Heavy-ion and pulsed-laser single event effects in 130-nm CMOS-based thin/thick gate oxide anti-fuse PROMs

2019 ◽  
Vol 30 (5) ◽  
Author(s):  
Chang Cai ◽  
Tian-Qi Liu ◽  
Xiao-Yuan Li ◽  
Jie Liu ◽  
Zhan-Gang Zhang ◽  
...  
Electronics ◽  
2021 ◽  
Vol 10 (4) ◽  
pp. 440
Author(s):  
Yanan Liang ◽  
Rui Chen ◽  
Jianwei Han ◽  
Xuan Wang ◽  
Qian Chen ◽  
...  

An attractive candidate for space and aeronautic applications is the high-power and miniaturizing electric propulsion technology device, the gallium nitride high electron mobility transistor (GaN HEMT), which is representative of wide bandgap power electronic devices. The cascode AlGaN/GaN HEMT is a common structure typically composed of a high-voltage depletion-mode AlGaN/GaN HEMT and low-voltage enhancement-mode silicon (Si) MOSFET connected by a cascode structure to realize its enhancement mode. It is well known that low-voltage Si MOSFET is insensitive to single event burnout (SEB). Therefore, this paper mainly focuses on the single event effects of the cascode AlGaN/GaN HEMT using technical computer-aided design (TCAD) simulation and heavy-ion experiments. The influences of heavy-ion energy, track length, and track position on the single event effects for the depletion-mode AlGaN/GaN HEMT were studied using TCAD simulation. The results showed that a leakage channel between the gate electrode and drain electrode in depletion-mode AlGaN/GaN HEMT was formed after heavy-ion striking. The enhancement of the ionization mechanism at the edge of the gate might be an important factor for the leakage channel. To further study the SEB effect in AlGaN/GaN HEMT, the heavy-ion test of a cascode AlGaN/GaN HEMT was carried out. SEB was observed in the heavy-ion irradiation experiment and the leakage channel was found between the gate and drain region in the depletion-mode AlGaN/GaN HEMT. The heavy-ion irradiation experimental results proved reasonable for the SEB simulation for AlGaN/GaN HEMT with a cascode structure.


2014 ◽  
Vol 61 (4) ◽  
pp. 1909-1917 ◽  
Author(s):  
Matthieu Beaumel ◽  
Dominique Herve ◽  
Dirk Van Aken ◽  
Pierre Pourrouquet ◽  
Marc Poizat

Materials ◽  
2019 ◽  
Vol 12 (20) ◽  
pp. 3411 ◽  
Author(s):  
Cheng Gu ◽  
Rui Chen ◽  
George Belev ◽  
Shuting Shi ◽  
Haonan Tian ◽  
...  

Single-event effects (SEEs) in integrated circuits and devices can be studied by utilizing ultra-fast pulsed laser system through Two Photon Absorption process. This paper presents technical ways to characterize key factors for laser based SEEs mapping testing system: output power from laser source, spot size focused by objective lens, opening window of Pockels cell, and calibration of injected laser energy. The laser based SEEs mapping testing system can work in a stable and controllable status by applying these methods. Furthermore, a sensitivity map of a Static Random Access Memory (SRAM) cell with a 65 nm technique node was created through the established laser system. The sensitivity map of the SRAM cell was compared to a map generated by a commercial simulation tool (TFIT), and the two matched well. In addition, experiments in this paper also provided energy distribution profile along Z axis that is the direction of the pulsed laser injection and threshold energy for different SRAM structures.


Author(s):  
Santiago Sondon ◽  
Alfredo Falcon ◽  
Pablo Mandolesi ◽  
Pedro Julian ◽  
Nahuel Vega ◽  
...  

2014 ◽  
Vol 778-780 ◽  
pp. 440-443 ◽  
Author(s):  
Manato Deki ◽  
Takahiro Makino ◽  
Kazutoshi Kojima ◽  
Takuro Tomita ◽  
Takeshi Ohshima

The leakage currents through the gate oxide of MOS capacitors fabricated on n-type 4H-Silicon Carbide (SiC) was measured under accumulation bias conditions with heavy-ion irradiation. The Linear Energy Transfer (LET) dependence of the critical electric field (Ecr) at which dielectric breakdown occurred in these capacitors with two different oxide thicknesses was evaluated. The MOS capacitors with thin gate oxide showed higherEcrvalues than those with thick gate oxide. The linear relationship between the reciprocalEcrandLETwas observed for both MOS capacitors. The slope ofLETdependence of 1/Ecrfor SiC MOS capacitors was smaller than that for Si, suggesting that SiC MOS devices are less susceptible to single-event gate rupture (SEGR) than Si MOS devices.


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