Nanostructural and barrier property characterization of ZnO/PEDOT:PSS heterojunction by adjusting RF power in the magnetron sputtering deposition technique

2019 ◽  
Vol 10 (3) ◽  
pp. 787-793 ◽  
Author(s):  
B. Boroomand Nasab ◽  
A. Kosarian ◽  
N. Alaei Sheini
Keyword(s):  
Magnetron Sputtering ◽  
Barrier Property ◽  
Rf Power ◽  
Deposition Technique ◽  
Sputtering Deposition ◽  
Property Characterization

Characterization of silicon oxynitride films deposited by a high-power impulse magnetron sputtering deposition technique

2020 ◽  
Vol 59 (5) ◽  
pp. A176
Author(s):  
Bo-Huei Liao ◽  
Chien-Nan Hsiao ◽  
Ming-Hua Shiao ◽  
Sheng-Hui Chen
Keyword(s):  
Magnetron Sputtering ◽  
High Power ◽  
Silicon Oxynitride ◽  
Deposition Technique ◽  
Sputtering Deposition

Reactive magnetron sputtering deposition and characterization of niobium carbide films

Vacuum ◽  
2014 ◽  
Vol 99 ◽  
pp. 233-241 ◽  
Author(s):  
Kan Zhang ◽  
M. Wen ◽  
G. Cheng ◽  
X. Li ◽  
Q.N. Meng ◽  
...  
Keyword(s):  
Magnetron Sputtering ◽  
Niobium Carbide ◽  
Reactive Magnetron Sputtering ◽  
Reactive Magnetron ◽  
Sputtering Deposition

Radio frequency dual magnetron sputtering deposition and characterization of nanocomposite Al2O3–ZrO2 thin films

2006 ◽  
Vol 24 (2) ◽  
pp. 309-316 ◽  
Author(s):  
D. H. Trinh ◽  
H. Högberg ◽  
J. M. Andersson ◽  
M. Collin ◽  
I. Reineck ◽  
...  
Keyword(s):  
Thin Films ◽  
Magnetron Sputtering ◽  
Radio Frequency ◽  
Sputtering Deposition

Characterization of Ion Irradiated Zirconia-Yttria Films

1991 ◽  
Vol 235 ◽  
Author(s):  
N. K. Huang ◽  
Z. R. Feng ◽  
Z. K. Xiong ◽  
D. Z. Wang ◽  
P. L. Wang
Keyword(s):  
Magnetron Sputtering ◽  
Ion Irradiation ◽  
Ion Bombardment ◽  
Amorphous Films ◽  
Sputtering Deposition ◽  
Argon Ion Bombardment ◽  
T Phase ◽  
Argon Ion ◽  
Different Doses

ABSTRACTZirconia-yttria films containing 8.0wt% Y2O3 were prepared on a Si substrate with r.f. magnetron sputtering deposition followed by 170 KeV Ar+ ion irradiation at room temperature. The characterization of these zirconia-yttria films with different ion bombarding doses has been studied by XRD, XPS and AES. It was found that all the films consisted of three portions, the amorphous films deposited with r.f. magnetron-sputtering were partially crystallized and nontransformable tetragonal (T') phase was detected after Ar+ ion bombardment of a dose of 1×1016 ion/cm2, and the oxidized states of Zr3d, Y3d and Ols peaks of XPS were observed under the conditions of argon ion bombardment of different doses.

Microstructure and Properties of AlSn20 Coating Deposited via Magnetron Sputtering

2015 ◽  
Vol 816 ◽  
pp. 277-282
Author(s):  
Qiao Qin Guo ◽  
Jian Ping Li
Keyword(s):  
Magnetron Sputtering ◽  
Sputtering Deposition ◽  
Unbalanced Magnetron Sputtering ◽  
Unbalanced Magnetron ◽  
Wear And Friction ◽  
Pin On Disc ◽  
Alloy Microstructure ◽  
Bearing Alloy ◽  
Deposition Techniques

In view of the present reality of sputtered plating bearings imported in our country, unbalanced magnetron sputtering deposition techniques was used to fabricate AlSn20 anti-friction coating on aluminum bearing alloy. Microstructure characterization of the coating was performed by SEM. Micro-hardness testing of Coating were measured with a Vickers indenter. Adhesion testing was carried out with a scratch tester. Wear and friction tests were performed with a pin-on-disc tribometer. The results revealed that the AlSn20 anti-friction coating (bias voltage in the range of-60V~-100V) showed finer crystal, better corrosion resistance (Ecorr=-1.25V), higher hardness (up to 80HV0.025), better adhesion with substrate (up to 35N), and lower friction coefficients down to 0.15.

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