Sol–gel derived amorphous/nanocrystalline MgZnO thin films annealed by atmospheric pressure plasma jets

2014 ◽  
Vol 40 (2) ◽  
pp. 2707-2715 ◽  
Author(s):  
Shao-Tzu Lien ◽  
Jian-Zhang Chen ◽  
Yao-Jhen Yang ◽  
Cheng-Che Hsu ◽  
I-Chun Cheng
2014 ◽  
Vol 292 ◽  
pp. 213-218 ◽  
Author(s):  
Wei-Yang Liao ◽  
Haoming Chang ◽  
Yao-Jhen Yang ◽  
Cheng-Che Hsu ◽  
I-Chun Cheng ◽  
...  

Materials ◽  
2020 ◽  
Vol 13 (6) ◽  
pp. 1296
Author(s):  
Iryna Kuchakova ◽  
Maria Daniela Ionita ◽  
Eusebiu-Rosini Ionita ◽  
Andrada Lazea-Stoyanova ◽  
Simona Brajnicov ◽  
...  

Thin film deposition with atmospheric pressure plasmas is highly interesting for industrial demands and scientific interests in the field of biomaterials. However, the engineering of high-quality films by high-pressure plasmas with precise control over morphology and surface chemistry still poses a challenge. The two types of atmospheric-pressure plasma depositions of organosilicon films by the direct and indirect injection of hexamethyldisiloxane (HMDSO) precursor into a plasma region were chosen and compared in terms of the films chemical composition and morphology to address this. Although different methods of plasma excitation were used, the deposition of inorganic films with above 98% of SiO2 content was achieved for both cases. The chemical structure of the films was insignificantly dependent on the substrate type. The deposition in the afterglow of the DC discharge resulted in a soft film with high roughness, whereas RF plasma deposition led to a smoother film. In the case of the RF plasma deposition on polymeric materials resulted in films with delamination and cracks formation. Lastly, despite some material limitations, both deposition methods demonstrated significant potential for SiOx thin-films preparation for a variety of bio-related substrates, including glass, ceramics, metals, and polymers.


2011 ◽  
Vol 109 (12) ◽  
pp. 123302 ◽  
Author(s):  
J. S. Sousa ◽  
K. Niemi ◽  
L. J. Cox ◽  
Q. Th. Algwari ◽  
T. Gans ◽  
...  

2014 ◽  
Vol 11 (11) ◽  
pp. 1010-1017 ◽  
Author(s):  
Seoul Hee Nam ◽  
Hyun Wook Lee ◽  
Jin Woo Hong ◽  
Hae June Lee ◽  
Gyoo Cheon Kim

2014 ◽  
Vol 314 ◽  
pp. 1074-1081 ◽  
Author(s):  
Jia-Yang Juang ◽  
Tung-Sheng Chou ◽  
Hsin-Tien Lin ◽  
Yuan-Fang Chou ◽  
Chih-Chiang Weng

Author(s):  
Henryka Danuta Stryczewska ◽  
Tomasz Jakubowski ◽  
Stanisław Kalisiak ◽  
Tomasz Giżewski ◽  
Joanna Pawłat

AbstractRecently, many different plasma sources are being investigated for exhaust gases treatment, odor abatement, VOC removal, soil conditioning, surface decontamination or tissue disinfection and sterilization. Among many different plasma reactors investigated in laboratories, gliding arc discharges (GAD), dielectric barrier discharges (DBD), pulsed discharges (PD), atmospheric pressure glow discharges (APGD) and atmospheric pressure plasma jets (APPJ) seem to be the most promising for high pressure low temperature applications. They can be designed as multi-electrodes’ high power system that can be used in environment protection processes, like decontamination of large surfaces and treatment of large volume of polluted gases, as well as small size and low power devices for biomedical applications, like plasma healing, disinfection and sterilization. Paper presents review of power supply systems for cold plasma reactors. Dielectric Barrier Discharge (DBD), Gliding Arc Discharge (GAD) and atmospheric pressure plasma jet (APPJ) reactors with their supply systems have been discussed from the point view of their characteristics, possibility to control power to the discharge and efficiency. Taking into account the plasma reactor characteristics and nature (nonlinear resistive and/or capacitive) different solutions of power suppliers have been presented: transformer type, AC/DC/AC inverter, RF-frequency system and frequency resonant inverter.


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