Crystal structure and surface morphology of magnetron sputtering deposited hexagonal and perovskite-like YbMnO3 thin films

2014 ◽  
Vol 586 ◽  
pp. S343-S347 ◽  
Author(s):  
N.V. Andreev ◽  
T.A. Sviridova ◽  
V.I. Chichkov ◽  
A.P. Volodin ◽  
C. Van Haesendonck ◽  
...  
Keyword(s):  
Crystal Structure ◽  
Thin Films ◽  
Surface Morphology ◽  
Magnetron Sputtering

Effects of Continuous and Discontinuous Deposition Time in Reactive Direct Current Magnetron Sputtering of Titanium Dioxide Thin Films

2015 ◽  
Vol 1131 ◽  
pp. 251-254
Author(s):  
Montri Aiempanakit ◽  
Chantana Salawan ◽  
Kamon Aiempanakit
Keyword(s):  
Thin Films ◽  
Grain Size ◽  
Surface Morphology ◽  
Magnetron Sputtering ◽  
Direct Current ◽  
Deposition Time ◽  
Spherical Shape ◽  
Contact Angles ◽  
Water Contact ◽  
Direct Current Magnetron Sputtering

The effect of continuous and discontinuous deposition time on the properties of TiO2 thin films deposited by reactive direct current magnetron sputtering (DCMS) on glass substrates was investigated. The deposition processes were designed for a condition of continuous deposition time D1 (60 min) and three conditions of discontinuous deposition time D2 (30 min × 2 times), D3 (15 min × 4 times), and D4 (1 min × 60 times). The crystal structure, surface morphology, and hydrophilicity of TiO2 thin films were characterized by X-ray diffraction, atomic force microscope, and water contact angle method, respectively. It was found that the increasing of discontinuous deposition time (conditions from D1 to D4) shows the changing of grain size from big grain size with spherical shape to small grain size with oval shape. The crystallinity of TiO2 films decrease with increasing the discontinuous deposition time. The water contact angles also decrease as a function of increasing discontinuous deposition time. These results may be explained from the accumulation of heat on the substrate which affected the phase composition and surface morphology of TiO2 thin films.

Characteristics of CZTSSe Thin Films Prepared by Selenization of Sputtered Cu, Sn and ZnS Layers

2019 ◽  
Vol 18 (03n04) ◽  
pp. 1940040 ◽  
Author(s):  
N. Akcay ◽  
S. Ozcelik ◽  
E. Zaretskaya ◽  
R. Juskenas
Keyword(s):  
Thin Films ◽  
Raman Spectroscopy ◽  
Surface Morphology ◽  
Magnetron Sputtering ◽  
Room Temperature ◽  
Sem Study ◽  
Packed Structure

We reported the growth of CZTSSe thin films on Mo-coated SLG substrates by the two-step approach which includes the deposition of precursor films by the magnetron sputtering method at room temperature followed by selenization of the precursor films at 560∘C. Formation of CZTSSe films with the kesterite structure was confirmed by XRD and Raman spectroscopy analyses. The films are slightly Cu-rich and Zn-deficient. SEM study shown that the films have uniform surface morphology and densely packed structure without any voids and cracks.

Preparation and Character Measurements of AlN Films for RF Magnetron Sputtering

2013 ◽  
Vol 663 ◽  
pp. 409-412
Author(s):  
Tai Long Gui ◽  
Si Da Jiang ◽  
Chun Cheng Ban ◽  
Jia Qing Liu
Keyword(s):  
Crystal Structure ◽  
Thin Films ◽  
Refractive Index ◽  
Magnetron Sputtering ◽  
Total Pressure ◽  
Rf Magnetron Sputtering ◽  
Elliptical Polarization ◽  
Dielectric Thin Films ◽  
Temperature Changes ◽  
Sputtering Power

AlN dielectric thin films were deposited on N type Si(100) substrate by reactive radio frequency magnetron sputtering that directly bombardment AlN target under different sputtering-power and total pressure. The crystal structure,composition,surface and refractive index of the thin films were studied by XRD, SEM, AFM and elliptical polarization instrument. The results show that the surface and refractive of the thin films strongly depends on the sputtering-power and total pressure,the good uniformity and smoothness is found at 230 W, Ar flow ratio 5.0 LAr/sccm, substrate temperature 100°Cand 1.2 Pa. The crystal structure of the as-deposited thin-films is amorphous，then it transforms from blende structure to wurtzite structure as the rapid thermal annealing(RTA) temperature changes from 600 to 1200°C. The refractive index also increases with the RTA temperature it is increasing significantly from 800 to 1000°C．

scholarly journals Characterization of TiZrN and TaZrN Nanocomposite Multilayer Coating Deposited via RF/DC Magnetron Sputtering on AISI4140 Steel

2021 ◽  
Vol 2021 ◽  
pp. 1-10
Author(s):  
R. Hariharan ◽  
R. Raja ◽  
R. J. Golden Renjith Nimal ◽  
Mohamad Reda A. Refaai ◽  
S Ravi ◽  
...  
Keyword(s):  
Crystal Structure ◽  
Surface Morphology ◽  
Magnetron Sputtering ◽  
Physical Vapor Deposition ◽  
Research Work ◽  
Multilayer Coating ◽  
Flow Rate Ratio ◽  
Dc Magnetron Sputtering ◽  
Average Roughness ◽  
Structure Surface

In this present research work, TiZrN and TaZrN multilayer coating was deposited on 4140 steel by RF/DC magnetron sputtering for comparative work also prepared in single layer. The flow rate ratio of Ar/N2 was set to 15 : 3 sccm and the thin film was prepared by the PVD (physical vapor deposition) method by RF/DC magnetron using a Ti-Zr and Ta-Zr target with a purity of 99.99%. The crystal structure, surface morphology microstructure, and component arrangements were explored by X-ray diffraction (XRD), scanning electron microscope (SEM), and atomic force microscopy (AFM). It has been found that the crystal structure, surface morphology, microstructure, and elemental composition of the membrane are strongly dependent on deposition parameters. It is mechanically characterized by corrosion and Vickers hardness. In AFM measurements, coarse cluster particles with increasing Ti and Ta values not only increase the average roughness (Ra) by 2.341 nm (200°C) and 2.951 nm (400°C) but also have a continuous average thickness which was shown to increase by 1.504 nm and 781.75 nm. With the increase of hardness, the roughness decreases correspondingly. The TiZrN multilayer microhardness augmented to 314 GPa at 200°C and 371 GPa for TaZrN (400°C).

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