In situ growth of single crystal Si3N4 nanowire foam with good wave-transparency and heat insulation performance

2021 ◽  
pp. 109129
Author(s):  
Chuchu Guo ◽  
Fang Ye ◽  
Laifei Cheng
Keyword(s):  
Single Crystal ◽  
Heat Insulation ◽  
In Situ Growth ◽  
Insulation Performance

In situ growth of single-crystal TiO2 nanorod arrays on Ti substrate: Controllable synthesis and photoelectro-chemical water splitting

Nano Research ◽  
2017 ◽  
Vol 10 (3) ◽  
pp. 1021-1032 ◽  
Author(s):  
Tingting Zhang ◽  
Zia Ur Rahman ◽  
Ning Wei ◽  
Yupeng Liu ◽  
Jun Liang ◽  
...  
Keyword(s):  
Single Crystal ◽  
Water Splitting ◽  
In Situ Growth ◽  
Nanorod Arrays ◽  
Controllable Synthesis ◽  
Tio2 Nanorod ◽  
Tio2 Nanorod Arrays ◽  
Chemical Water

scholarly journals In Situ Growth of All‐Inorganic Perovskite Single Crystal Arrays on Electron Transport Layer

2020 ◽  
Vol 7 (11) ◽  
pp. 1902767 ◽  
Author(s):  
Xiaobing Tang ◽  
Wei Chen ◽  
Dan Wu ◽  
Aijing Gao ◽  
Gaomin Li ◽  
...  
Keyword(s):  
Electron Transport ◽  
Single Crystal ◽  
Transport Layer ◽  
Electron Transport Layer ◽  
In Situ Growth ◽  
Inorganic Perovskite

Structure of Palladium Single-Crystal Films Prepared by Flash Evaporation onto (001) NaCl Substrates

1970 ◽  
Vol 28 ◽  
pp. 456-457
Author(s):  
L. E. Murr ◽  
G. Wong
Keyword(s):  
Single Crystal ◽  
High Vacuum ◽  
Ultra High Vacuum ◽  
High Rate ◽  
Flash Evaporation ◽  
Optimum Load ◽  
Single Crystal Films ◽  
Crystal Films ◽  
A Current

Palladium single-crystal films have been prepared by Matthews in ultra-high vacuum by evaporation onto (001) NaCl substrates cleaved in-situ, and maintained at ∼ 350° C. Murr has also produced large-grained and single-crystal Pd films by high-rate evaporation onto (001) NaCl air-cleaved substrates at 350°C. In the present work, very large (∼ 3cm2), continuous single-crystal films of Pd have been prepared by flash evaporation onto air-cleaved (001) NaCl substrates at temperatures at or below 250°C. Evaporation rates estimated to be ≧ 2000 Å/sec, were obtained by effectively short-circuiting 1 mil tungsten evaporation boats in a self-regulating system which maintained an optimum load current of approximately 90 amperes; corresponding to a current density through the boat of ∼ 4 × 104 amperes/cm2.

Epitaxial growth manner and structure of superconducting oxide films

1990 ◽  
Vol 48 (4) ◽  
pp. 2-3
Author(s):  
Yoshichika Bando ◽  
Takahito Terashima ◽  
Kenji Iijima ◽  
Kazunuki Yamamoto ◽  
Kazuto Hirata ◽  
...  
Keyword(s):  
Ultrathin Films ◽  
Film Surface ◽  
High Energy ◽  
Epitaxial Films ◽  
Layer By Layer ◽  
Initial Growth ◽  
In Situ Growth ◽  
High Quality ◽  
Activated Reactive Evaporation

The high quality thin films of high-Tc superconducting oxide are necessary for elucidating the superconducting mechanism and for device application. The recent trend in the preparation of high-Tc films has been toward “in-situ” growth of the superconducting phase at relatively low temperatures. The purpose of “in-situ” growth is to attain surface smoothness suitable for fabricating film devices but also to obtain high quality film. We present the investigation on the initial growth manner of YBCO by in-situ reflective high energy electron diffraction (RHEED) technique and on the structural and superconducting properties of the resulting ultrathin films below 100Å. The epitaxial films have been grown on (100) plane of MgO and SrTiO, heated below 650°C by activated reactive evaporation. The in-situ RHEED observation and the intensity measurement was carried out during deposition of YBCO on the substrate at 650°C. The deposition rate was 0.8Å/s. Fig. 1 shows the RHEED patterns at every stage of deposition of YBCO on MgO(100). All the patterns exhibit the sharp streaks, indicating that the film surface is atomically smooth and the growth manner is layer-by-layer.

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