.The major part of this paper consists of a comprehensive account of the geological applications of ion microprobe analysis. These include elemental analysis, especially for trace elements (down to sub-ppm levels in many cases) and light elements (H-F) which are beyond the scope of the electron microprobe. The other main area of geological interest is isotopic analysis, where the ion microprobe has the advantage over conventional mass spectrometry of being capable of in situ analysis of selected points on polished sections, obviating the need for laborious specimen preparation, and enabling spatially-resolved data to be obtained, with a resolution of a few µm. The ion microprobe has been especially successful in U-Pb zircon dating and the study of isotope anomalies in meteorites. Other significant applications include diffusion and stable isotope studies.

Failure of bone at the sub-lamellar level using in situ AFM-SEM investigations

2012 ◽  
Vol 1424 ◽  
Author(s):  
Ines Jimenez-Palomar ◽  
Asa H. Barber
Keyword(s):  
Electron Microscopy ◽  
Fracture Behavior ◽  
Failure Modes ◽  
Ion Beam ◽  
Bone Material ◽  
Force Microscopy ◽  
Atomic Force ◽  
Focussed Ion Beam ◽  
Scanning Electron

ABSTRACTIn this paper we examine the mechanical properties of individual lamellae from bone material using novel atomic force microscopy (AFM)-scanning electron microscopy (SEM) techniques. Individual lamellar beams were selected from bone using focussed ion beam (FIB) microscopy and mechanically deformed with the AFM while observing failure modes using SEM. Both the elastic and fracture behavior of the bone lamellae were determined using these techniques.

Focussed ion beam preparation and in situ nanoscopic study of Precambrian acritarchs

2005 ◽  
Vol 140 (1-2) ◽  
pp. 36-54 ◽  
Author(s):  
A KEMPE ◽  
R WIRTH ◽  
W ALTERMANN ◽  
R STARK ◽  
J SCHOPF ◽  
...  
Keyword(s):  
Ion Beam ◽  
Focussed Ion Beam

scholarly journals Mind the gap: micro-expansion joints drastically decrease the bending of FIB-milled cryo-lamellae

2019 ◽  
Author(s):  
Georg Wolff ◽  
Ronald W. A. L. Limpens ◽  
Shawn Zheng ◽  
Eric J. Snijder ◽  
David A. Agard ◽  
...  
Keyword(s):  
Electron Tomography ◽  
Ion Beam ◽  
Phase Plate ◽  
Expansion Joints ◽  
Cellular Environment ◽  
Focussed Ion Beam ◽  
Technical Issues ◽  
Thin Electron ◽  
Thin Lamella

AbstractCryo-focussed ion beam (FIB)-milling of biological samples can be used to generate thin electron-transparent slices from cells grown or deposited on EM grids. These so called cryo-lamellae allow high-resolution structural studies of the natural cellular environment by in situ cryo-electron tomography. However, the cryo-lamella workflow is a low-throughput technique and can easily be obstructed by technical issues like the bending of the lamellae during the final cryo-FIB-milling steps. The severity of lamella bending seems to correlate with shrinkage of the EM grid support film at cryogenic temperatures, which could generate tensions that may be transferred onto the thin lamella, leading to its bending and breakage. To protect the lamellae from these forces, we milled “micro-expansion joints” alongside the lamellae, creating gaps in the support that can act as physical buffers to safely absorb material motion. We demonstrate that the presence of such micro-expansion joints drastically decreases lamella bending. Furthermore, we show that this adaptation does not create instabilities that could constrain subsequent parts of the cryo-lamella workflow, as we obtained high-quality Volta phase plate tomograms revealing macromolecules in their natural structural context. The minimal additional effort required to implement micro-expansion joints in the cryo-FIB-milling workflow makes them an easy solution against cryo-lamella bending in any biological sample milled on EM grids.

Direct Observations of the Epitaxial Growth of Sputtered Ag on Si

1973 ◽  
Vol 31 ◽  
pp. 122-123
Author(s):  
J. S. Maa ◽  
Thos. E. Hutchinson
Keyword(s):  
Epitaxial Growth ◽  
Film Growth ◽  
Ion Beam ◽  
Ion Beam Sputtering ◽  
Microscopy Technique ◽  
Direct Observations ◽  
In Situ Electron Microscopy ◽  
Beam Sputtering ◽  
The Subject

The growth of Ag films deposited on various substrate materials such as MoS2, mica, graphite, and MgO has been investigated extensively using the in situ electron microscopy technique. The three stages of film growth, namely, the nucleation, growth of islands followed by liquid-like coalescence have been observed in both the vacuum vapor deposited and ion beam sputtered thin films. The mechanisms of nucleation and growth of silver films formed by ion beam sputtering on the (111) plane of silicon comprise the subject of this paper. A novel mode of epitaxial growth is observed to that seen previously.The experimental arrangement for the present study is the same as previous experiments, and the preparation procedure for obtaining thin silicon substrate is presented in a separate paper.

Nucleation and Early Growth of Sputtered thin Films

1970 ◽  
Vol 28 ◽  
pp. 516-517
Author(s):  
Dudley M. Sherman ◽  
Thos. E. Hutchinson
Keyword(s):  
Thin Films ◽  
Electron Beam ◽  
Ion Beam ◽  
Ion Source ◽  
Water Cooling ◽  
Stages Of Growth ◽  
Lens Assembly ◽  
Microscope Technique ◽  
Ion Beam Sputter Deposition

The in situ electron microscope technique has been shown to be a powerful method for investigating the nucleation and growth of thin films formed by vacuum vapor deposition. The nucleation and early stages of growth of metal deposits formed by ion beam sputter-deposition are now being studied by the in situ technique.A duoplasmatron ion source and lens assembly has been attached to one side of the universal chamber of an RCA EMU-4 microscope and a sputtering target inserted into the chamber from the opposite side. The material to be deposited, in disc form, is bonded to the end of an electrically isolated copper rod that has provisions for target water cooling. The ion beam is normal to the microscope electron beam and the target is placed adjacent to the electron beam above the specimen hot stage, as shown in Figure 1.

Electron and ion irradiation-induced dissolution of mechanical twins in the intermetalic U3Si: An in situ HVEM study

1989 ◽  
Vol 47 ◽  
pp. 652-653
Author(s):  
Charles W. Allen ◽  
Robert C. Birtcher
Keyword(s):  
Elevated Temperatures ◽  
Ion Irradiation ◽  
Ion Beam ◽  
National Laboratory ◽  
Argonne National Laboratory ◽  
Heavy Ion ◽  
High Energy ◽  
Mechanical Twinning ◽  
In Situ Experiments

The uranium silicides, including U3Si, are under study as candidate low enrichment nuclear fuels. Ion beam simulations of the in-reactor behavior of such materials are performed because a similar damage structure can be produced in hours by energetic heavy ions which requires years in actual reactor tests. This contribution treats one aspect of the microstructural behavior of U3Si under high energy electron irradiation and low dose energetic heavy ion irradiation and is based on in situ experiments, performed at the HVEM-Tandem User Facility at Argonne National Laboratory. This Facility interfaces a 2 MV Tandem ion accelerator and a 0.6 MV ion implanter to a 1.2 MeV AEI high voltage electron microscope, which allows a wide variety of in situ ion beam experiments to be performed with simultaneous irradiation and electron microscopy or diffraction.At elevated temperatures, U3Si exhibits the ordered AuCu3 structure. On cooling below 1058 K, the intermetallic transforms, evidently martensitically, to a body-centered tetragonal structure (alternatively, the structure may be described as face-centered tetragonal, which would be fcc except for a 1 pet tetragonal distortion). Mechanical twinning accompanies the transformation; however, diferences between electron diffraction patterns from twinned and non-twinned martensite plates could not be distinguished.

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