Low energy argon ion irradiation surface effects on triglycine sulfate

2013 ◽  
Vol 280 ◽  
pp. 858-861
Author(s):  
Carmen Aragó ◽  
José L. Plaza ◽  
Manuel I. Marqués ◽  
Julio A. Gonzalo
2018 ◽  
Vol 112 (24) ◽  
pp. 241601
Author(s):  
Xi Yan ◽  
Hongrui Zhang ◽  
Hui Zhang ◽  
Tahira Khan ◽  
Jine Zhang ◽  
...  

Langmuir ◽  
1993 ◽  
Vol 9 (3) ◽  
pp. 740-748 ◽  
Author(s):  
Beng Jit Tan ◽  
Mebrahtu Fessehaie ◽  
Steven L. Suib

2000 ◽  
Vol 76 (14) ◽  
pp. 1887-1889 ◽  
Author(s):  
P. C. Zalm ◽  
J. A. van den Berg ◽  
J. G. M. van Berkum ◽  
P. Bailey ◽  
T. C. Q. Noakes

Author(s):  
Shreenu Pattanaik ◽  
Jyoshnarani Mohapatra ◽  
Dilip Kumar Mishra ◽  
Pravin Kumar ◽  
D. Kanjilal

Author(s):  
Tomonori Sasaki ◽  
Ming Yang ◽  
Kinuko Fujimoto

A new methodology using very low energy Ar ion irradiation is proposed to improve the mechanical properties of thin metal films deposited by sputtering. In this study, accelerating voltage of Ar ion plasma was set to lower than 100V, and several conditions were applied to irradiations. Consequently, it is found that Young’s modulus and hardness of Aluminum and Nickel thin film increases about 10% by the irradiation compared with a non-irradiated thin film. (111)–oriented integrated intensity of diffraction of Al and Ni thin film was increased by the irradiation. It is considered that crystalline orientation was changed and column spacing of the film be filled by the irradiation. It is shown that the proposed technique is effective to improve the mechanical properties of metal thin films with proper irradiation conditions.


2020 ◽  
Author(s):  
Ashish B. Thorat ◽  
M. S. Taware ◽  
V. D. Bharud ◽  
S. D. Dhole ◽  
S. S. Dahiwale

1994 ◽  
Vol 33 (Part 1, No. 7A) ◽  
pp. 3837-3843 ◽  
Author(s):  
Junichi Takahara ◽  
Seiji Yoshimatsu ◽  
Kenji Gamo ◽  
Susumu Namba ◽  
Sadao Takaoka ◽  
...  

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