Surface engineering of electrodeposited cuprous oxide (Cu2O) thin films: effect on hydrophobicity and LP gas sensing

2021 ◽  
pp. 150020
Author(s):  
K.N.D. Bandara ◽  
K.M.D.C. Jayathilaka ◽  
D.P. Dissanayake ◽  
J.K.D.S. Jayanetti
2012 ◽  
Vol 112 (8) ◽  
pp. 084508 ◽  
Author(s):  
Sin Cheng Siah ◽  
Yun Seog Lee ◽  
Yaron Segal ◽  
Tonio Buonassisi

Nanomaterials ◽  
2019 ◽  
Vol 9 (7) ◽  
pp. 1011 ◽  
Author(s):  
Negar Dasineh Khiavi ◽  
Reza Katal ◽  
Saeideh Kholghi Eshkalak ◽  
Saeid Masudy-Panah ◽  
Seeram Ramakrishna ◽  
...  

A high recombination rate and low charge collection are the main limiting factors of copper oxides (cupric and cuprous oxide) for the photocatalytic degradation of organic pollutants. In this paper, a high performance copper oxide photocatalyst was developed by integrating cupric oxide (CuO) and cuprous oxide (Cu2O) thin films, which showed superior performance for the photocatalytic degradation of methylene blue (MB) compared to the control CuO and Cu2O photocatalyst. Our results show that a heterojunction photocatalyst of CuO–Cu2O thin films could significantly increase the charge collection, reduce the recombination rate, and improve the photocatalytic activity.


2016 ◽  
Vol 183 (11) ◽  
pp. 2983-2989 ◽  
Author(s):  
Pavan K. Pagare ◽  
A. P. Torane

2015 ◽  
Vol 40 (1) ◽  
pp. 112-123 ◽  
Author(s):  
Ying Yang ◽  
Juan Han ◽  
Xiaohui Ning ◽  
Jinzhan Su ◽  
Jinwen Shi ◽  
...  

2010 ◽  
Vol 34-35 ◽  
pp. 1421-1424
Author(s):  
Fei Hu ◽  
Zhi Yu He ◽  
Xiao Hong Li ◽  
Yue Hui Hu

Cuprous oxide films are successfully electrodeposited through the reduction of cupric ions in alkaline and acid electrolytes. The effect of electrodeposition parameters on the optical band gaps of Cu2O films is investigated using UV-vis spectroscopy. It is found that the optical transmittances and the band gaps of the Cu2O thin films are strongly influenced by the electrodeposition bath, the temperature, the current density, and the pH value. The band gaps are varied from 1.80 eV to 2.43 eV with different electrodeposition parameters.


Vacuum ◽  
2017 ◽  
Vol 141 ◽  
pp. 296-306 ◽  
Author(s):  
S. Dolai ◽  
S. Das ◽  
S. Hussain ◽  
R. Bhar ◽  
A.K. Pal

2017 ◽  
Vol 50 (48) ◽  
pp. 485304 ◽  
Author(s):  
K N D Bandara ◽  
K M D C Jayathilaka ◽  
M S Gunewardene ◽  
D P Dissanayake ◽  
J K D S Jayanetti

2014 ◽  
Vol 04 (03) ◽  
pp. 119-126 ◽  
Author(s):  
Nayana Bandara ◽  
Charith Jayathilaka ◽  
Dhammika Dissanayaka ◽  
Sumedha Jayanetti

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