Mechanical and electrical properties of micron-thick nitrogen-doped tetrahedral amorphous carbon coatings

2016 ◽  
Vol 69 ◽  
pp. 121-126 ◽  
Author(s):  
Young-Jun Jang ◽  
Yong-Jin Kang ◽  
Kazutaka Kitazume ◽  
Noritsugu Umehara ◽  
Jongkuk Kim
Keyword(s):  
Electrical Properties ◽  
Amorphous Carbon ◽  
Carbon Coatings ◽  
Nitrogen Doped ◽  
Tetrahedral Amorphous Carbon ◽  
Mechanical And Electrical Properties ◽  
Amorphous Carbon Coatings

scholarly journals PROPERTIES OF NITROGEN-DOPED AMORPHOUS CARBON COATINGS OBTAINED BY IMPULSE VACUUM-ARC METHOD

2018 ◽  
Vol 59 (9) ◽  
pp. 68 ◽  
Author(s):  
Aleksandr I. Poplavskiy ◽  
Aleksandr Ya. Kolpakov ◽  
Marina E. Galkina ◽  
Igor Yu. Goncharov ◽  
Roman A. Lyubushkin ◽  
...  
Keyword(s):  
Amorphous Carbon ◽  
Carbon Coating ◽  
Vacuum Arc ◽  
Internal Stresses ◽  
Structure And Properties ◽  
Carbon Coatings ◽  
Nitrogen Doped ◽  
Structure Surface ◽  
Amorphous Carbon Coatings ◽  
Carbon Plasma

The paper presents results of the research of the structure and properties of nitrogen-doped amorphous carbon coatings obtained in the vacuum from the flow of pulsed carbon plasma. The doping by nitrogen of carbon coating was determined to lead to increases in electrical conductivity, reductions of internal stresses, reduce of density, hardness and modulus, and to the change in structure, surface morphology and tribological characteristics.

scholarly journals Effect of Energy and Temperature on Tetrahedral Amorphous Carbon Coatings Deposited by Filtered Laser-Arc

Materials ◽  
2021 ◽  
Vol 14 (9) ◽  
pp. 2176
Author(s):  
Frank Kaulfuss ◽  
Volker Weihnacht ◽  
Martin Zawischa ◽  
Lars Lorenz ◽  
Stefan Makowski ◽  
...  
Keyword(s):  
Amorphous Carbon ◽  
High Hardness ◽  
Significant Loss ◽  
Normal Direction ◽  
Medium Temperature ◽  
Carbon Coatings ◽  
Tetrahedral Amorphous Carbon ◽  
Bias Pulse ◽  
Arc Evaporation ◽  
Amorphous Carbon Coatings

In this study, both the plasma process of filtered laser-arc evaporation and the resulting properties of tetrahedral amorphous carbon coatings are investigated. The energy distribution of the plasma species and the arc spot dynamics during the arc evaporation are described. Different ta-C coatings are synthesized by varying the bias pulse time and temperature during deposition. An increase in hardness was observed with the increased overlapping of the bias and arc pulse times. External heating resulted in a significant loss of hardness. A strong discrepancy between the in-plane properties and the properties in the film normal direction was detected specifically for a medium temperature of 120 °C during deposition. Investigations using electron microscopy revealed that this strong anisotropy can be explained by the formation of nanocrystalline graphite areas and their orientation toward the film’s normal direction. This novel coating type differs from standard amorphous a-C and ta-C coatings and offers new possibilities for superior mechanical behavior due to its combination of a high hardness and low in-plane Young’s Modulus.

Electron Emission Through Tetrahedral Amorphous Carbon Coatings on Mo and Si Emitters

1997 ◽  
Vol 498 ◽  
Author(s):  
W. B. Choi ◽  
A. F. Myers ◽  
M. Q. Ding ◽  
A. K. Sharma ◽  
J. Narayan ◽  
...  
Keyword(s):  
Amorphous Carbon ◽  
Columnar Structure ◽  
Hydrogen Atmosphere ◽  
Carbon Coatings ◽  
Field Emission Properties ◽  
Tetrahedral Amorphous Carbon ◽  
Low Field ◽  
Improved Stability ◽  
Thick Coatings ◽  
Amorphous Carbon Coatings

ABSTRACTThe field emission properties of molybdenum and silicon emitter coated with tetrahedral amorphous carbon (or amorphous diamond) were studied. The tetrahedral amorphous carbon was deposited by laser ablation and showed a uniformly coated columnar structure over the entire emitter. In general, current conditioning improved stability and increased the current density. Coatings of ta-C on Mo emitters with and without nitrogen incorporated both yielded significantly higher emissivity than uncoated emitters. Nitrogen incorporation reduced the effective workfunction and the sp3/sp2 ratio. However similar depositions on Si emitters reduced the emissivity, and may be attributable to the residual oxide at the ta-C/Si interface. Annealing in a hydrogen atmosphere enhanced emissivity from both ta-C/Mo and ta-C/Si emitters. In general, thick coatings lowered the emissivity and the slope of the I-V curves. A temperature dependence of emission was observed only in the low field regions.

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