Adsorption behavior of methyl palmitate onto silica particle surface

2021 ◽  
Vol 44 ◽  
pp. 100468
Author(s):  
Hideo Maruyama ◽  
Hideshi Seki ◽  
Akito Furukawa
2021 ◽  
Author(s):  
Nicolas Debons ◽  
Dounia Dems ◽  
Thibaud Coradin ◽  
Carole Aimé

The functionalization of nanomaterials surface is key to improve their stability, reactivity and confer specific properties. However, mapping functional groups at the nanoscale remains difficult, <i>i.e.</i> identifying chemical nature but also spatial distribution. It is particularly challenging for organic groups and non-planar objects such as nanoparticles. Here we report a strategy for mapping amine groups on the surface of silica particles using chemically-modified gold colloids, which are used as tags to specifically and spatially identify these organic groups under electron microscopy. A complete understanding of the correlation between spatial distribution of gold colloids and chemical state of the silica particle surface (by XPS) is presented. The range of reliability of this strategy for mapping organic groups at nanointerfaces is assessed and its implications for biofunctional nanoobjects where interdistance of biomolecules are of paramount importance are discussed.


Soft Matter ◽  
2015 ◽  
Vol 11 (8) ◽  
pp. 1634-1645 ◽  
Author(s):  
Moulik Ranka ◽  
Nihal Varkey ◽  
Subramanian Ramakrishnan ◽  
Charles F. Zukoski

We report microstructural and rheological consequences of altering silica particle surface chemistry when the particles are suspended in unentangled polyethylene glycol with a molecular weight of 400.


2021 ◽  
Author(s):  
Nicolas Debons ◽  
Dounia Dems ◽  
Thibaud Coradin ◽  
Carole Aimé

The functionalization of nanomaterials surface is key to improve their stability, reactivity and confer specific properties. However, mapping functional groups at the nanoscale remains difficult, <i>i.e.</i> identifying chemical nature but also spatial distribution. It is particularly challenging for organic groups and non-planar objects such as nanoparticles. Here we report a strategy for mapping amine groups on the surface of silica particles using chemically-modified gold colloids, which are used as tags to specifically and spatially identify these organic groups under electron microscopy. A complete understanding of the correlation between spatial distribution of gold colloids and chemical state of the silica particle surface (by XPS) is presented. The range of reliability of this strategy for mapping organic groups at nanointerfaces is assessed and its implications for biofunctional nanoobjects where interdistance of biomolecules are of paramount importance are discussed.


Polymers ◽  
2020 ◽  
Vol 12 (7) ◽  
pp. 1554
Author(s):  
Thi Huong Dao ◽  
Ngoc Trung Nguyen ◽  
Minh Ngoc Nguyen ◽  
Cao Long Ngo ◽  
Nhu Hai Luong ◽  
...  

This study aims to investigate the adsorption behavior of a strong polyelectrolyte poly(styrenesulfonate) (PSS) onto alumina particles. Adsorption of PSS onto positively charged alumina surface increased with increasing ionic strength, indicating that non-electrostatic and electrostatic interaction controlled the adsorption. The removal of an emerging antibiotic ciprofloxacin (CFX) from water environment using PSS-modified alumina (PMA) was also studied. The removal of CFX using PMA was much higher than that using alumina particles without PSS modification in all pH ranges of 2–11. The removal of CFX reached 98% under the optimum conditions of pH 6, contact time of 120 min, adsorbent dosage of five milligrams per milliliter and ionic strength 104-M NaCl. The adsorption isotherms of CFX at different salt concentrations fit well with a two-step adsorption model, while the adsorption kinetic fit well with a pseudo-second-order model with a good correlation coefficient (R2 > 0.9969). The CFX-removal from a hospital wastewater using PMA was more than 75%. Our study demonstrates that adsorption of PSS onto alumina to modify the particle surface is important to form a novel adsorbent PMA for CFX-removal from water environments.


2010 ◽  
Vol 1249 ◽  
Author(s):  
Michael L White ◽  
Richard Romine ◽  
Lamon Jones ◽  
William Ackerman

AbstractThe mechanism of haze reduction during silicon polishing using a new generation of additives has been explored. These additives are thought to decrease haze by adsorbing to the wafer surface and increasing the activation energy of the reaction between the silanolates on the silica particle surface with the surface silicon. This leads to greater selectivity between the peaks and valleys resulting in a net decrease in surface roughness.


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