Growth of epitaxial γ-Al2O3(111) films with smooth surfaces on chemically oxidized Si(111) substrates using an Al–N2O mixed source molecular beam epitaxy
2006 ◽
Vol 290
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pp. 91-95
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1995 ◽
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Vol 177
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Keyword(s):
Keyword(s):
1982 ◽
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Vol 43
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1989 ◽
Vol 47
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